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Journal: Nanomaterials, 2022
Volume: 12
Number: 3242

Article: Atomistic Simulation of the Ion-Assisted Deposition of Silicon Dioxide Thin Films
Authors: by F. V. Grigoriev, V. B. Sulimov and A. V. Tikhonravov
Link: https://www.mdpi.com/2079-4991/12/18/3242

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