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Applied Sciences
Volume 15
Issue 17
10.3390/app15179457
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This is an early access version, the complete PDF, HTML, and XML versions will be available soon.
Article

Surface Roughness, Residual Stress, and Optical and Structural Properties of Evaporated VO2 Thin Films Prepared with Different Tungsten Doping Amounts

by
Chuen-Lin Tien
1,*,
Chun-Yu Chiang
2,
Yi-Lin Wang
1,
Ching-Chiun Wang
3 and
Shih-Chin Lin
3
1
Department of Electrical Engineering, Feng Chia University, Taichung 40724, Taiwan
2
Ph.D. Program of Electrical and Communications Engineering, Feng Chia University, Taichung 40724, Taiwan
3
Mechanical and Systems Research Lab, Industrial Technology Research Institute, Hsinchu 310401, Taiwan
*
Author to whom correspondence should be addressed.
Appl. Sci. 2025, 15(17), 9457; https://doi.org/10.3390/app15179457 (registering DOI)
Submission received: 16 July 2025 / Revised: 21 August 2025 / Accepted: 26 August 2025 / Published: 28 August 2025
(This article belongs to the Special Issue Feature Papers in 'Surface Sciences and Technology' Section, 3rd Edition)
Versions Notes

Abstract

This study investigates the effects of different tungsten (W) doping contents on the optical transmittance, surface roughness, residual stress, and microstructure of evaporated vanadium dioxide (VO2) thin films. W-doped VO2 thin films with varying tungsten concentrations were fabricated using electron beam evaporation combined with ion-assisted deposition techniques, and deposited on silicon wafers and glass substrates. The optical transmittances of undoped and W-doped VO2 thin films were measured by UV/VIS/NIR spectroscopy and Fourier transform infrared (FTIR) spectroscopy. The root mean square surface roughness was measured using a Linnik microscopic interferometer. The residual stress in various W-doped VO2 films was evaluated using a modified Twyman–Green interferometer. The surface morphological and structural characterization of the W-doped VO2 thin films were performed by field-emission scanning electron microscopy (FE-SEM) and X-ray diffraction (XRD). Raman spectroscopy was used to analyze the structure and vibrational modes of different W-doped VO2 thin films. These results show that the addition of tungsten significantly alters the structural, optical, and mechanical properties of VO2 thin films.
Keywords: ion-assisted deposition; vanadium dioxide; thin film; residual stress; thermal stress electron beam evaporation ion-assisted deposition; vanadium dioxide; thin film; residual stress; thermal stress electron beam evaporation

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MDPI and ACS Style

Tien, C.-L.; Chiang, C.-Y.; Wang, Y.-L.; Wang, C.-C.; Lin, S.-C. Surface Roughness, Residual Stress, and Optical and Structural Properties of Evaporated VO2 Thin Films Prepared with Different Tungsten Doping Amounts. Appl. Sci. 2025, 15, 9457. https://doi.org/10.3390/app15179457

AMA Style

Tien C-L, Chiang C-Y, Wang Y-L, Wang C-C, Lin S-C. Surface Roughness, Residual Stress, and Optical and Structural Properties of Evaporated VO2 Thin Films Prepared with Different Tungsten Doping Amounts. Applied Sciences. 2025; 15(17):9457. https://doi.org/10.3390/app15179457

Chicago/Turabian Style

Tien, Chuen-Lin, Chun-Yu Chiang, Yi-Lin Wang, Ching-Chiun Wang, and Shih-Chin Lin. 2025. "Surface Roughness, Residual Stress, and Optical and Structural Properties of Evaporated VO2 Thin Films Prepared with Different Tungsten Doping Amounts" Applied Sciences 15, no. 17: 9457. https://doi.org/10.3390/app15179457

APA Style

Tien, C.-L., Chiang, C.-Y., Wang, Y.-L., Wang, C.-C., & Lin, S.-C. (2025). Surface Roughness, Residual Stress, and Optical and Structural Properties of Evaporated VO2 Thin Films Prepared with Different Tungsten Doping Amounts. Applied Sciences, 15(17), 9457. https://doi.org/10.3390/app15179457

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