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Journal: Micromachines, 2023
Volume: 14
Number: 1875

Article: High Oxygen Sensitivity of TiO2 Thin Films Deposited by ALD
Authors: by Aleksei V. Almaev, Nikita N. Yakovlev, Dmitry A. Almaev, Maksim G. Verkholetov, Grigory A. Rudakov and Kristina I. Litvinova
Link: https://www.mdpi.com/2072-666X/14/10/1875

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