Article Versions Notes

do Amaral Amâncio M, Romaguera-Barcelay Y, Matos RS, Pires MA, Gandarilla AMD, do Nascimento MVB, Nobre FX, Ţălu Ş, da Fonseca Filho HD, Brito WR. Effect of the Deposition Time on the Structural, 3D Vertical Growth, and Electrical Conductivity Properties of Electrodeposited Anatase–Rutile Nanostructured Thin Films. Micromachines. 2022; 13(8):1361. https://doi.org/10.3390/mi13081361

do Amaral Amâncio, Moisés, Yonny Romaguera-Barcelay, Robert Saraiva Matos, Marcelo Amanajás Pires, Ariamna María Dip Gandarilla, Marcus Valério Botelho do Nascimento, Francisco Xavier Nobre, Ştefan Ţălu, Henrique Duarte da Fonseca Filho, and Walter Ricardo Brito. 2022. "Effect of the Deposition Time on the Structural, 3D Vertical Growth, and Electrical Conductivity Properties of Electrodeposited Anatase–Rutile Nanostructured Thin Films" Micromachines 13, no. 8: 1361. https://doi.org/10.3390/mi13081361

do Amaral Amâncio, M., Romaguera-Barcelay, Y., Matos, R. S., Pires, M. A., Gandarilla, A. M. D., do Nascimento, M. V. B., Nobre, F. X., Ţălu, Ş., da Fonseca Filho, H. D., & Brito, W. R. (2022). Effect of the Deposition Time on the Structural, 3D Vertical Growth, and Electrical Conductivity Properties of Electrodeposited Anatase–Rutile Nanostructured Thin Films. Micromachines, 13(8), 1361. https://doi.org/10.3390/mi13081361