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Micromachines 2019, 10(2), 91; https://doi.org/10.3390/mi10020091

A Breakdown Enhanced AlGaN/GaN Schottky Barrier Diode with the T-Anode Position Deep into the Bottom Buffer Layer

The Key Laboratory of RF Circuits and Systems, Ministry of Education, Hangzhou Dianzi University, Hangzhou 310018, China
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Received: 15 December 2018 / Revised: 22 January 2019 / Accepted: 22 January 2019 / Published: 26 January 2019
(This article belongs to the Special Issue Wide Bandgap Semiconductor Based Micro/Nano Devices)
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Abstract

In this paper, an AlGaN/GaN Schottky barrier diode (SBD) with the T-anode located deep into the bottom buffer layer in combination with field plates (TAI-BBF FPs SBD) is proposed. The electrical characteristics of the proposed structure and the conventional AlGaN/GaN SBD with gated edge termination (GET SBD) were simulated and compared using a Technology Computer Aided Design (TCAD) tool. The results proved that the breakdown voltage (VBK) in the proposed structure was tremendously improved when compared to the GET SBD. This enhancement is attributed to the suppression of the anode tunneling current by the T-anode and the redistribution of the electric field in the anode–cathode region induced by the field plates (FPs). Moreover, the T-anode had a negligible effect on the two-dimensional electron gas (2DEG) in the channel layer, so there is no deterioration in the forward characteristics. After being optimized, the proposed structure exhibited a low turn-on voltage (VT) of 0.53 V and a specific on-resistance (RON,sp) of 0.32 mΩ·cm2, which was similar to the GET SBD. Meanwhile, the TAI-BBF FP SBD with an anode-cathode spacing of 5 μm achieved a VBK of 1252 V, which was enhanced almost six times compared to the GET SBD with a VBK of 213 V. View Full-Text
Keywords: T-anode; GaN; buffer layer; anode field plate (AFP); cathode field plate (CFP) T-anode; GaN; buffer layer; anode field plate (AFP); cathode field plate (CFP)
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Sun, Y.; Wang, Y.; Tang, J.; Wang, W.; Huang, Y.; Kuang, X. A Breakdown Enhanced AlGaN/GaN Schottky Barrier Diode with the T-Anode Position Deep into the Bottom Buffer Layer. Micromachines 2019, 10, 91.

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