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Journal: Materials, 2024
Volume: 17
Number: 3917
Article:
Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasma
Authors:
by
Sanghyun You, Eunjae Sun, Heeyeop Chae and Chang-Koo Kim
Link:
https://www.mdpi.com/1996-1944/17/16/3917
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