Article Versions Notes

Liang Y, Wang P, Wang Y, Dai Y, Hu Z, Tranca DE, Hristu R, Stanciu SG, Toma A, Stanciu GA, et al. Growth Mechanisms and the Effects of Deposition Parameters on the Structure and Properties of High Entropy Film by Magnetron Sputtering. Materials. 2019; 12(18):3008. https://doi.org/10.3390/ma12183008

Liang, Yanxia, Peipei Wang, Yufei Wang, Yijia Dai, Zhaoyi Hu, Denis E. Tranca, Radu Hristu, Stefan G. Stanciu, Antonela Toma, George A. Stanciu, and et al. 2019. "Growth Mechanisms and the Effects of Deposition Parameters on the Structure and Properties of High Entropy Film by Magnetron Sputtering" Materials 12, no. 18: 3008. https://doi.org/10.3390/ma12183008

Liang, Y., Wang, P., Wang, Y., Dai, Y., Hu, Z., Tranca, D. E., Hristu, R., Stanciu, S. G., Toma, A., Stanciu, G. A., Wang, X., & Fu, E. (2019). Growth Mechanisms and the Effects of Deposition Parameters on the Structure and Properties of High Entropy Film by Magnetron Sputtering. Materials, 12(18), 3008. https://doi.org/10.3390/ma12183008