Growth Mechanisms and the Effects of Deposition Parameters on the Structure and Properties of High Entropy Film by Magnetron Sputtering
Liang, Y.; Wang, P.; Wang, Y.; Dai, Y.; Hu, Z.; Tranca, D.E.; Hristu, R.; Stanciu, S.G.; Toma, A.; Stanciu, G.A.; Wang, X.; Fu, E. Growth Mechanisms and the Effects of Deposition Parameters on the Structure and Properties of High Entropy Film by Magnetron Sputtering. Materials 2019, 12, 3008. https://doi.org/10.3390/ma12183008
Liang Y, Wang P, Wang Y, Dai Y, Hu Z, Tranca DE, Hristu R, Stanciu SG, Toma A, Stanciu GA, Wang X, Fu E. Growth Mechanisms and the Effects of Deposition Parameters on the Structure and Properties of High Entropy Film by Magnetron Sputtering. Materials. 2019; 12(18):3008. https://doi.org/10.3390/ma12183008
Chicago/Turabian StyleLiang, Yanxia, Peipei Wang, Yufei Wang, Yijia Dai, Zhaoyi Hu, Denis E. Tranca, Radu Hristu, Stefan G. Stanciu, Antonela Toma, George A. Stanciu, Xingjun Wang, and Engang Fu. 2019. "Growth Mechanisms and the Effects of Deposition Parameters on the Structure and Properties of High Entropy Film by Magnetron Sputtering" Materials 12, no. 18: 3008. https://doi.org/10.3390/ma12183008