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Search Results (416)

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Keywords = metal-oxide-semiconductor field-effect-transistor

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11 pages, 492 KiB  
Article
Ultra-Small Temperature Sensing Units with Fitting Functions for Accurate Thermal Management
by Samuel Heikens and Degang Chen
Metrology 2025, 5(3), 46; https://doi.org/10.3390/metrology5030046 - 1 Aug 2025
Viewed by 111
Abstract
Thermal management is an area of study in electronics focused on managing temperature to improve reliability and efficiency. When temperatures are too high, cooling systems are activated to prevent overheating, which can lead to reliability issues. To monitor the temperatures, sensors are often [...] Read more.
Thermal management is an area of study in electronics focused on managing temperature to improve reliability and efficiency. When temperatures are too high, cooling systems are activated to prevent overheating, which can lead to reliability issues. To monitor the temperatures, sensors are often placed on-chip near hotspot locations. These sensors should be very small to allow them to be placed among compact, high-activity circuits. Often, they are connected to a central control circuit located far away from the hot spot locations where more area is available. This paper proposes sensing units for a novel temperature sensing architecture in the TSMC 180 nm process. This architecture functions by approximating the current through the sensing unit at a reference voltage, which is used to approximate the temperature in the digital back end using fitting functions. Sensing units are selected based on how well its temperature–current relationship can be modeled, sensing unit area, and power consumption. Many sensing units will be experimented with at different reference voltages. These temperature–current curves will be modeled with various fitting functions. The sensing unit selected is a diode-connected p-type MOSFET (Metal Oxide Semiconductor Field Effect Transistor) with a size of W = 400 nm, L = 180 nm. This sensing unit is exceptionally small compared to existing work because it does not rely on multiple devices at the sensing unit location to generate a PTAT or IPTAT signal like most work in this area. The temperature–current relationship of this device can also be modeled using a 2nd order polynomial, requiring a minimal number of trim temperatures. Its temperature error is small, and the power consumption is low. The range of currents for this sensing unit could be reasonably made on an IDAC. Full article
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31 pages, 11019 KiB  
Review
A Review of Tunnel Field-Effect Transistors: Materials, Structures, and Applications
by Shupeng Chen, Yourui An, Shulong Wang and Hongxia Liu
Micromachines 2025, 16(8), 881; https://doi.org/10.3390/mi16080881 - 29 Jul 2025
Viewed by 373
Abstract
The development of an integrated circuit faces the challenge of the physical limit of Moore’s Law. One of the most important “Beyond Moore” challenges is the scaling down of Metal-Oxide-Semiconductor Field-Effect Transistors (MOSFETs) versus their increasing static power consumption. This is because, at [...] Read more.
The development of an integrated circuit faces the challenge of the physical limit of Moore’s Law. One of the most important “Beyond Moore” challenges is the scaling down of Metal-Oxide-Semiconductor Field-Effect Transistors (MOSFETs) versus their increasing static power consumption. This is because, at room temperature, the thermal emission transportation mechanism will cause a physical limitation on subthreshold swing (SS), which is fundamentally limited to a minimum value of 60 mV/decade for MOSFETs, and accompanied by an increase in off-state leakage current with the process of scaling down. Moreover, the impacts of short-channel effects on device performance also become an increasingly severe problem with channel length scaling down. Due to the band-to-band tunneling mechanism, Tunnel Field-Effect Transistors (TFETs) can reach a far lower SS than MOSFETs. Recent research works indicated that TFETs are already becoming some of the promising candidates of conventional MOSFETs for ultra-low-power applications. This paper provides a review of some advances in materials and structures along the evolutionary process of TFETs. An in-depth discussion of both experimental works and simulation works is conducted. Furthermore, the performance of TFETs with different structures and materials is explored in detail as well, covering Si, Ge, III-V compounds and 2D materials, alongside different innovative device structures. Additionally, this work provides an outlook on the prospects of TFETs in future ultra-low-power electronics and biosensor applications. Full article
(This article belongs to the Special Issue MEMS/NEMS Devices and Applications, 3rd Edition)
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13 pages, 2352 KiB  
Article
Research on Improving the Avalanche Current Limit of Parallel SiC MOSFETs
by Hua Mao, Binbing Wu, Xinsheng Lan, Yalong Xia, Junjie Chen and Lei Tang
Electronics 2025, 14(13), 2502; https://doi.org/10.3390/electronics14132502 - 20 Jun 2025
Viewed by 450
Abstract
The transient overvoltage caused by coupling of loop inductance during rapid turn off of a silicon carbide metal-oxide-semiconductor field-effect transistor (SiC MOSFET) can easily induce avalanche breakdown. Meanwhile, the instantaneous high-density heat flux generated by energy dissipation can create significant electrothermal coupling stress, [...] Read more.
The transient overvoltage caused by coupling of loop inductance during rapid turn off of a silicon carbide metal-oxide-semiconductor field-effect transistor (SiC MOSFET) can easily induce avalanche breakdown. Meanwhile, the instantaneous high-density heat flux generated by energy dissipation can create significant electrothermal coupling stress, potentially leading to device failure under severe conditions. To address the issue that the multi-chip parallel structure of power modules cannot linearly enhance avalanche withstand capability, an innovative device screening method based on parameter matching is proposed in this paper. The effectiveness of the proposed solution is verified through experiments, with the total current limit of dual-tube parallel devices and three-tube parallel devices achieving 1.9 times and 2.4 times that of single-tube devices, respectively. This research is of great significance for improving safe and reliable operation of the system. Full article
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19 pages, 19877 KiB  
Article
Costless Improvement of Converter Efficiency in a Regenerative Braking System with a Brushless DC Machine
by Paweł Stawczyk
Electronics 2025, 14(12), 2390; https://doi.org/10.3390/electronics14122390 - 11 Jun 2025
Viewed by 348
Abstract
This paper focuses on the analysis of a new modulation method based on the reverse conduction of metal–oxide–semiconductor field-effect transistors (MOSFETs) for a three-phase voltage-feed full-bridge converter with two-switched transistors. The implementation of the proposed method allows efficient converter performance during regenerative braking [...] Read more.
This paper focuses on the analysis of a new modulation method based on the reverse conduction of metal–oxide–semiconductor field-effect transistors (MOSFETs) for a three-phase voltage-feed full-bridge converter with two-switched transistors. The implementation of the proposed method allows efficient converter performance during regenerative braking of a brushless DC machine. It does not require any additional components such as power switches, sensors, and high-performance microcontrollers. Previously known classical modulation methods were characterised by significantly lower efficiency of the converter due to diode conduction. The operating principle of the modified modulation method is clearly explained in detail with mathematical and simulation analyses presented. The theoretical results obtained were verified experimentally, demonstrating that the maximum efficiency of the converter increased from 88% (for classical modulation) to 95% with the new modulation strategy. The developed solution is dedicated to electric vehicles and enables effective regenerative braking even at low speeds. Full article
(This article belongs to the Special Issue Power Electronics and Renewable Energy System)
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16 pages, 4344 KiB  
Article
Ion-Induced Charge and Single-Event Burnout in Silicon Power UMOSFETs
by Saulo G. Alberton, Vitor A. P. Aguiar, Nemitala Added, Alexis C. Vilas-Bôas, Marcilei A. Guazzelli, Jeffery Wyss, Luca Silvestrin, Serena Mattiazzo, Matheus S. Pereira, Saulo Finco, Alessandro Paccagnella and Nilberto H. Medina
Electronics 2025, 14(11), 2288; https://doi.org/10.3390/electronics14112288 - 4 Jun 2025
Viewed by 459
Abstract
The U-shaped Metal-Oxide-Semiconductor Field-Effect Transistor (UMOS or trench FET) is one of the most widely used semiconductor power devices worldwide, increasingly replacing the traditional vertical double-diffused MOSFET (DMOSFET) in various applications due to its superior electrical performance. However, a detailed experimental comparison of [...] Read more.
The U-shaped Metal-Oxide-Semiconductor Field-Effect Transistor (UMOS or trench FET) is one of the most widely used semiconductor power devices worldwide, increasingly replacing the traditional vertical double-diffused MOSFET (DMOSFET) in various applications due to its superior electrical performance. However, a detailed experimental comparison of ion-induced Single-Event Burnout (SEB) in similarly rated silicon (Si) UMOS and DMOS devices remains lacking. This study presents a comprehensive experimental comparison of ion-induced charge collection mechanisms and SEB susceptibility in similarly rated Si UMOS and DMOS devices. Charge collection mechanisms due to alpha particles from 241Am radiation source are analyzed, and SEB cross sections induced by heavy ions from particle accelerators are directly compared. The implications of the unique gate structure of Si UMOSFETs on their reliability in harsh radiation environments are discussed based on technology computer-aided design (TCAD) simulations. Full article
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18 pages, 5857 KiB  
Article
Self-Powered Triboelectric Ethanol Sensor Based on CuO-Doped Electrospun PVDF Fiber with Enhanced Sensing Performance
by Quanyu He, Hyunwoo Cho, Inkyum Kim, Jonghwan Lee and Daewon Kim
Polymers 2025, 17(10), 1400; https://doi.org/10.3390/polym17101400 - 20 May 2025
Viewed by 579
Abstract
Electrospinning techniques have been widely applied in diverse applications, such as biocompatible membranes, energy storage systems, and triboelectric nanogenerators (TENGs), with the capability to incorporate other functional materials to achieve specific purposes. Recently, gas sensors incorporating doped semiconducting materials fabricated by electrospinning have [...] Read more.
Electrospinning techniques have been widely applied in diverse applications, such as biocompatible membranes, energy storage systems, and triboelectric nanogenerators (TENGs), with the capability to incorporate other functional materials to achieve specific purposes. Recently, gas sensors incorporating doped semiconducting materials fabricated by electrospinning have been extensively investigated. TENGs, functioning as self-powered energy sources, have been utilized to drive gas sensors without external power supplies. Herein, a self-powered triboelectric ethanol sensor (TEES) is fabricated by integrating a TENG and an ethanol gas sensor into a single device. The proposed TEES exhibits a significantly improved response time and lower detection limit compared to published integrated triboelectric sensors. The device achieves an open-circuit voltage of 51.24 V at 800 rpm and a maximum short-circuit current of 7.94 μA at 800 rpm. Owing to the non-contact freestanding operating mode, the TEES shows no significant degradation after 240,000 operational cycles. Compared with previous studies that integrated TENGs and ethanol sensors, the proposed TEES demonstrated a marked improvement in sensing performance, with a faster response time (6 s at 1000 ppm) and a lower limit of detection (10 ppm). Furthermore, ethanol detection is enabled by modulating the gate terminal of an IRF840 metal-oxide semiconductor field-effect transistor (MOSFET), which controls the illumination of a light-emitting diode (LED). The LED is extinguished when the electrical output decreases below the setting value, allowing for the discrimination of intoxicated states. These results suggest that the TEES provides a promising platform for self-powered, high-performance ethanol sensing. Full article
(This article belongs to the Section Polymer Fibers)
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19 pages, 4266 KiB  
Article
Accurate and Efficient Process Modeling and Inverse Optimization for Trench Metal Oxide Semiconductor Field Effect Transistors: A Machine Learning Proxy Approach
by Mingqiang Geng, Jianming Guo, Yuting Sun, Dawei Gao and Dong Ni
Processes 2025, 13(5), 1544; https://doi.org/10.3390/pr13051544 - 16 May 2025
Viewed by 803
Abstract
This study proposes a novel framework integrating long short-term memory (LSTM) networks with Bayesian optimization (BO) to address process–device co-optimization challenges in trench-gate metal–oxide–semiconductor field-effect transistor (MOSFET) manufacturing. Conventional TCAD simulations, while accurate, suffer from computational inefficiency in high-dimensional parameter spaces. To overcome [...] Read more.
This study proposes a novel framework integrating long short-term memory (LSTM) networks with Bayesian optimization (BO) to address process–device co-optimization challenges in trench-gate metal–oxide–semiconductor field-effect transistor (MOSFET) manufacturing. Conventional TCAD simulations, while accurate, suffer from computational inefficiency in high-dimensional parameter spaces. To overcome this, an LSTM-based TCAD proxy model is developed, leveraging hierarchical temporal dependencies to predict electrical parameters (e.g., breakdown voltage, threshold voltage) with deviations below 3.5% compared to physical simulations. The model, validated on both N-type and P-type 20 V trench MOS devices, outperforms conventional RNN and GRU architectures, reducing average relative errors by 1.78% through its gated memory mechanism. A BO-driven inverse optimization methodology is further introduced to navigate trade-offs between conflicting objectives (e.g., minimizing on-resistance while maximizing breakdown voltage), achieving recipe predictions with a maximum deviation of 8.3% from experimental data. Validation via TCAD-simulated extrapolation tests and SEM metrology confirms the framework’s robustness under extended operating ranges (e.g., 0–40 V drain voltage) and dimensional tolerances within industrial specifications. The proposed approach establishes a scalable, data-driven paradigm for semiconductor manufacturing, effectively bridging TCAD simulations with production realities while minimizing empirical trial-and-error iterations. Full article
(This article belongs to the Special Issue Machine Learning Optimization of Chemical Processes)
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19 pages, 10692 KiB  
Article
Design of High-Speed Motor System for EV Based on 1200 V SiC-MOSFET Power Module
by Kun Zhou, Minglei Gu and Yu Zheng
Actuators 2025, 14(5), 216; https://doi.org/10.3390/act14050216 - 26 Apr 2025
Viewed by 789
Abstract
In this paper, a high-speed motor system for an Electric Vehicle (EV) is designed, of which the rated DC-link voltage is 800 V and peak power can reach 200 kW with a high-efficiency Silicon Carbide Metal Oxide Semiconductor Field Effect Transistor (SiC-MOSFET). With [...] Read more.
In this paper, a high-speed motor system for an Electric Vehicle (EV) is designed, of which the rated DC-link voltage is 800 V and peak power can reach 200 kW with a high-efficiency Silicon Carbide Metal Oxide Semiconductor Field Effect Transistor (SiC-MOSFET). With the help of optimization motor design methods, such as pole–slot combination optimization, process optimization and control optimization, the motor can reach its maximal speed of 25,000 rpm and maximal torque of 240 Nm. Finally, the performance of the high-voltage motor system based on the SiC-MOSFET power module is evaluated by simulation and experiment. Full article
(This article belongs to the Special Issue Power Electronics and Actuators—Second Edition)
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33 pages, 1233 KiB  
Review
Silicon Carbide Converter Design: A Review
by Asif Rasul, Rita Teixeira and José Baptista
Energies 2025, 18(8), 2140; https://doi.org/10.3390/en18082140 - 21 Apr 2025
Cited by 1 | Viewed by 1841
Abstract
To achieve lower switching losses and higher frequency capabilities in converter design, researchers worldwide have been investigating Silicon carbide (SiC) modules and MOSFETs. In power electronics, wide bandgap devices such as Silicon carbide are essential for creating more efficient, higher-density, and higher-power-rated converters. [...] Read more.
To achieve lower switching losses and higher frequency capabilities in converter design, researchers worldwide have been investigating Silicon carbide (SiC) modules and MOSFETs. In power electronics, wide bandgap devices such as Silicon carbide are essential for creating more efficient, higher-density, and higher-power-rated converters. Devices like SiC and Gallium nitride (GaN) offer numerous advantages in power electronics, particularly by influencing parasitic capacitance and inductance in printed circuit boards (PCBs). A review paper on Silicon carbide converter designs using coupled inductors provides a comprehensive analysis of the advancements in SiC-based power converter technologies. Over the past decade, SiC converter designs have demonstrated both efficiency and reliability, underscoring significant improvements in performance and design methodologies over time. This review paper examines developments in Silicon carbide converter design from 2014 to 2024, with a focus on the research conducted in the past ten years. It highlights the advantages of SiC technology, techniques for constructing converters, and the impact on other components. Additionally, a bibliometric analysis of prior studies has been conducted, with a particular focus on strategies to minimize switching losses, as discussed in the reviewed articles. Full article
(This article belongs to the Special Issue Energy, Electrical and Power Engineering: 3rd Edition)
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20 pages, 37593 KiB  
Article
A Second-Order Fast Discharge Circuit for Transient Electromagnetic Transmitter
by Chao Tan, Shibin Yuan, Linshan Yu, Yaohui Chen and Changjiang He
Sensors 2025, 25(7), 2224; https://doi.org/10.3390/s25072224 - 1 Apr 2025
Cited by 1 | Viewed by 502
Abstract
To solve the problem of long turn-off times for transient electromagnetic (TEM) transmitters with inductive loads, a new second-order fast discharge circuit topology added into the original H-bridge structure for TEM transmitters is presented, which includes a capacitor, two Metal-Oxide-Semiconductor Field-Effect Transistors (MOSFETs), [...] Read more.
To solve the problem of long turn-off times for transient electromagnetic (TEM) transmitters with inductive loads, a new second-order fast discharge circuit topology added into the original H-bridge structure for TEM transmitters is presented, which includes a capacitor, two Metal-Oxide-Semiconductor Field-Effect Transistors (MOSFETs), and two resistors. Firstly, the four operating stages and principles of the second-order circuit were analyzed. Then, the mathematical models of the turn-off time of the current and the voltage stress of the Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) were established using the analytical method. Finally, the parameters of the resistor and capacitor were selected by finding the optimal solution for the fixed transmitter coil. Compared with the simulation results of the other two topologies, the proposed topology demonstrates a current-independent turn-off time and achieves the shortest duration at 50 A, while maintaining lower voltage stress at 9 A. The experimental results of the prototype show that the turn-off time is always about 64 μs when the currents are 1 A, 5 A, and 9 A. Simulation and experimental results show that the second-order circuit reduces the MOSFET’s turn-off time to 58 μs via Resistor–Inductor–Capacitor (RLC) series resonance, with the turn-off duration remaining load-current-independent. Full article
(This article belongs to the Special Issue Advanced Sensing and Control Technologies in Power Electronics)
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12 pages, 9847 KiB  
Article
Research on Single-Event Effect Hardening Method of Transverse Split-Gate Trench Metal-Oxide-Semiconductor Field-Effect Transistors
by Mengtian Bao, Ying Wang, Jianqun Yang and Xingji Li
Micromachines 2025, 16(4), 417; https://doi.org/10.3390/mi16040417 - 31 Mar 2025
Viewed by 345
Abstract
In this work, the single-event burnout (SEB) effect and degradation behaviors induced by heavy-ion irradiation are investigated in a 120 V-rated transverse split-gate trench (TSGT) power metal-oxide-semiconductor field-effect transistor (MOSFET). Bismuth heavy-ions are used to conduct heavy-ion irradiation tests. The experimental results show [...] Read more.
In this work, the single-event burnout (SEB) effect and degradation behaviors induced by heavy-ion irradiation are investigated in a 120 V-rated transverse split-gate trench (TSGT) power metal-oxide-semiconductor field-effect transistor (MOSFET). Bismuth heavy-ions are used to conduct heavy-ion irradiation tests. The experimental results show that the SEB failure threshold voltage (VSEB) of the tested sample is 72 V, which only accounts for 52.6% of the actual breakdown voltage of the device. The VSEB value decreased with the increase in the flux. The simulation results show that the local “hot spot” formed after the incident heavy ion is an important reason for the drain current degradation of TSGT MOSFETs. To improve the single-event effect tolerance of TSGT MOSFETs, an SEB hardening method based on process optimization is proposed in this paper, which does not require additional customized epitaxial wafers. The simulation results show that, after SEB hardening, the VSEB is increased to 115 V, which accounts for 89.1% of the breakdown voltage. Full article
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15 pages, 3813 KiB  
Article
Dual-Gate Metal-Oxide-Semiconductor Transistors: Nanoscale Channel Length Scaling and Performance Optimization
by Huajian Zheng, Zhuohang Ye, Baiquan Liu, Mengye Wang, Li Zhang and Chuan Liu
Electronics 2025, 14(7), 1257; https://doi.org/10.3390/electronics14071257 - 22 Mar 2025
Viewed by 944
Abstract
Dual-gate metal-oxide-semiconductor transistors have attracted considerable interest due to their high threshold voltage control capability, higher drain current, and the ability to alleviate the impact of carrier surface scattering at the channel/dielectric interface. However, their applications in the monolithic integration of scaled devices [...] Read more.
Dual-gate metal-oxide-semiconductor transistors have attracted considerable interest due to their high threshold voltage control capability, higher drain current, and the ability to alleviate the impact of carrier surface scattering at the channel/dielectric interface. However, their applications in the monolithic integration of scaled devices encounter challenges stemming from the interaction between the pre-treated channel layer and its covering dielectric. Here, we demonstrate the successful realization of a scaled back-end-of-line (BEOL) compatible dual-gate indium–gallium–zinc oxide (IGZO) transistor with a channel length (Lch) scaled down to 150 nm and a channel thickness (Tch) of 4.2 nm. After precisely adjusting the metal ratio to In0.24Ga0.58Zn0.18O and employing O3 as an oxygen precursor for the deposition of Al2O3 as the top-gate dielectric layer, a high maximum current of 1.384 mA was attained under top-gate control, while a high current of 1.956 mA was achieved under bottom-gate control. Additionally, a high current on/off ratio (Ion/off > 109) was achieved for the dual gate. Careful calculations reveal that the field-effective mobility (μeff) reaches 11.68 cm2V−1s−1 under top-gate control and 22.46 cm2V−1s−1 under bottom-gate control. We demonstrate excellent dual-gate low-voltage modulation performance, with a high current switch ratio of 3 × 105 at Lch = 300 nm and 2 × 104 at Lch = 150 nm achieved by only 1 V modulation voltage, accompanied by a normalized current variation higher than 106. Overall, our devices show the remarkable electrical performance characteristics, highlighting their potential applications in high-performance electronic circuits. Full article
(This article belongs to the Special Issue Optoelectronics, Energy and Integration)
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33 pages, 8045 KiB  
Review
A Review of Readout Circuit Schemes Using Silicon Nanowire Ion-Sensitive Field-Effect Transistors for pH-Sensing Applications
by Jungho Joo, Hyunsun Mo, Seungguk Kim, Seonho Shin, Ickhyun Song and Dae Hwan Kim
Biosensors 2025, 15(4), 206; https://doi.org/10.3390/bios15040206 - 22 Mar 2025
Viewed by 796
Abstract
This paper reviews various design approaches for sensing schemes that utilize silicon nanowire (SiNW) ion-sensitive field-effect transistors (ISFETs) for pH-sensing applications. SiNW ISFETs offer advantageous characteristics, including a high surface-to-volume ratio, fast response time, and suitability for integration with complementary metal oxide semiconductor [...] Read more.
This paper reviews various design approaches for sensing schemes that utilize silicon nanowire (SiNW) ion-sensitive field-effect transistors (ISFETs) for pH-sensing applications. SiNW ISFETs offer advantageous characteristics, including a high surface-to-volume ratio, fast response time, and suitability for integration with complementary metal oxide semiconductor (CMOS) technology. This review focuses on SiNW ISFET-based biosensors in three key aspects: (1) major fabrication processes and device structures; (2) theoretical analysis of key performance parameters in readout circuits such as sensitivity, linearity, noise immunity, and output range in different system configurations; and (3) an overview of existing readout circuits with quantitative evaluations of N-type and P-type current-mirror-based circuits, highlighting their strengths and limitations. Finally, this paper proposes a modified N-type readout scheme integrating an operational amplifier with a negative feedback network to overcome the low sensitivity of conventional N-type circuits. This design enhances gain control, linearity, and noise immunity while maintaining stability. These advancements are expected to contribute to the advancement of the current state-of-the-art SiNW ISFET-based readout circuits. Full article
(This article belongs to the Special Issue Biosensors Based on Transistors)
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16 pages, 1474 KiB  
Entry
In Vivo Dosimetry in Radiotherapy: Techniques, Applications, and Future Directions
by James C. L. Chow and Harry E. Ruda
Encyclopedia 2025, 5(1), 40; https://doi.org/10.3390/encyclopedia5010040 - 20 Mar 2025
Cited by 2 | Viewed by 2077
Definition
In vivo dosimetry (IVD) is a vital component of modern radiotherapy, ensuring accurate and safe delivery of radiation doses to patients by measuring dose parameters during treatment. This paper provides a comprehensive overview of IVD, covering its fundamental principles, historical development, and the [...] Read more.
In vivo dosimetry (IVD) is a vital component of modern radiotherapy, ensuring accurate and safe delivery of radiation doses to patients by measuring dose parameters during treatment. This paper provides a comprehensive overview of IVD, covering its fundamental principles, historical development, and the technologies used in clinical practice. Key techniques, including thermoluminescent dosimeters (TLDs), optically stimulated luminescent dosimeters (OSLDs), diodes, metal-oxide-semiconductor field-effect transistors (MOSFETs), and electronic portal imaging devices (EPIDs), are discussed, highlighting their clinical applications, advantages, and limitations. The role of IVD in external beam radiotherapy, brachytherapy, and pediatric treatments is emphasized, particularly its contributions to quality assurance, treatment validation, and error mitigation. Challenges such as measurement uncertainties, technical constraints, and integration into clinical workflows are explored, along with potential solutions and emerging innovations. The paper also addresses future perspectives, including advancements in artificial intelligence, adaptive radiotherapy, and personalized dosimetry systems. This entry underscores the critical role of IVD in enhancing the precision and reliability of radiotherapy, advocating for ongoing research and technological development. Full article
(This article belongs to the Section Medicine & Pharmacology)
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16 pages, 1333 KiB  
Article
Designing and Optimizing a 2.4 GHz Complementary Metal–Oxide-Semiconductor Class-E Power Amplifier Combining Standard and High-Voltage Metal–Oxide-Semiconductor Field-Effect Transistors
by Roberto Cancelli, Gianfranco Avitabile and Antonello Florio
Electronics 2025, 14(6), 1135; https://doi.org/10.3390/electronics14061135 - 13 Mar 2025
Cited by 1 | Viewed by 645
Abstract
The advent of CMOS power amplifiers has enabled compact and cost-effective solutions for RF applications. Among the available options, switching amplifiers are the most competitive due to their superior efficiency. In this paper, we present the design of a fully integrated 130 nm [...] Read more.
The advent of CMOS power amplifiers has enabled compact and cost-effective solutions for RF applications. Among the available options, switching amplifiers are the most competitive due to their superior efficiency. In this paper, we present the design of a fully integrated 130 nm CMOS class-E RF power amplifier optimized for 2.4 GHz ISM band operations that is compliant with the Bluetooth Low Energy (BLE) standard. The amplifier is based on a cascode configuration with charging acceleration capacitance and a combination of standard and high-voltage (HV) MOSFETs, ensuring optimal performance while maintaining device reliability. To identify the best configuration for the proposed circuit, we first provide an overview of basic class-E amplifier operations and critically review optimization techniques proposed in the scientific literature. This review is complemented by a numerical analysis of the potential advantages of using a combined standard-HV MOSFET structure. Post-layout simulations with parasitic parameter extraction demonstrated that the amplifier achieves 40.85% Power Added Efficiency and 20.52 dBm output power. Full article
(This article belongs to the Section Circuit and Signal Processing)
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