Search Results (1,393)

Transparent conductive aluminum-doped zinc oxide (AZO) films were investigated as potential recombination layers for perovskite/silicon tandem solar cells, comparing the results of atomic layer deposition (ALD) and magnetron sputtering (MS) on vertically aligned silicon nanowire (SiNW) scaffolds. Conformality and thickness control were examined by cross-sectional SEM/TEM and profilometry, revealing fully conformal ALD coatings with tunable thicknesses (40–120 nm) versus tip-capped, semi-uniform MS films (100–120 nm). Optical transmission measurements on glass substrates showed that both 120 nm ALD and MS layers exhibit interference maxima near 450–500 nm and 72–89% transmission across 800–1200 nm; the thinnest ALD films reached up to 86% near-IR transparency. Four-point probe analysis demonstrated that ALD reduces surface resistance from 1150 Ω/□ at 40 nm to 245 Ω/□ at 120 nm, while MS layers achieved 317 Ω/□ at 120 nm. These results delineate the balance between conformality, transparency, and conductivity, providing design guidelines for AZO recombination interfaces in next-generation tandem photovoltaics. Full article

Magnetron Sputter Vacuum Deposition (MSVD) has undergone significant advancements since its inception. This review explores the evolution of MSVD, encompassing its fundamental principles, various techniques (including reactive sputtering, pulsed magnetron sputtering, and high-power impulse magnetron sputtering), and its wide-ranging industrial applications. While detailing the advantages of high deposition rates, versatility in material selection, and precise control over film properties, the review also addresses inherent challenges such as low target utilization and plasma instability. A significant portion focuses on the crucial role of MSVD in the automotive industry, highlighting its use in creating durable, high-quality coatings for both aesthetic and functional purposes. The transition from traditional electroplating methods to more environmentally friendly MSVD techniques is also discussed, emphasizing the growing demand for sustainable manufacturing processes. This review concludes by summarizing the key advancements, remaining challenges, and potential future trends in magnetron sputtering technologies. Full article

Ag₂Se has attracted significant attention as a promising alternative to Bi₂Te₃ for near-room-temperature thermoelectric (TE) applications. In this study, flexible Ag₂Se thin films were fabricated via magnetron sputtering under different sputtering power settings, followed by post-deposition annealing to optimize their TE properties. Structural and compositional analyses confirmed the successful synthesis of Ag₂Se films with high crystallinity. Additionally, tuning the sputtering power and annealing temperatures can effectively enhance the electrical conductivity, Seebeck coefficient, and overall power factor. A significant power factor of ~17.4 µW·cm⁻¹·K⁻² at 100 °C was achieved in the 30 W sputtering power and 300 °C annealing sample, pointing out the huge potential of Ag₂Se thin films as self-powered flexible devices. Full article

Chromium–aluminum nitride (CrAlN) coatings were deposited on polished H13 tool steel substrates using direct current (DC) magnetron sputtering. The Cr/Al composition in the target was varied by inserting either four or eight chromium (Cr) plugs into cavities machined into an aluminum (Al) plate target. Nitrogen was introduced as a reactive gas to facilitate the formation of the nitride phase. Coatings were deposited at substrate bias voltages of −30 V, −50 V, and −60 V to study the combined effects of composition and ion energy on coating properties. Compositional analysis of coatings deposited at a −50 V bias revealed Cr/Al ratios of approximately 0.8 and 1.7 for the 4- and 8-plug configurations, respectively. This increase in the Cr/Al ratio led to a 2.6-fold improvement in coating hardness. Coatings produced using the eight-Cr-plug target exhibited a nearly linear increase in hardness with increasing substrate bias voltage. Cross-sectional scanning electron microscopy revealed a uniform bilayer structure consisting of an approximately 0.5 µm metal interlayer beneath a 2–3 µm CrAlN coating. Surface morphology analysis indicated the presence of coarse microdroplets in coatings with the lower Cr/Al ratio. These microdroplets were significantly suppressed in coatings with higher Cr/Al content, especially at increased bias voltages. This suppression is likely due to enhanced ion bombardment associated with the increased Cr content, attributed to Cr’s relatively higher atomic mass compared to Al. Coatings with lower hardness exhibited greater scratch resistance, likely due to the influence of residual compressive stresses. The findings highlight the critical role of both Cr/Al content and substrate bias in tailoring the tribo-mechanical performance of PVD CrAlN coatings for wear-resistant applications. Full article

This study examines the effect of oxygen concentration and sputtering power on the surface morphology of TiO₂ thin films deposited by DC reactive magnetron sputtering. Surface roughness parameters were obtained using MountainsMap^® software(10.2) from SEM images, while fractal dimensions and texture descriptors were extracted via Python-based image processing. Fractal dimension was calculated using the box-counting method applied to binarized images with multiple threshold levels, and texture analysis employed Gray-Level Co-occurrence Matrix (GLCM) statistics to capture local anisotropies and spatial heterogeneity. Four samples were analyzed, previously prepared with oxygen concentrations of 50% and 75%, and sputtering powers of 500 W and 1000 W. The results have shown that films deposited at higher oxygen levels and sputtering powers exhibited increased roughness, higher fractal dimensions, and stronger GLCM contrast, indicating more complex and heterogeneous surface structures. Conversely, films produced at lower oxygen and power settings showed smoother, more isotropic surfaces with lower complexity. This integrated analysis framework links deposition parameters with morphological characteristics, enhancing the understanding of surface evolution and enabling better control of TiO₂ thin film properties. Full article

High-performance hydrogen gas sensors have gained considerable interest for their crucial function in reducing H₂ explosion risk. Although MoS₂ has good potential for chemical sensing, its application in hydrogen detection at room temperature is limited by slow response and incomplete recovery. In this work, Pd-doped MoS₂ thin films are deposited on a Si substrate, forming Pd-doped MoS₂/Si heterojunctions via magnetron co-sputtering. The incorporation of Pd nanoparticles significantly enhances the catalytic activity for hydrogen adsorption and facilitates more efficient electron transfer. Owing to its distinct structural characteristics and sharp interface properties, the fabricated Pd-doped MoS₂/Si heterojunction device exhibits excellent H₂ sensing performance under room temperature conditions. The gas sensor device achieves an impressive sensing response of ~6.4 × 10³% under 10,000 ppm H₂ concentration, representing a 110% improvement compared to pristine MoS₂. Furthermore, the fabricated heterojunction device demonstrates rapid response and recovery times (24.6/12.2 s), excellent repeatability, strong humidity resistance, and a ppb-level detection limit. These results demonstrate the promising application prospects of Pd-doped MoS₂/Si heterojunctions in the development of advanced gas sensing devices. Full article

Cr/Ti bilayer coatings were deposited on 7050 aluminum alloy via magnetron sputtering at substrate temperatures of room temperature (RT), 150 °C, and 300 °C to investigate temperature effects on microstructure, hardness, and corrosion resistance. All coatings exhibited Cr(110) and Ti(002) phases. Temperature significantly modulated corrosion resistance by altering pore density, grain boundary density, and passivation film composition. Increasing temperature from RT to 150 °C raised corrosion rates primarily due to increased pore density. Further increasing to 300 °C reduced corrosion rates mainly through decreased grain boundary density, while passivation film composition changes altered electrochemical reaction kinetics. Substrate-coating interface defect density primarily influenced hardness with minimal effect on corrosion. Consequently, the RT-deposited coating, despite lower hardness, demonstrated optimal corrosion resistance: polarization resistance (7.17 × 10⁴ Ω·cm²), charge transfer resistance (12,400 Ω·cm²), and corrosion current density (2.47 × 10⁻⁷ A/cm²), the latter being two orders of magnitude lower than the substrate. Full article

In recent years, significant attention has been directed toward the development of coating materials capable of tailoring surface properties for various functional applications. Transition metal nitrides, in particular, have garnered interest due to their superior physical and chemical properties, including high hardness, excellent wear resistance, and strong corrosion resistance. In this study, a fabrication process for CrN-based thin films was developed by combining reactive direct current magnetron sputtering (dcMS) with post-deposition annealing in air. CrN coatings were deposited by reactive dcMS using different argon-nitrogen (Ar:N₂) gas ratios (4:1, 3:1, 2:1, and 1:1), followed by annealing at 550 °C for 1.5 h in ambient air. XRD and EDS analysis revealed that this treatment results in the formation of a composite phase comprising CrN and Cr₂O₃. The resulting coating exhibited favorable mechanical and tribological properties, including a maximum hardness of 12 GPa, a low wear coefficient of 0.254 and a specific wear rate of 7.05 × 10⁻⁶ mm³/N·m, making it a strong candidate for advanced protective coating applications. Full article

A comparison of two synthesis methods for depositing Au nanoparticles onto TiO₂ was performed: (1) impregnation with HAuCl₄ followed by thermal treatment in argon, and (2) magnetron sputtering from a Au disc. The obtained materials were used for acetaldehyde decomposition in a high temperature reaction chamber and ch aracterised by UV-Vis/DR, XPS, XRD, SEM, and photoluminescence measurements. The process was carried out using an air/acetaldehyde gas flow under UV or UV-Vis LED irradiation. The mechanism of acetaldehyde decomposition and conversion was elaborated by in situ FTIR measurements of the photocatalyst surface during the reaction. Simultaneously, concentration of acetaldehyde in the outlet gas was monitored using gas chromatography. All the Au/TiO₂ samples showed absorption in the visible region, with a maximum around 550 nm. The plasmonic effect of Au nanoparticles was observed under UV-Vis light irradiation, especially at elevated temperatures such as 100 °C, for Au/TiO₂ prepared by the magnetron sputtering method. This resulted in a significant increase in the conversion of acetaldehyde at the beginning, followed by gradual decrease over time. The collected FTIR spectra indicated that, under UV-Vis light, acetaldehyde was strongly adsorbed onto Au/TiO₂ surface and formed crotonaldehyde or aldol. Under UV, acetaldehyde was mainly adsorbed in the form of acetate species. The plasmonic effect of Au nanoparticles increased the adsorption of acetaldehyde molecules onto TiO₂ surface, while reducing their decomposition rate. The increased temperature of the process enhanced the decomposition of the acetaldehyde. Full article

Memristors with resistive switching capabilities are vital for information storage and brain-inspired computing, making them a key focus in current research. This study demonstrates non-volatile analog resistive switching behavior in Al/TiO_x/TiN/Si(n⁺⁺)/Al memristive devices. Analog resistive switching offers gradual, controllable conductance changes, which are essential for mimicking brain-like synaptic behavior, unlike digital/abrupt switching. The amorphous titanium oxide (TiO_x) active layer was deposited using the pulsed-DC reactive magnetron sputtering technique. The impact of increasing the oxide thickness on the electrical performance of the memristors was investigated. Electrical characterizations revealed stable, forming-free analog resistive switching, achieving endurance beyond 300 DC cycles. The charge conduction mechanisms underlying the current–voltage (I–V) characteristics are analyzed in detail, revealing the presence of ohmic behavior, Schottky emission, and space-charge-limited conduction (SCLC). Experimental results indicate that increasing the TiO_x film thickness from 31 to 44 nm leads to a notable change in the current conduction mechanism. The results confirm that the memristors have good stability (>1500 s) and are capable of exhibiting excellent long-term potentiation (LTP) and long-term depression (LTD) properties. The analog switching driven by oxygen vacancy-induced barrier modulation in the TiO_x/TiN interface is explained in detail, supported by a proposed model. The remarkable switching characteristics exhibited by the TiO_x-based memristive devices make them highly suitable for artificial synapse applications in neuromorphic computing systems. Full article

Lead ferrite (Pb₂Fe₂O₅) is a promising multiferroic material that exhibits both ferroelectric and magnetic properties at room temperature. This study investigates how substituting niobium and adjusting the synthesis temperature affect the structural, morphological, and ferroelectric properties of lead ferrite thin films deposited via reactive magnetron sputtering. Niobium-substituted PFO films (Pb₂Fe_2(1−x)Nb_2xO₅), where x corresponds to Nb₂O₅ contents of 3 wt.%, 5 wt.% and 10 wt.%, were prepared for this study, and denoted as PFONb3, PFONb5 and PFONb10, respectively. X-ray diffraction analysis confirmed the formation of Nb-substituted PFO phases, while polarization–electric field measurements demonstrated an increase in remnant polarization (P_r), with higher Nb content reaching a maximum P_r of 65 µC/cm² at 10 wt.% Nb and a substrate temperature of 500 °C. Scanning electron microscopy and energy-dispersive spectroscopy revealed a uniform distribution of elements and a well-defined surface structure. These results highlight the need to fine tune synthesis parameters, such as temperature and substitution concentrations, to achieve optimal ferroelectric characteristics. Full article

This study investigates the development of silver (Ag)-doped zirconia (ZrO₂) coatings deposited on 316LVM stainless steel via the unbalanced magnetron sputtering technique. The oxygen content in the Ar/O₂ gas mixture was systematically varied (12.5%, 25%, 37.5%, and 50%) to assess its influence on the resulting coating properties. In response to the growing demand for biomedical implants with improved durability and biocompatibility, the objective was to develop coatings that enhance both wear and corrosion resistance in physiological environments. The effects of silver incorporation and oxygen concentration on the structural, tribological, and electrochemical behavior of the coatings were systematically analyzed. X-ray diffraction (XRD) was employed to identify crystalline phases, while atomic force microscopy (AFM) was used to characterize surface topography prior to wear testing. Wear resistance was evaluated using a ball-on-plane tribometer under simulated prosthetic motion, applying a 5 N load with a bone pin as the counter body. Corrosion resistance was assessed through electrochemical impedance spectroscopy (EIS) in a physiological solution. Additionally, tribocorrosive performance was investigated by coupling tribological and electrochemical tests in Ringer’s lactate solution, simulating dynamic in vivo contact conditions. The results demonstrate that Ag doping, combined with increased oxygen content in the sputtering atmosphere, significantly improves both wear and corrosion resistance. Notably, the ZrO₂-Ag coating deposited with 50% O₂ exhibited the lowest wear volume (0.086 mm³) and a minimum coefficient of friction (0.0043) under a 5 N load. This same coating also displayed superior electrochemical performance, with the highest charge transfer resistance (38.83 kΩ·cm²) and the lowest corrosion current density (3.32 × 10⁻⁸ A/cm²). These findings confirm the high structural integrity and outstanding tribocorrosive behavior of the coating, highlighting its potential for application in biomedical implant technology. Full article

Aluminum nitride (AlN) thin films were deposited on SiO₂ substrates by RF-magnetron sputtering at varying powers (110–140 W) and subsequently subjected to thermal annealing at 450 °C under nitrogen atmosphere. A comprehensive multi-technique investigation—including X-ray reflectometry (XRR), X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), optical profilometry, spectroscopic ellipsometry (SE), and electrical measurements—was performed to explore the physical structure, morphology, and optical and electrical properties of the films. The analysis of the film structure by XRR revealed that increasing sputtering power resulted in thicker, denser AlN layers, while thermal treatment promoted densification by reducing density gradients but also induced surface roughening and the formation of island-like morphologies. Optical studies confirmed excellent transparency (>80% transmittance in the near-infrared region) and demonstrated the tunability of the refractive index with sputtering power, critical for optoelectronic applications. The electrical characterization of Au/AlN/Al sandwich structures revealed a transition from Ohmic to trap-controlled space charge limited current (SCLC) behavior under forward bias—a transport mechanism frequently present in a material with very low mobility, such as AlN—while Schottky conduction dominated under reverse bias. The systematic correlation between deposition parameters, thermal treatment, and the resulting physical properties offers valuable pathways to engineer AlN thin films for next-generation optoelectronic and high-frequency device applications. Full article

This study investigates the fabrication, nanomechanical behavior, and tribological performance of nanostructured superlattice coatings (NSCs) composed of alternating TiAlSiNb-N/TiCr-CN bilayers. Deposited via High-Power Ion-Plasma Magnetron Sputtering (HiPIPMS) onto 100Cr6 steel substrates, the coatings achieved nanohardness values of ~25 GPa and elastic moduli up to ~415 GPa. A novel empirical method was applied to extract stress–strain field (SSF) gradient and divergence profiles from nanoindentation load–displacement data. These profiles revealed complex, depth-dependent oscillations attributed to alternating strain-hardening and strain-softening mechanisms. Fourier analysis identified dominant spatial wavelengths, DWL, ranging from 4.3 to 42.7 nm. Characteristic wavelengths WL1 and WL2, representing fine and coarse oscillatory modes, were 8.2–9.2 nm and 16.8–22.1 nm, respectively, aligning with the superlattice period and grain-scale features. The hyperfine structure exhibited non-stationary behavior, with dominant wavelengths decreasing from ~5 nm to ~1.5 nm as the indentation depth increased. We attribute the SSF gradient and divergence spatial oscillations to alternating strain-hardening and strain-softening deformation mechanisms within the near-surface layer during progressive loading. This cyclic hardening–softening behavior was consistently observed across all NSC samples, suggesting it represents a general phenomenon in thin film/substrate systems under incremental nanoindentation loading. The proposed SSF gradient–divergence framework enhances nanoindentation analytical capabilities, offering a tool for characterizing thin-film coatings and guiding advanced tribological material design. Full article

Stainless steel (SS) is one of the materials most commonly utilized for fabrication of medical implants and its properties are often improved by deposition of protective coatings. This study investigates certain physico-chemical and biological properties of SS substrate coated with multilayer thin film consisting of titanium nitride and silver layers (TiN-Ag film). TiN-Ag films were deposited on the surface of AISI 316 SS substrate by a combination of cathodic arc evaporation and DC magnetron sputtering. SS substrate was analyzed by TEM, while deposited coatings were analyzed by SEM, EDS and wettability measurements. Also, mitochondrial activity assay, and osteogenic and chondrogenic differentiation were performed on dental pulp stem cells (DPSCs). SEM and EDS revealed excellent adhesion between coatings’ layers, with the top layer predominantly composed of Ag, which is responsible for antibacterial properties. TiN-Ag film exhibited moderately hydrophilic behaviour which is desirable for orthopedic implant applications. Biological assays revealed significantly higher mitochondrial activity and enhanced osteogenic and chondrogenic differentiation of DPSC on TiN-Ag films compared to TiN films. The newly designed TiN-Ag coatings showed a great potential for the surface modification of SS implants, and further detailed investigations will explore their suitability for application in clinical practice. Full article