Search Results (23)

The long-term stability of biodegradable polymer coatings deposited by matrix-assisted pulsed laser evaporation (MAPLE) remains insufficiently understood, particularly under ultraviolet irradiation conditions where photochemical effects may accompany material transfer. In this work, thin films of poly(lactide-co-caprolactone)-block-poly(ethyleneglycol)-block-poly(lactide-co-caprolactone), also known as PLCL-PEG-PLCL, are deposited from chloroform solutions by UV-MAPLE using a nanosecond Nd:YAG laser operating at 266 nm over a wide laser fluence range (0.25–0.9 J/cm²). The effect of laser fluence on the morphological, structural, and chemical evolution of the coatings is investigated by atomic force microscopy (AFM), scanning electron microscopy (SEM), Fourier-transform infrared spectroscopy (FTIR), energy-dispersive X-ray spectroscopy (EDS), focused ion beam scanning electron microscopy (FIB-SEM), and X-ray diffraction (XRD). At low laser fluence, relatively homogeneous coatings are obtained while largely preserving the characteristic functional groups of the triblock copolymer. Increasing the laser fluence progressively induces surface restructuring phenomena, including droplets, wrinkles, and the appearance of highly symmetric faceted structures. These entities develop preferentially in samples deposited at elevated fluence and frequently appear only after prolonged aging under ambient conditions, revealing delayed recrystallization behaviour associated with metastable species generated during the deposition process. EDS analyses reveal localized chlorine enrichment within the faceted structures, while FIB-SEM investigations show porous internal morphologies. XRD confirms that the polymer matrix remains predominantly amorphous. The combined observations suggest that UV-MAPLE deposition from chloroform involves not only physical material transfer but also photochemical processes that promote decomposition, recombination, and delayed crystallization phenomena. A phenomenological model describing the successive stages of surface evolution, aging, and recrystallization is proposed. These results provide new insight into the long-term evolution of laser-deposited biodegradable polymer coatings and highlight the importance of solvent selection and processing conditions in determining their stability. Full article

This study aims to reduce the phase transition temperature (PTT) of W-doped vanadium dioxide (VO₂) multilayer thin films. We designed and fabricated two asymmetric multilayer thin film structures; namely, TiO₂/VO₂-5%W/ITO and ITO/VO₂-5%W/TiO₂. The W-doped VO₂-based Trilayer thin films were deposited using an electron beam evaporation combined with the ion-assisted deposition (IAD) technique. An experimental study was conducted on the temperature-dependent residual stress and optical properties of the two asymmetric VO₂-based three-layer structures. The VO₂-based thin films were characterized using UV–Vis–NIR spectrophotometry, Fourier transform infrared spectroscopy (FTIR), Raman spectroscopy, and an improved Twyman–Green interferometer combined with fast Fourier transform (FFT) analysis for residual stress measurement. The trilayer structures incorporated a ~60 nm thick W-doped VO₂ middle layer, which plays a critical role in modulating thermochromic behavior and residual stress evolution. The results show that both trilayer thin films demonstrated excellent optical performance in transmission spectra. Raman spectral analysis revealed a blue shift in the characteristic W-doped VO₂ peaks, accompanied by a decrease in peak intensity as the temperature increased. Heating experiments on asymmetric W-doped VO₂ trilayer thin films revealed that the critical transition temperature of the ITO/VO₂-5%W/TiO₂/B270 trilayer film structure was significantly reduced to 45 °C. This demonstrates the effectiveness of our proposed multilayer film design in improving the PTT of W-doped VO₂ thin films. Analysis of the changes in residual stress of the trilayer thin films during heating experiments revealed that the residual stress shifted from compressive to tensile in the temperature range of 40 °C to 50 °C. The thermal expansion coefficient and biaxial modulus of the TiO₂/VO₂-5%W/ITO trilayer film structure were 5.37 × 10⁻⁶ °C⁻¹ and 295.7 GPa, respectively. In addition, the thermal expansion coefficient and biaxial modulus of the ITO/VO₂-5%W/TiO₂ trilayer film structure were 6.65 × 10⁻⁶ °C⁻¹ and 745.0 GPa. Full article

Biocompatible thin films are essential for advancing biomedical devices, as they enhance integration with biological tissues, improve device longevity, and reduce complications. The rapid evolution of both medical needs and materials science has led to a diverse array of deposition techniques, each offering unique advantages and challenges for tailoring surface properties without compromising the bulk characteristics of implants and sensors. While laser-based methods—such as pulsed laser deposition (PLD) and Matrix-Assisted Pulsed Laser Evaporation (MAPLE)—are renowned for their precision, ability to preserve complex material stoichiometry, and suitability for low-temperature processing, the broader landscape includes several other important approaches. Physical Vapor Deposition (PVD) techniques, including magnetron sputtering and pulsed electron deposition, are widely used for their ability to create uniform, adherent coatings with controlled thickness and composition, making them suitable for both hard and soft biomedical substrates. Chemical Vapor Deposition (CVD) and its plasma-enhanced variant (PECVD) offer conformal coatings and excellent control over film chemistry, which is particularly valuable for functional polymer and ceramic films. Other methods, such as sol–gel processing, ion beam deposition, and electrophoretic deposition, provide additional flexibility in terms of coating composition, adhesion, and processing temperature, allowing for the fabrication of films with tailored mechanical, chemical, and biological properties. Despite these advances, the field faces ongoing challenges in optimizing film properties for specific clinical applications, ensuring reproducibility, and scaling up production for widespread use. The necessity of this review lies in its comprehensive comparison of laser-based techniques with alternative deposition methods, providing critical insights into their respective strengths, limitations, and suitability for different biomedical scenarios. By synthesizing recent developments and highlighting current gaps, this review aims to guide researchers and clinicians in selecting the most appropriate thin-film deposition strategies to meet the evolving demands of next-generation biomedical devices. Full article

Tantalum pentoxide (Ta₂O₅) films deposited on fused silica substrates are critical components of high-power laser systems. Ion-assisted electron beam evaporation (IAD-EBE) is the mainstream technique for fabricating Ta₂O₅ films. However, it commonly requires extensive experimental efforts for deposition quality optimization, while each coating cycle is extremely time-consuming. To solve this issue, this work establishes a dataset targeting the surface roughness (Rq) and refractive index (n) of Ta₂O₅ films using atomic force microscopy, as well as ellipsometer and deposition experiments. Influence of assisting ion source beam voltage (V)/current (I) and Ar (Q₁)/O₂ (Q₂) flow rate on the n and Rq of Ta₂O₅ films are analyzed. Combining energy-field mechanism analysis with a Bayesian optimization approach (PI-BO), both deposition quality prediction and feature analysis of process parameters are achieved. The determination coefficient/mean absolute error for the prediction models of n and Rq reach 0.927/0.013 nm and 0.821/0.049 nm, respectively. Based on sensitivity analysis, the weight factors of V, I, Q₁, and Q₂ affecting n/Rq of Ta₂O₅ films are determined to be 0.616/0.274, 0.199/0.144, 0.113/0.582, and 0.072/0.000. V and Q₂ are identified as the core factors for regulating deposition quality. The optimal ranges for V and Q₂ are 600~700 V and 70~80 sccm, respectively. This study proposes a PI-BO method for predicting Rq and n of Ta₂O₅ films under small-data conditions, while determining the preferred parameter ranges and their sensitivity weight factors. These findings provide effective theoretical support and technical guidance for IAD-EBE strategy design and optimization of optical films in high-power laser systems. Full article

This study investigates the effects of different tungsten (W) doping contents on the optical transmittance, surface roughness, residual stress, and microstructure of evaporated vanadium dioxide (VO₂) thin films. W-doped VO₂ thin films with varying tungsten concentrations were fabricated using electron beam evaporation combined with ion-assisted deposition techniques, and deposited on silicon wafers and glass substrates. The optical transmittances of undoped and W-doped VO₂ thin films were measured by UV/VIS/NIR spectroscopy and Fourier transform infrared (FTIR) spectroscopy. The root mean square surface roughness was measured using a Linnik microscopic interferometer. The residual stress in various W-doped VO₂ films was evaluated using a modified Twyman–Green interferometer. The surface morphological and structural characterization of the W-doped VO₂ thin films were performed by field-emission scanning electron microscopy (FE-SEM) and X-ray diffraction (XRD). Raman spectroscopy was used to analyze the structure and vibrational modes of different W-doped VO₂ thin films. These results show that the addition of tungsten significantly alters the structural, optical, and mechanical properties of VO₂ thin films. Full article

This study explores the surface characteristics evaluation and performance optimization of tungsten (W)-doped vanadium dioxide (VO₂) thin films. W-doped vanadium dioxide films were deposited on B270 glass substrates using an electron beam evaporation technique combined with the ion beam-assisted deposition (IAD) method. The Taguchi method was used to analyze the performance optimization of VO₂ thin films, and L₁₆ orthogonal array design and Minitab software were used for optimization calculations. The surface roughness, visible light transmittance, infrared transmittance, and residual stress of un-doped and tungsten-doped (3–5%) VO₂ thin films are set as the quality performance indicators of thin films. The goal is to identify the key factors that affect the performance of VO₂ thin films during deposition and optimize their process parameters. The experimental results showed that a VO₂ thin film with 3% tungsten doping, an oxygen flow rate of 60 sccm, a heating temperature of 280 °C, and a film thickness of 60 nm exhibited the lowest surface roughness of 2.12 nm. A VO₂ thin film with 5% tungsten doping, an oxygen flow rate of 0 sccm, a heating temperature of 280 °C, and a film thickness of 60 nm had the highest visible light transmittance at 64.33%. When the oxygen flow rate was 60 sccm, the heating temperature was 295 °C, the film thickness was 150 nm, and the tungsten doping was 5%, the VO₂ thin film showed the lowest infrared transmittance of 31.34%. A thin film with 5% tungsten doping, an oxygen flow rate of 20 sccm, a heating temperature of 265 °C, and a film thickness of 120 nm exhibited the lowest residual stress of −0.195 GPa. Full article

We present a high-sensitivity fiber optic soil moisture sensor based on side-polished multimode fibers and lossy mode resonance (LMR). The multimode fibers (MMFs), after side-polishing to form a D-shaped structure, are coated with a single-layer SnO₂ thin film by electron beam evaporation with ion-assisted deposition technology. The LMR effect can be obtained when the refractive index of the thin film is positive and greater than its extinction coefficient and the real part of the external medium permittivity. The D-shaped fiber optic soil moisture sensor was placed in soil, allowing moisture to penetrate into the thin film microstructure, and it observed the resonance wavelength shift in LMR spectra to measure the relative humidity change in soil. Meanwhile, an Arduino electronic soil moisture sensing module was used as the experimental control group, with soil relative humidity ranging from 10%RH to 90%RH. We found that the D-shaped fiber with a residual thickness of 93 μm and SnO₂ thin film thickness of 450 nm had a maximum sensitivity of 2.29 nm/%RH, with relative humidity varying from 10%RH to 90%RH. The D-shaped fiber also demonstrates a fast response time and good reproducibility. Full article

This study aims to investigate the thermomechanical properties of vanadium dioxide (VO₂) thin films. A VO₂ thin film was simultaneously deposited on B270 and H-K9L glass substrates by electron-beam evaporation with ion-assisted deposition. Based on optical interferometric methods, the thermal–mechanical behavior of and thermal stresses in VO₂ films can be determined. An improved Twyman–Green interferometer was used to measure the temperature-dependent residual stress variations of VO₂ thin films at different temperatures. This study found that the substrate has a great impact on thermal stress, which is mainly caused by the mismatch in the coefficient of thermal expansion (CTE) of the film and the substrate. By using the dual-substrate method, thermal stresses in VO₂ thin films from room temperature to 120 °C can be evaluated. The thermal expansion coefficient is 3.21 × 10⁻⁵ °C⁻¹, and the biaxial modulus is 517 GPa. Full article

The undoped and tungsten (W)-doped vanadium dioxide (VO₂) thin films were prepared by electron beam evaporation associated with ion-beam-assisted deposition (IAD). The influence of different W-doped contents (3–5%) on the electrical, optical, structural, and thermo-mechanical properties of VO₂ thin films was investigated experimentally. Spectral transmittance results showed that with the increase in W-doped contents, the transmittance in the visible light range (400–750 nm) decreases from 60.2% to 53.9%, and the transmittance in the infrared wavelength range (2.5 μm to 5.5 μm) drops from 55.8% to 15.4%. As the W-doped content increases, the residual stress in the VO₂ thin film decreases from −0.276 GPa to −0.238 GPa, but the surface roughness increases. For temperature-dependent spectroscopic measurements, heating the VO₂ thin films from 30 °C to 100 °C showed the most significant change in transmittance for the 5% W-doped VO₂ thin film. When the heating temperature exceeds 55 °C, the optical transmittance drops significantly, and the visible light transmittance drops by about 11%. Finally, X-ray diffraction (XRD) and scanning electron microscope (SEM) were used to evaluate the microstructure characteristics of VO₂ thin films. Full article

Ion beam-assisted deposition (IBAD) has been proposed as a promising texturing technology that uses the film epitaxy method to obtain biaxial texture on a non-textured metal or compound substrate. Magnesium oxide (MgO) is the most well explored texturing material. In order to obtain the optimal biaxial texture, the actual thickness of the IBAD-MgO film must be controlled within 12nm. Due to the bombardment of ion beams, IBAD-MgO has large lattice deformation, poor texture, and many defects in the films. In this work, the solution deposition planarization (SDP) method was used to deposit oxide amorphous Y₂O₃ films on the surface of Hastelloy C276 tapes instead of the electrochemical polishing, sputtering-Al₂O₃ and sputtering-Y₂O₃ in the commercialized buffer layer. An additional homogeneous epitaxy MgO (epi-MgO) layer, which was used to improve the biaxial texture in the IBAD-MgO layer, was deposited on the IBAD-MgO layer by electron-beam evaporation. The effects of growth temperature, film thickness, deposition rate, and oxygen pressure on the texture and morphology of the epi-MgO film were systematically studied. The best full width at half maximum (FWHM) values were 2.2° for the out-of-plane texture and 4.8° for the in-plane texture for epi-MgO films, respectively. Subsequently, the LaMnO₃ cap layer and YBa₂Cu₃O₇-x (YBCO) functional layer were deposited on the epi-MgO layer to test the quality of the MgO layer. Finally, the critical current density of the YBCO films was 6 MA/cm² (77 K, 500 nm, self-field), indicating that this research provides a high-quality MgO substrate for the YBCO layer. Full article

This study presents the optimal process parameters of zirconium nitride (ZrN) thin films prepared by ion-assisted deposition (IAD) technology combined with electron-beam evaporation based on plasma surface treatment and the Taguchi method. We use Minitab statistical software (Version 20.2.0) and L9 orthogonal array parameter design combined with the response surface method (RSM). The quadratic polynomial regression equation was optimized by the RSM. Based on the control factor screening test of the Taguchi method, we determined the most critical factor combination for the process and derived the optimized process parameters of the ZrN thin films. In the coating experiments, we successfully achieved the optimal combination of good refractive index, adequate residual stress, and lower surface roughness on B270 glass substrates. These results indicate that the optimized preparation process can simultaneously achieve several desirable properties, improving the performance and application of ZrN thin films. Furthermore, our research method not only reduces the number of experiments and costs but also improves the efficiency of research and development. By screening key factors and optimizing process parameters, we can find the best process parameter more rapidly, reduce the demand for expenses given materials and equipment costs, and contribute to improving the electron-beam evaporation process. According to the experimental results, it can be observed that under certain conditions, the properties of ZrN thin films reached optimal values. These results are highly useful for optimizing the process parameters of ZrN thin films and provide a basis for further improvement of the thin film properties. Full article

We propose two single-wavelength notch filters and one dual-wavelength (480 and 620 nm) notch filter to enhance image contrast. The stack structure of the notch filters was designed as (Ta₂O₅/SiO₂)⁴Ta₂O₅ in Essential Macleod thin film simulation software. Dual-electron-beam evaporation with ion beam-assisted deposition was used to prepare optical interference filters with different center wavelengths. A multilayer notch filter with a center wavelength of 620 nm was deposited on the front surface of the glass, and then a notch filter with a center wavelength of 480 nm was coated on the rear surface of the same glass. The proposed dual-wavelength (480 and 620 nm) notch filter is a combination of two single-wavelength notch filters coated on a double-sided glass substrate to compensate for residual stress. The transmittance, residual stress, and surface roughness of the proposed notch filter were evaluated using different measuring instruments. The experimental results show that the residual stress of the dual-wavelength notch filter could be reduced to 10.8 MPa by using a double-sided coating technique. The root-mean-square (RMS) surface roughness of the notch filters was measured by using a Linnik microscopic interferometer. The RMS surface roughness was 1.80 for the 620 nm notch filter and 2.09 for the 480 nm notch filter. The image contrast obtained with the three different notch filters was measured using an optical microscope and a CMOS camera. The contrast value could be increased from 0.328 (without a filter) to 0.696 (dual-wavelength notch filter). Full article

The design and fabrication approach of a dichroic beamsplitter to meet the protection requirements of infrared detectors for blinding laser weapons is presented. The dichroic beamsplitter must protect against 1064 and 532 nm lasers and have high transmittance in the detection beam band of 3.6–4.7 µm. In order to realize the protection and antireflection (AR) functions of the dichroic beamsplitter, Ta₂O₅, which has a wide band gap and high thermodynamic stability, was selected as the high-refractive-index material. A multilayer stack was deposited on a silicon substrate by ion-assisted electron beam evaporation. The manufactured dichroic beamsplitter features a high laser-induced damage threshold (LIDT), excellent spectral characteristics in the requested spectral region, and good environmental stability. Full article

In this study, three amorphous oxide thin films are prepared by an electron beam evaporation combined with ion-assisted deposition technique. With the aid of optical flux mapping method, thin film thickness distribution with good uniformity can be obtained by appropriate coating masks. Three metal oxide single-layer thin films are SiO₂, Ta₂O₅ and Nb₂O₅, respectively. These thin films were deposited on a substrate holder with a radius of 275 mm that was divided into five different segments. Based on the optical flux mapping method, we can effectively simulate the geometric dimensions of the coating mask and obtain the width of the coating mask at different segments. If the film thickness uniformity is a function of masking area and center angle, it is necessary to determine the thickness distribution of the different segments and use a surface profiler to accurately measure the film thickness. We analyzed the thickness uniformity of three oxide films deposited at five different segments. The experimental measurement results show that the deviation of thickness uniformity is 0.38% for SiO₂, 0.36% for Ta₂O₅, and 0.15% for Nb₂O₅ thin films, respectively. Full article

This study presents a multilayer design and fabrication of an optical notch filter for enhancing visual quality. A cost-effective multilayer design of notch filter with low surface roughness and low residual stress is proposed. A 9-layer notch filter composed of SiO₂ and Nb₂O₅ with a central wavelength of 480 nm is prepared by electron beam evaporation combined with ion-assisted deposition. The optical transmittance, residual stress, and surface morphology are measured by a UV/VIS/NIR spectrophotometer, Twyman-Green interferometer and field emission scanning electron microscopy (FE-SEM). The transmittance of the notch filter at the central wavelength is above 15%, and the average transmittance of the transmission band is about 80%. The residual stress of the notch filter is −0.235 GPa, and the root mean square surface roughness is 1.85 nm. For improving the visual quality, a good image contrast can be obtained by observing the microscopic image using the proposed notch filter. Full article