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Special Issue "Atomic Layer Deposition: From Thin Films to Nanostructured Materials"
A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Thin Films and Interfaces".
Deadline for manuscript submissions: 10 August 2023 | Viewed by 123
Special Issue Editor
Interests: atomic layer deposition; photocatalysis; electrospinning; nanomaterials; sensors; thin films
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Special Issue Information
Atomic layer deposition (ALD) is an ultrathin film deposition method. This technique allows the deposition of various materials (oxides, nitrides, metals, etc.) with a thickness control at the nanometric scale, as well as excellent uniformity and conformality.
The aim of this Special Issue is to assemble high-quality contributions on the deposition of thin films as well as the synthesis and modification of nanostructures using ALD. It will deal with the design of new thin films and nanostructures by tuning their morphology, geometry, crystallinity, and interfaces. The relation between these parameters and the physical–chemical properties will also be investigated. New applications in different fields, such as health, the environment, renewable energy, microelectronics, etc., will be also explored.
Relevant contributions related to prospective materials’ design, original materials’ properties, and innovative characterization techniques will also be considered.
Dr. Mikhael Bechelany
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2300 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
- thin film
- nanostructured material
- porous materials