Special Issue "Advances in Chemical Vapor Deposition"
A special issue of Materials (ISSN 1996-1944).
Deadline for manuscript submissions: 31 August 2019.
We would like to invite you to submit your work to a Special Issue on “Advances in Chemical Vapor Deposition”. Chemical Vapor Deposition (CVD) is a process for producing solid products from gases. In a typical process, the reactants are transported to the substrate surface in the form of vapors and gases involving the dissociation and/or chemical reactions of gaseous reactants in an activated environment. CVD offers a compromise between efficiency, controllability and repeatability in the coverage of substrates for a range of applications including polymer coatings, large-screen displays, solar cells etc. The aim of this Special Issue is to give an overview of the latest experimental findings and identify the growth parameters and characteristics with desired qualities in terms of producing potentially useful devices.
Dr. Dimitra Vernardou
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1800 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
The below list represents only planned manuscripts. Some of these manuscripts have not been received by the Editorial Office yet. Papers submitted to MDPI journals are subject to peer-review.
Authors: Charalampos S. Drosos and Ivan P. Parkin
2. Author: Dimitra Vernardou
3. Author: Patricio Häberle