Thin Films: Application of Optical and Electronic Devices
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".
Deadline for manuscript submissions: closed (20 July 2021) | Viewed by 11726
Special Issue Editor
Interests: new materials; processing and design; integrated systems; 3d integration; semiconductor materials; process and integration; energy materials; microstructural evolution; characterization and reliabilities
Special Issue Information
Dear Colleagues,
Thin film materials and processes are widely applied to optical devices, electronic devices, sensors, energy, displays, and especially semiconductors. These thin film materials are deposited using metals, ceramics, dielectrics, carbon materials, composites, and hybrid materials, and are widely applied to the electronics industry, such as the semiconductors mentioned above. In addition, these thin film materials are made by various processes such as PVD (Physically Vapor Deposition), CVD (Chemically Vapor Deposition), ALD (Atomic Layer Deposition), electroplating, and electroless plating. Development of high-performance optics, energy, sensors, displays, and semiconductors requires the development of new thin film materials and processes. Therefore, this Special Issue aims to publish a new thin film material and deposition process that can be applied to various new devices.
In particular, the topics of interest include but are not limited to:
- Thin film materials;
- Thin film processing;
- Sensor materials and processing;
- Optical and electronics materials.
Guest Editor
Manuscript Submission Information
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