4H-SiC/SiO2 Interface Degradation in 1.2 kV 4H-SiC MOSFETs Due to Power Cycling Tests
Abstract
:1. Introduction
2. Materials and Methods
3. Results and Discussion
3.1. Stress Symptoms of the Surroundings
3.2. Pattern of Degradation at a 4H-SiC/SiO2 Interface
4. Conclusions
Author Contributions
Funding
Data Availability Statement
Conflicts of Interest
Correction Statement
References
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ΔTj (℃) | Tjmax (℃) | ton (s) | toff (s) | VGS,on (V) | VGS,off (V) | IS (mA) | IH (A) | Von (%) |
---|---|---|---|---|---|---|---|---|
110 | 170 | 2 | 4 | 18 | −5 | −80 | 22.3 | 120% |
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Yoo, D.; Kim, M.; Kang, I.; Lee, H.-J. 4H-SiC/SiO2 Interface Degradation in 1.2 kV 4H-SiC MOSFETs Due to Power Cycling Tests. Electronics 2024, 13, 1267. https://doi.org/10.3390/electronics13071267
Yoo D, Kim M, Kang I, Lee H-J. 4H-SiC/SiO2 Interface Degradation in 1.2 kV 4H-SiC MOSFETs Due to Power Cycling Tests. Electronics. 2024; 13(7):1267. https://doi.org/10.3390/electronics13071267
Chicago/Turabian StyleYoo, Dahui, MiJin Kim, Inho Kang, and Ho-Jun Lee. 2024. "4H-SiC/SiO2 Interface Degradation in 1.2 kV 4H-SiC MOSFETs Due to Power Cycling Tests" Electronics 13, no. 7: 1267. https://doi.org/10.3390/electronics13071267
APA StyleYoo, D., Kim, M., Kang, I., & Lee, H.-J. (2024). 4H-SiC/SiO2 Interface Degradation in 1.2 kV 4H-SiC MOSFETs Due to Power Cycling Tests. Electronics, 13(7), 1267. https://doi.org/10.3390/electronics13071267