Heavy Ion Characterization of a Radiation Hardened Flip-Flop Optimized for Subthreshold Operation. J. Low Power Electron. Appl. 2012, 2, 168-179
References
- Chavan, A.; Palakurthi, P.; MacDonald, E.; Neff, J.; Bozeman, E. Hardened Flip-Flop Optimized for Subthreshold Operation Heavy Ion Characterization of a Radiation. J. Low Power Electron. Appl. 2012, 2, 168–179. [Google Scholar] [CrossRef]
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Chavan, A.; Palakurthi, P.; MacDonald, E.; Neff, J.; Bozeman, E. Heavy Ion Characterization of a Radiation Hardened Flip-Flop Optimized for Subthreshold Operation. J. Low Power Electron. Appl. 2012, 2, 168-179. J. Low Power Electron. Appl. 2012, 2, 210. https://doi.org/10.3390/jlpea2040210
Chavan A, Palakurthi P, MacDonald E, Neff J, Bozeman E. Heavy Ion Characterization of a Radiation Hardened Flip-Flop Optimized for Subthreshold Operation. J. Low Power Electron. Appl. 2012, 2, 168-179. Journal of Low Power Electronics and Applications. 2012; 2(4):210. https://doi.org/10.3390/jlpea2040210
Chicago/Turabian StyleChavan, Ameet, Praveen Palakurthi, Eric MacDonald, Joseph Neff, and Eric Bozeman. 2012. "Heavy Ion Characterization of a Radiation Hardened Flip-Flop Optimized for Subthreshold Operation. J. Low Power Electron. Appl. 2012, 2, 168-179" Journal of Low Power Electronics and Applications 2, no. 4: 210. https://doi.org/10.3390/jlpea2040210
APA StyleChavan, A., Palakurthi, P., MacDonald, E., Neff, J., & Bozeman, E. (2012). Heavy Ion Characterization of a Radiation Hardened Flip-Flop Optimized for Subthreshold Operation. J. Low Power Electron. Appl. 2012, 2, 168-179. Journal of Low Power Electronics and Applications, 2(4), 210. https://doi.org/10.3390/jlpea2040210