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Internally Oxidized Ru–Zr Multilayer Coatings
- Yung-I Chen,
- Tso-Shen Lu and
- Zhi-Ting Zheng
In this study, equiatomic Ru–Zr coatings were deposited on Si wafers at 400 °C by using direct current magnetron cosputtering. The plasma focused on the circular track of the substrate holder and the substrate holder rotated at speeds within 1–30 rpm...

