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Article

Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films

1
FMN Laboratory, Bauman Moscow State Technical University, Moscow 105005, Russia
2
Dukhov Automatics Research Institute, (VNIIA), Moscow 127055, Russia
3
Institute for Theoretical and Applied Electromagnetics RAS, Moscow 125412, Russia
*
Authors to whom correspondence should be addressed.
Appl. Sci. 2019, 9(20), 4441; https://doi.org/10.3390/app9204441
Received: 25 September 2019 / Revised: 13 October 2019 / Accepted: 15 October 2019 / Published: 19 October 2019
(This article belongs to the Special Issue Light Matter Interaction at Nanoscale: What Matters Most)
Nanoplasmonic waveguides utilizing surface plasmon polaritons (SPPs) propagation have been investigated for more than 15 years and are now well understood. Many researchers make their efforts to find the best ways of using light and overcoming the speed limit of integrated circuits by means of SPPs. Here, we introduce the simulation results and fabrication technology of dielectric-metal-dielectric long-range nanoplasmonic waveguides, which consists of a multilayer stack based on ultrathin noble metals in between alumina thin films. Various waveguide topologies are simulated to optimize all the geometric and multilayer stack parameters. We demonstrate the calculated propagation length of Lprop = 0.27 mm at the 785 nm wavelength for the Al2O3/Ag/Al2O3 waveguides. In addition, we numerically show the possibility to eliminate signal cross-talks (less than 0.01%) between two crossed waveguides. One of the key technology issues of such waveguides’ nanofabrication is a dry, low-damage-etching of a multilayer stack with extremely sensitive ultrathin metals. In this paper, we propose the fabrication process flow, which provides both dry etching of Al2O3/Au(Ag)/Al2O3 waveguides nanostructures with high aspect ratios and non-damage ultrathin metal films patterning. We believe that the proposed design and fabrication process flow provides new opportunities in next-generation photonic interconnects, plasmonic nanocircuitry, quantum optics and biosensors. View Full-Text
Keywords: nanoplasmonic waveguide; plasmonic nanocircuitry; low-damage alumina etch; multilayer waveguide; noble metals etching; multilayer stack etching nanoplasmonic waveguide; plasmonic nanocircuitry; low-damage alumina etch; multilayer waveguide; noble metals etching; multilayer stack etching
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MDPI and ACS Style

Dobronosova, A.A.; Ignatov, A.I.; Sorokina, O.S.; Orlikovskiy, N.A.; Andronik, M.; Matanin, A.R.; Buzaverov, K.O.; Ezenkova, D.A.; Avdeev, S.A.; Baklykov, D.A.; Ryzhkov, V.V.; Merzlikin, A.M.; Baryshev, A.V.; Ryzhikov, I.A.; Rodionov, I.A. Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films. Appl. Sci. 2019, 9, 4441. https://doi.org/10.3390/app9204441

AMA Style

Dobronosova AA, Ignatov AI, Sorokina OS, Orlikovskiy NA, Andronik M, Matanin AR, Buzaverov KO, Ezenkova DA, Avdeev SA, Baklykov DA, Ryzhkov VV, Merzlikin AM, Baryshev AV, Ryzhikov IA, Rodionov IA. Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films. Applied Sciences. 2019; 9(20):4441. https://doi.org/10.3390/app9204441

Chicago/Turabian Style

Dobronosova, Alina A., Anton I. Ignatov, Olga S. Sorokina, Nikolay A. Orlikovskiy, Michail Andronik, Aleksey R. Matanin, Kirill O. Buzaverov, Daria A. Ezenkova, Sergey A. Avdeev, Dimitry A. Baklykov, Vitaly V. Ryzhkov, Aleksander M. Merzlikin, Aleksander V. Baryshev, Ilya A. Ryzhikov, and Ilya A. Rodionov. 2019. "Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films" Applied Sciences 9, no. 20: 4441. https://doi.org/10.3390/app9204441

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