Dobronosova, A.A.; Ignatov, A.I.; Sorokina, O.S.; Orlikovskiy, N.A.; Andronik, M.; Matanin, A.R.; Buzaverov, K.O.; Ezenkova, D.A.; Avdeev, S.A.; Baklykov, D.A.;
et al. Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films. Appl. Sci. 2019, 9, 4441.
https://doi.org/10.3390/app9204441
AMA Style
Dobronosova AA, Ignatov AI, Sorokina OS, Orlikovskiy NA, Andronik M, Matanin AR, Buzaverov KO, Ezenkova DA, Avdeev SA, Baklykov DA,
et al. Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films. Applied Sciences. 2019; 9(20):4441.
https://doi.org/10.3390/app9204441
Chicago/Turabian Style
Dobronosova, Alina A., Anton I. Ignatov, Olga S. Sorokina, Nikolay A. Orlikovskiy, Michail Andronik, Aleksey R. Matanin, Kirill O. Buzaverov, Daria A. Ezenkova, Sergey A. Avdeev, Dimitry A. Baklykov,
and et al. 2019. "Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films" Applied Sciences 9, no. 20: 4441.
https://doi.org/10.3390/app9204441
APA Style
Dobronosova, A. A., Ignatov, A. I., Sorokina, O. S., Orlikovskiy, N. A., Andronik, M., Matanin, A. R., Buzaverov, K. O., Ezenkova, D. A., Avdeev, S. A., Baklykov, D. A., Ryzhkov, V. V., Merzlikin, A. M., Baryshev, A. V., Ryzhikov, I. A., & Rodionov, I. A.
(2019). Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films. Applied Sciences, 9(20), 4441.
https://doi.org/10.3390/app9204441