Order Article Reprints

Dobronosova AA, Ignatov AI, Sorokina OS, Orlikovskiy NA, Andronik M, Matanin AR, Buzaverov KO, Ezenkova DA, Avdeev SA, Baklykov DA, et al. Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films. Applied Sciences. 2019; 9(20):4441. https://doi.org/10.3390/app9204441

Dobronosova, Alina A., Anton I. Ignatov, Olga S. Sorokina, Nikolay A. Orlikovskiy, Michail Andronik, Aleksey R. Matanin, Kirill O. Buzaverov, Daria A. Ezenkova, Sergey A. Avdeev, Dimitry A. Baklykov, and et al. 2019. "Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films" Applied Sciences 9, no. 20: 4441. https://doi.org/10.3390/app9204441

Dobronosova, A. A., Ignatov, A. I., Sorokina, O. S., Orlikovskiy, N. A., Andronik, M., Matanin, A. R., Buzaverov, K. O., Ezenkova, D. A., Avdeev, S. A., Baklykov, D. A., Ryzhkov, V. V., Merzlikin, A. M., Baryshev, A. V., Ryzhikov, I. A., & Rodionov, I. A. (2019). Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films. Applied Sciences, 9(20), 4441. https://doi.org/10.3390/app9204441