Next Article in Journal
A Tactile Device Generating Repulsive Forces of Various Human Tissues Fabricated from Magnetic-Responsive Fluid in Porous Polyurethane
Next Article in Special Issue
Structural, Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition
Previous Article in Journal
Redox-Promoted Tailoring of the High-Temperature Electrical Performance in Ca3Co4O9 Thermoelectric Materials by Metallic Cobalt Addition
Open AccessArticle

Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3

by 1,†, 2,3,†, 3 and 1,3,*
1
Department of Chemistry, Boston University, Boston, MA 02215, USA
2
Department of Chemistry, Purdue University, West Lafayette, IN 47907, USA
3
Department of Electrical and Computer Engineering, Boston University, Boston, MA 02215, USA
*
Author to whom correspondence should be addressed.
These authors contributed equally to this work.
Materials 2020, 13(5), 1058; https://doi.org/10.3390/ma13051058
Received: 27 December 2019 / Revised: 10 February 2020 / Accepted: 20 February 2020 / Published: 27 February 2020
(This article belongs to the Special Issue Atomic Layer Deposition Technique in Material Science)
Transition metal nitrides, like titanium nitride (TiN), are promising alternative plasmonic materials. Here we demonstrate a low temperature plasma-enhanced atomic layer deposition (PE-ALD) of non-stoichiometric TiN0.71 on lattice-matched and -mismatched substrates. The TiN was found to be optically metallic for both thick (42 nm) and thin (11 nm) films on MgO and Si <100> substrates, with visible light plasmon resonances in the range of 550–650 nm. We also demonstrate that a hydrogen plasma post-deposition treatment improves the metallic quality of the ultrathin films on both substrates, increasing the ε1 slope by 1.3 times on MgO and by 2 times on Si (100), to be similar to that of thicker, more metallic films. In addition, this post-deposition was found to tune the plasmonic properties of the films, resulting in a blue-shift in the plasmon resonance of 44 nm on a silicon substrate and 59 nm on MgO. View Full-Text
Keywords: atomic layer deposition (ALD); plasmonics; titanium nitride; thin film; optical properties atomic layer deposition (ALD); plasmonics; titanium nitride; thin film; optical properties
Show Figures

Figure 1

MDPI and ACS Style

Hansen, K.; Cardona, M.; Dutta, A.; Yang, C. Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3. Materials 2020, 13, 1058. https://doi.org/10.3390/ma13051058

AMA Style

Hansen K, Cardona M, Dutta A, Yang C. Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3. Materials. 2020; 13(5):1058. https://doi.org/10.3390/ma13051058

Chicago/Turabian Style

Hansen, Katherine; Cardona, Melissa; Dutta, Amartya; Yang, Chen. 2020. "Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH3" Materials 13, no. 5: 1058. https://doi.org/10.3390/ma13051058

Find Other Styles
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Article Access Map by Country/Region

1
Search more from Scilit
 
Search
Back to TopTop