- Article
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
- Jayant Kumar Lodha,
- Johan Meersschaut,
- Mattia Pasquali,
- Hans Billington,
- Stefan De Gendt and
- Silvia Armini
Area selective deposition (ASD) is a promising IC fabrication technique to address misalignment issues arising in a top–down litho-etch patterning approach. ASD can enable resist tone inversion and bottom–up metallization, such as via pre...