Search Results (333)

In this study, Hf_0.5Zr_0.5O₂ (HZO) thin-films were deposited using a Co-plasma atomic layer deposition (CPALD) process that combined both remote plasma and direct plasma, for the development of ferroelectric memory devices. Ferroelectric capacitors with a symmetric hybrid TiN/W/HZO/W/TiN electrode structure, incorporating W electrodes as insertion layers, were fabricated. Rapid thermal annealing (RTA) was subsequently employed to control the crystalline phase of the films. The electrical and structural properties of the capacitors were analyzed based on the RTA temperature, and the presence, thickness, and position of the W insertion electrode layer. Consequently, the capacitor with 5 nm-thick W electrode layers inserted on both the top and bottom sides and annealed at 700 °C exhibited the highest remnant polarization (2P_r = 61.0 μC/cm²). Moreover, the symmetric hybrid electrode capacitors annealed at 500–600 °C also exhibited high 2P_r values of approximately 50.4 μC/cm², with a leakage current density of approximately 4 × 10⁻⁵ A/cm² under an electric field of 2.5 MV/cm. The findings of this study are expected to contribute to the development of electrode structures for improved performance of HZO-based ferroelectric memory devices. Full article

100 nm thick TiO₂/TiN bilayers with varying thickness ratios were deposited via reactive sputtering of a Ti target in controlled oxygen and nitrogen atmospheres. Post-deposition annealing in air at 600 °C was performed to induce nitrogen diffusion through the oxygen-deficient TiO₂ layer. The resulting changes in morphology and chemical environment were investigated in detail using transmission electron microscopy (TEM), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and UV-Vis spectroscopy. Detailed TEM and XPS analyses have confirmed nitrogen diffusion across the TiO₂ layer, with surface nitrogen concentration and the ratio of interstitial to substitutional nitrogen dependent on the TiO₂/TiN mass ratio. Optical studies demonstrated modifications in optical constants and a reduction of the effective bandgap from 3.2 eV to 2.6 eV due to new energy states introduced by nitrogen doping. Changes in surface free energy induced by nitrogen incorporation showed a correlation to nitrogen doping sites on the surface, which had positive effects on overall photocatalytic activity. Photocatalytic activity, assessed through methylene blue degradation, showed enhancement attributed to nitrogen doping. Additionally, deposition of a 5 nm gold layer on the annealed sample enabled investigation of synergistic effects between nitrogen doping and gold incorporation, resulting in further improved photocatalytic performance. These findings establish the TiO₂/TiN bilayer as a versatile platform for supporting thin gold films with enhanced photocatalytic properties. Full article

Palladium (Pd) and titanium (Ti) exhibit opposite dielectric responses upon hydrogenation, with stronger effects observed in the near-infrared (NIR) region. Leveraging this contrast, we investigated Ti/Pd bilayer thin films as a platform for NIR hydrogen sensing—particularly at telecommunication-relevant wavelengths, where such devices have remained largely unexplored. Ti/Pd bilayers coated with Teflon AF (TAF) and fabricated via sequential electron-beam and thermal evaporation were characterized using optical transmission measurements under repeated hydrogenation cycles. The Ti (5 nm)/Pd (x = 2.5 nm)/TAF (30 nm) architecture showed a 2.7-fold enhancement in the hydrogen-induced optical contrast at 1550 nm compared to Pd/TAF reference films, attributed to the hydrogen ion exchange between the Ti and Pd layers. The optimized structure, with a Pd thickness of x = 1.9 nm, exhibited hysteresis-free sensing behavior, a rapid response time (${\mathrm{t}}_{90}$ < 0.35 s at 4% ${\mathrm{H}}_2$), and a detection limit below 10 ppm. It also demonstrated excellent selectivity with negligible cross-sensitivity to $\mathrm{C}{\mathrm{O}}_2$, $\mathrm{C}{\mathrm{H}}_4$, and CO, as well as high durability, showing less than 6% signal degradation over 135 hydrogenation cycles. These findings establish a scalable, room-temperature NIR hydrogen sensing platform with strong potential for deployment in automotive, environmental, and industrial applications. Full article

In this paper, a series of polyaniline (PANI)/Ti₃C₂ MXene composites (PMCs) with a biomimetic structure were prepared and employed as an anticorrosion coating application. First, the PANI was synthesized by oxidative polymerization with ammonium persulfate as the oxidant. Then, 2D Ti₃C₂ MXene nanosheets were prepared by treating the Ti₃AlC₂ using the optimized minimally intensive layer delamination (MILD) method, followed by characterization via XRD and SEM. Subsequently, the PMC was prepared by the oxidative polymerization of aniline monomers in the presence of Ti₃C₂ MXene nanosheets, followed by characterization via FTIR, XRD, SEM, TEM, CV, and UV–Visible. Eventually, the PMC coatings with the artificial biomimetic surface structure of a macaw feather were prepared by the nano-casting technique. The corrosion resistance of the PMC coatings, evaluated via Tafel polarization and Nyquist impedance measurements, shows that increasing the MXene loading up to 5 wt % shifts the corrosion potential (E_corr) on steel from −588 mV to −356 mV vs. SCE, reduces the corrosion current density (I_corr) from 1.09 µA/cm² to 0.035 µA/cm², and raises the impedance modulus at 0.01 Hz from 67 kΩ to 3794 kΩ. When structured with the hierarchical feather topography, the PMC coating (Bio-PA-MX-5) further advances the E_corr to +103.6 mV, lowers the I_corr to 7.22 × 10⁻⁴ µA/cm², and boosts the impedance to 96,875 kΩ. Compared to neat coatings without biomimetic structuring, those with engineered biomimetic surfaces showed significantly improved corrosion protection performance. These enhancements arise from three synergistic mechanisms: (i) polyaniline’s redox catalysis accelerates the formation of a dense passive oxide layer; (ii) MXene nanosheets create a tortuous gas barrier that cuts the oxygen permeability from 11.3 Barrer to 0.9 Barrer; and (iii) the biomimetic surface traps air pockets, raising the water contact angle from 87° to 135°. This integrated approach delivers one of the highest combined corrosion potentials and impedance values reported for thin-film coatings, pointing to a general strategy for durable steel protection. Full article

In this study, the surface photocatalytic activity of an anatase–titanium oxide (TiO_x) film was modified by a thin copper (Cu) layer with the subsequential oxidation annealing process. Through this simple annealing process, the photocatalytic activity of the TiO_x/Cu structure to decompose the methylene blue solution and inhibit the growth of Escherichia coli. could be optimized. With the help of a study on the conductive type required for the oxidation of a single Cu layer, an n/p nanocomposite heterojunction was realized, as this contact system anneals at temperatures of 350 °C and 450 °C. An extra electrical field at the contact interfaces that was be beneficial for separating the photo-generated electron–hole pairs (EHPs) under UV light irradiation was built. The built-in electrical field led to an increase in the structural photocatalytic activity. Moreover, as the p-type cuprous oxide (p-Cu₂O) structure oxidized by the annealed Cu layer could provide a high conduction band that is offset when in contact with the TiO_x film, the photogenerated EHPs on the TiO_x surface could be separated more effectively. Accordingly, the 350 °C-annealed sample, abundant in the nanocomposite TiO_x/Cu₂O heterojunction which could significantly retard the recombination of photo-generated carriers, corresponded to an increase of about 38% in the photocatalytic activity as compared with the single TiO_x film. Full article

Ti/a-C:Cr multilayer films were deposited on 316L stainless steel (SS316L) substrates using medium-frequency alternating current magnetron sputtering, with a single-layer a-C:Cr film also prepared on a titanium substrate. The influence of sputtering pressure on the film’s structure and properties was systematically investigated. Film morphology and microstructure were analyzed via X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and atomic force microscopy (AFM). At a pressure of 1.4 MPa, the interfacial contact resistance (ICR) of SS316L bipolar plates (BPPs) coated with the films reached as low as 3.30 mΩ·cm², while that of titanium BPPs was 2.90 mΩ·cm². Under simulated proton exchange membrane fuel cell (PEMFC) cathode conditions (70 °C, 0.6 V vs. SCE, 0.5 M H₂SO₄, 5 ppm HF solution), the corrosion current density, Icorr, reached optimal values of 0.69 μA·cm⁻² for SS316L and 0.62 μA·cm⁻² for titanium. These results demonstrate that parameter optimization enables SS316L BPPs to functionally replace titanium counterparts, offering significant cost reductions for metal BPPs and accelerating the commercialization of PEMFC technology. Full article

Thin TiO₂–SnO₂ nanocomposite films with high gas sensitivity to NO₂ were synthesized by oxidative pyrolysis and comprehensively studied. The composite structure and quantitative composition of the obtained film nanomaterials have been confirmed by X-ray photoelectron spectroscopy, high-resolution transmission electron microscopy, and energy dispersive X-ray spectroscopy, which causes the presence of n-n heterojunctions and provides improved gas-sensitive properties. The sensor based on the 3TiO₂–97SnO₂ film has the maximum responses, which is explained by the existence of a strong surface electric field formed by large surface potentials in the region of TiO₂–SnO₂ heterojunctions detected by the Kelvin probe force microscopy method. Exposure to low-intensity radiation (no higher than 0.2 mW/cm², radiation wavelength—400 nm) leads to a 30% increase in the sensor response relative to 7.7 ppm NO₂ at an operating temperature of 200 °C and a humidity of 60% RH. At room temperature (20 °C), under humidity conditions, the response is 1.8 when exposed to 0.2 ppm NO₂ and 85 when exposed to 7.7 ppm. The lower sensitivity limit is 0.2 ppm NO₂. The temporal stability of the proposed sensors has been experimentally confirmed. Full article

TiO₂ is an abundant material on Earth, essential for the sustainable and cost-effective development of various technologies, with anatase being the most effective polymorph for photocatalytic and photovoltaic applications. Bulk crystalline anatase TiO₂ exhibits a band gap energy E_gA = 3.2 eV, for tetragonal lattice parameters a_A = 0.3785 nm and c_A = 0.9514 nm, but these characteristics vary for amorphous or polycrystalline thin films. Reactive magnetron sputtering has proven suitable for the preparation of TiO₂ coatings on glass fiber substrates, with structural and optical characteristics that change during growth. Below a minimum thickness (t < 0.2 μm), the films have an amorphous nature or extremely small crystallite sizes not observable by X-ray diffraction. Afterwards, compressed quasi-randomly orientated crystallites are detected (volume strain ΔV = −0.02 and stress σ_V = −3.5 GPa for t = 0.2 μm) that evolve into relaxed and preferentially (004) orientated crystallites, reaching the standard anatase values at t ~ 1.4 μm with σ_V = 0.0 GPa. The band gap energy increases with lattice distortion according to the relation ∆E_g (eV) = −6∆V, and a further increase is observed for the thinnest coatings (∆E_g = 0.24 eV for t = 0.05 μm). Full article

To increase the wear and corrosion resistance of (α + β) titanium-aluminium-vanadium (Ti6Al4V) alloy, ceramic tantalum oxide coatings were deposited by direct current (DC) magnetron sputtering at three different substrate temperatures—400, 450, and 500 °C. The crystallographic structure, surface morphology, chemical compositions, film adhesion, and hardness of the coatings were described using XRD, SEM, EDS, scratch tests, and microhardness measurements. The samples’ ability to withstand corrosion was assessed using electrochemical studies. Results revealed that thin films have an amorphous or crystalline structure dependent on temperature. The film’s thicknesses varied between 560 and 600 nm. With the increase in deposition temperature, the hardness of the film rose. All oxide coatings were tightly adherent to the titanium alloy substrate, and critical force increased from about 8.6 up to 20 N when the temperature rose from 400 to 500 °C. During the polarisation investigations, after 1 h of immersion, a drop in current density (j_corr) verified an improvement in the corrosion resistance of the amorphous and well-crystalline coatings. A two-layer model of the surface film accurately describes the coated systems’ electrochemical behaviour. However, according to the EIS analysis, the well-crystalline film deteriorates greatly, whereas the amorphous film prevents penetration during the 7-day immersion test in SBF. The wettability tests demonstrated the hydrophilic nature of the coatings, and after seven days, the mineralisation of calcium phosphate proves the coatings become bioactive in simulated bodily fluid (SBF). Thus, we produced films of tantalum oxide, which, with the proper deposition parameters, may prove to be appropriate surfaces for titanium-based implant bio-applications. Full article

The detection of hydrogen gas is crucial for both industrial fields, as a green energy carrier, and biomedical applications, where it is a biomarker for diagnosis. TiO₂ nanomaterials are stable and sensitive to hydrogen gas, but their gas response can be negatively affected by external factors such as humidity. Therefore, a strategy is required to mitigate these influences. The utilization of organic–inorganic hybrid gas sensors, specifically metal oxide gas sensors coated with ultra-thin copolymer films, is a relatively novel approach in this field. In this study, we examined the performance and long-term stability of novel TiO₂-based sensors that were coated with poly(trivinyltrimethylcyclotrisiloxane-co-tetrafluoroethylene) (P(V3D3-co-TFE)) co-polymers. The P(V3D3-co-TFE)/TiO₂ hybrid sensors exhibit high reliability even for more than 427 days. They exhibit excellent hydrogen selectivity, particularly in environments with high humidity. An optimum operating temperature of 300 °C to 350 °C was determined. The highest recorded response to H₂ was approximately 153% during the initial set of measurements at a relative humidity of 10%. The developed organic–inorganic hybrid structures open wide opportunities for gas sensor tuning and customization, paving the way for innovative applications in industry and biomedical fields, such as exhaled breath analysis, etc. Full article

Low-Energy High-Current Electron Beam (LEHCEB) is an innovative vacuum technology employed for the surface modification of conductive materials. Surface treatments by means of LEHCEB allow the melting and rapid solidification of a thin layer (up to ~10 μm) of material. The short duration of each pulse (2.5 μs) allows for the generation of high thermal rates, up to 10⁹ K/s. Due to the peculiar features of LEHCEB source, in situ temperature monitoring inside the vacuum chamber is unfeasible, even with the most rapid IR pyrometers available on the market. Therefore, multiphysics simulations serve as a tool for predicting and assessing the thermal effects induced by electron beam irradiation. COMSOL Multiphysics was employed to study the thermal behaviour of metals and alloys at the sub-microsecond time scale by implementing both experimental power time profiles and semi-empirical electron penetration functions. Three case studies were considered: (a) 17-4 PH steel produced by Binder Jetting, (b) biphasic Al-Si13 alloy, and (c) Magnetron Sputtering Nb films on Ti substrate. The influence on the thermal effects of electron accelerating voltage and number of pulses was investigated, as well as the role of the physicochemical properties of the materials. Full article

PZT thin films with a sol–gel-derived seed layer of Pb_1.2(Zr_0.3, Ti_0.7)O₃ were deposited on Pt/Ti/SiO₂/Si substrates via the magnetron sputtering process. The purpose of this present study was to investigate the influence of sputtering process parameters and heat treatment parameters on the crystal orientation, microstructure, and dielectric behaviors of PZT films. X-ray diffraction (XRD) analysis shows that the (100) orientation degree of the PZT films first increases and then decreases with the increase in oxygen partial pressure during sputtering. The PZT film annealed at a temperature of 550 °C exhibits a pure (100) perovskite phase. There are no significant changes in crystal orientation and the (100) orientation degree with increasing annealing time. An improved surface density, more uniform grains, and clear grain boundaries were detected by scanning electron microscope (SEM) characterization as the annealing time increased to 30 min. Optimal dielectricity was obtained in the film deposited on an O₂/Ar composition of 10/90 with a sputtering pressure of 2 Pa and annealed at 600 °C for 30 min, which presents a permittivity of 852 and a loss factor of 0.026 at a frequency of 1 kHz and a remanent polarization of 18.5 μC/cm². Full article

This paper investigates the influence of C₂H₂ flow rates on the optical properties, surface roughness, and residual stress of Ti/WC thin films deposited on glass substrates. A range of Ti/WC thin films with varying carbon contents were prepared using the reactive pulsed DC magnetron sputtering technique. The properties of the Ti/WC films can be tuned by adjusting the deposition parameters, among which the acetylene (C₂H₂) flow rate plays a key role in determining the thin film’s microstructure, optical properties, and stress behavior. The optical properties of the thin films were analyzed using UV-visible-NIR spectroscopy and Fourier transform infrared (FTIR) spectroscopy, the surface morphology was analyzed using microscopic interferometry, and the residual stress in the films was measured using a homemade Twyman–Green interferometer. The measurement results show that the average reflectance of Ti/WC films decreases with the increase in the C₂H₂ flow rate, and the measured value changes from 52.24% to 44.56% in the wavelength of 400–800 nm. The infrared reflectance of Ti/WC films in the wavelength of 2.5–25 μm is 81.8% for 10 sccm, 80.8% for 20 sccm, 77.2% for 30 sccm, and 73.6% for 40 sccm. The tensile stress of the Ti/WC films deposited on B270 substrates increases with the increase in the C₂H₂ flow rate, and the stress value changes from 0.361 GPa to 0.405 GPa. The surface roughness of Ti/WC films initially increases and then decreases slightly with the increase in the C₂H₂ flow rate. These results indicate that the C₂H₂ flow ratio significantly affects the reflectance in the visible and infrared bands, surface roughness, and residual stress of the Ti/WC films, which is of great significance for optimizing thin film performance to meet specific application requirements. Full article

TiN thin films are widely used as protective and decorative coatings for tools in industry. Previous studies have focused on the deposition of TiN coatings on substrates by reactive magnetron sputtering, whereas the use of TiN targets avoids problems such as ‘nitrogen contamination’ and ‘target poisoning’. TiN coatings were grown on silicon wafers and cemented carbide substrates by varying the parameters of the magnetron sputtering plasma source, operating Ar pressure and deposition temperature. The experimental results show the better mechanical properties of ceramic materials deposited using radio frequency (RF) magnetron sputtering. During RF magnetron sputtering, the hardness of the coating increased significantly to 17 Gpa when the deposition working pressure was reduced from 1.5 Pa to 0.5 Pa. The coefficient of friction tends to decrease as the deposition temperature increases, and at 400 °C the coefficient of friction between the deposited film and the friction pair made of Al₂O₃ material is only 0.36. The nano-scratch experimental tests concluded that the TiN coatings deposited at 300 °C conditions had the best adhesion to the substrate at an Ar pressure of 0.5 Pa under an RF source. Full article

The heterogeneous integration of ferroelectric thin films on silicon- or silicon nitride-based platforms for photonic integrated circuits plays a crucial role in the development of nanophotonic thin film modulators. For this purpose, an ultrathin seed film was recently introduced as an integration method for ferroelectric thin films such as BaTiO₃ and Pb(Zr,Ti)O₃. One issue with this self-orienting seed film is that for non-planarized circuits, it fails to act as a template film for the thin films. To circumvent this problem, we propose a method of planarization without the need for wafer-scale chemical mechanical polishing by using hydrogen silsesquioxane as a precursor to forming amorphous silica, in order to create an oxide cladding similar to the thermal oxide often present on silicon-based platforms. Additionally, this oxide cladding is compatible with the high annealing temperatures usually required for the deposition of these novel ferroelectric thin films (600–800 °C). The thickness of this silica film can be controlled through a dry etch process, giving rise to a versatile platform for integrating nanophotonic thin film modulators on a wider variety of substrates. Using this method, we successfully demonstrate a hybrid BaTiO₃-Si ring modulator with a high Pockels coefficient of $r_{wg}=155.57\pm 10.91$ pm V⁻¹ and a half-wave voltage-length product of $V_{\pi }L=2.638\pm 0.084$ V cm, confirming the integration of ferroelectric thin films on an initially non-planar substrate. Full article