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25 pages, 5150 KB  
Article
Effects of Laser Conditioning on the Removal of Surface Nanoparticle Defects and the Damage Threshold of Optical Coatings
by Jinlong Zhang, Zhenyin Lu, Dianhao Dong, Shuai Jiao, Dongyue Yan, Dongdong Li and Shenghuan Fang
Coatings 2026, 16(8), 972; https://doi.org/10.3390/coatings16080972 - 16 Aug 2026
Viewed by 273
Abstract
Surface nanoparticle defects are among the key factors that reduce the laser-induced damage threshold (LIDT) of high-power laser coatings. In this study, the effects of nanosecond laser conditioning and continuous-wave laser conditioning on the removal of surface nanoparticle defects with different sizes and [...] Read more.
Surface nanoparticle defects are among the key factors that reduce the laser-induced damage threshold (LIDT) of high-power laser coatings. In this study, the effects of nanosecond laser conditioning and continuous-wave laser conditioning on the removal of surface nanoparticle defects with different sizes and material compositions, as well as on the LIDT of SiO2 coatings, were systematically investigated. The results show that laser conditioning can reduce the number density of surface particles and improve the LIDT of the coatings under appropriate conditions. Under nanosecond laser conditioning, particle detachment is mainly attributed to the inertial effect induced by rapid transient thermal expansion. In contrast, under continuous-wave laser conditioning, particle detachment is primarily governed by interfacial instability induced by thermal expansion mismatch between the particles and the coating. This study provides experimental evidence and clarifies the dominant surface particle-detachment mechanisms under nanosecond and continuous-wave laser conditioning in optical materials, and offers a useful reference for the fabrication of optical coatings with high laser damage thresholds. Full article
(This article belongs to the Section High-Energy Beam Surface Engineering and Coatings)
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15 pages, 9720 KB  
Article
Mechanism-Guided Enhancement of Laser Damage Resistance in Sol–Gel SiO2 Coatings via CO2 Laser Conditioning
by Changtao He, Kai Liu, Zhenyu Liu, Yongkang Wu and Jinghua Han
Photonics 2026, 13(6), 562; https://doi.org/10.3390/photonics13060562 - 8 Jun 2026
Viewed by 494
Abstract
Laser-induced damage of sol–gel SiO2 antireflection coatings remains a key reliability issue in high-power laser systems because porous networks, residual hydroxyl groups, and defect-related absorption centers can trigger localized heating and stress concentration under nanosecond irradiation. In this work, continuous-wave CO2 [...] Read more.
Laser-induced damage of sol–gel SiO2 antireflection coatings remains a key reliability issue in high-power laser systems because porous networks, residual hydroxyl groups, and defect-related absorption centers can trigger localized heating and stress concentration under nanosecond irradiation. In this work, continuous-wave CO2 laser conditioning was used as a localized post-treatment method to regulate the microstructure of sol–gel SiO2 coatings on fused silica substrates. The revised manuscript clarifies the processing window, scanning parameters, laser damage testing protocol, and the sample-specific nature of the reported LIDT values. Laser conditioning induces partial densification of the porous coating, dehydration of Si-OH groups, relaxation of the Si-O-Si network, and enhancement of mechanical properties. Under the optimized conditioning condition, the surface roughness decreases from 14.08 nm to 9.76 nm, and the LIDT at 1064 nm increases from 4.8 J/cm2 to 7.0 J/cm2. The LIDT values are discussed as a relative microstructure–property comparison for the present coating system rather than as the upper technological limit of sol–gel silica coatings. Combined FTIR analysis, thermal simulation, morphology observation, and damage probability analysis indicate that the improvement originates from the combined effects of reduced defect absorption, moderated porosity, improved heat dissipation, and enhanced resistance to thermally induced cracking. The results provide a mechanism-guided strategy for using CO2 laser conditioning to tune sol–gel silica coatings while also identifying the need for further validation on higher-LIDT coatings and at application-relevant wavelengths. Full article
(This article belongs to the Special Issue Optical Thin Films: From Materials to Applications)
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20 pages, 11510 KB  
Article
Minimization of Intrinsic Impurity Concentration in ZnGeP2 Single Crystals via Directional Recrystallization
by Alexander Gribenyukov, Alexey Lysenko, Nikolay Yudin, Elena Slyunko, Sergey Podzyvalov, Mikhail Zinovev, Vladimir Kuznetsov, Andrey Kalsin, Andrei Khudoley, Houssain Baalbaki, Maxim Kulesh and Alexey Olshukov
Int. J. Mol. Sci. 2026, 27(11), 4890; https://doi.org/10.3390/ijms27114890 - 28 May 2026
Viewed by 398
Abstract
Zinc germanium phosphide (ZnGeP2) is an important nonlinear crystal for mid-infrared conversion, but its performance is limited by residual absorption and intrinsic impurity phases. In this study, polycrystalline ZnGeP2 was synthesized by a modified two-temperature method, purified by inclined directional [...] Read more.
Zinc germanium phosphide (ZnGeP2) is an important nonlinear crystal for mid-infrared conversion, but its performance is limited by residual absorption and intrinsic impurity phases. In this study, polycrystalline ZnGeP2 was synthesized by a modified two-temperature method, purified by inclined directional recrystallization for up to three cycles, and then grown into single crystals by the vertical Bridgman method. The resulting material was examined by shadow-projection imaging, transmission spectroscopy in the 650–2500 nm range, absorption measurements at 2.097 µm, laser-induced damage threshold (LIDT) testing, and powder X-ray diffraction. Repeated purification improved optical homogeneity and near-infrared transparency, while the absorption coefficient at 2.097 µm decreased from 0.45 to 0.30 cm−1 after three purification cycles. Semi-quantitative PXRD analysis showed progressive suppression of intrinsic impurity phosphides, with phase purity increasing from 86.31% after the first cycle to 95.995% after the second and reaching 100% after the third within the detection limit of the method. However, the LIDT decreased with increasing purification number, indicating a trade-off between lower optical losses and damage resistance. These results demonstrate that inclined directional recrystallization is an effective pre-growth purification route for ZnGeP2 and that the optimal number of purification cycles should be selected according to the intended application. Full article
(This article belongs to the Section Materials Science)
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16 pages, 3791 KB  
Article
Study on the Effect of Substitutional Doping of Ce Atomic on the Damage Properties of Fused Silica
by Jiaxing Chen, Kaizao Ni, Ruijin Hong, Lingqiao Li and Zhan Sui
Materials 2026, 19(6), 1225; https://doi.org/10.3390/ma19061225 - 20 Mar 2026
Viewed by 535
Abstract
In high-power laser systems, extrinsic impurities—particularly Ce introduced during conventional ring polishing—have been identified as critical contributors to the degradation of laser-induced damage resistance in fused silica optical components. This study systematically investigates the effects of cerium substitutional doping on the electronic structure [...] Read more.
In high-power laser systems, extrinsic impurities—particularly Ce introduced during conventional ring polishing—have been identified as critical contributors to the degradation of laser-induced damage resistance in fused silica optical components. This study systematically investigates the effects of cerium substitutional doping on the electronic structure and optical properties of fused silica, integrating first-principles density functional theory calculations with experimental characterizations. The results demonstrate that substitutional incorporation of cerium atoms into the fused silica framework introduces deep-level defect states within the band gap, resulting in band gap narrowing and absorption edge redshift of the material. The energy position of the defect states depends on the Ce doping configuration. Among them, the Ce-4f orbital constitutes the dominant component of the defect state’s electronic structure, while the neighboring atomic orbitals such as O-2p and Si-3s/3p participate in bonding through hybridization, thereby determining the depth and distribution characteristics of the defect levels. The optical absorption edge of cerium-doped fused silica undergoes a significant redshift from the intrinsic value of 222 nm to 468 nm in the dual-Ce adjacent-site doping configuration, thereby endowing the material with substantial optical absorption capability at a wavelength of 355 nm. μ-UVPL spectroscopy combined with μ-XRD and other characterization analyses confirmed that the characteristic emission peak at 450 nm on the surface region of fused silica originated from Ce-related defect centers; this spectral feature was consistent with the defect state electronic structure predicted by the diatomic nearest-neighbor doping model. LIDT tests further indicated that the Ce-contaminated area significantly weakened the material’s laser damage resistance under 355 nm laser irradiation. This study further explained the mechanism by which traditional polishing-induced Ce element doping causes the low laser damage threshold of fused silica optical components, providing a theoretical basis for improving their performance. Full article
(This article belongs to the Section Advanced and Functional Ceramics and Glasses)
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14 pages, 3902 KB  
Article
Influence of Oxygen Flow and Stoichiometry on Optical Properties and Damage Resistance of Hafnium Oxide Thin Films
by Amira Guediche, Saaxewer Diop, Raluca A. Negres, Leonardus Bimo Bayu Aji and Colin Harthcock
Coatings 2026, 16(3), 376; https://doi.org/10.3390/coatings16030376 - 17 Mar 2026
Viewed by 953
Abstract
Hafnium oxide (HfO2) is predominantly used as a high-index material in multi-layer dielectric coatings for high-peak- and high-average-power lasers, but laser damage often initiates within the HfO2 layers despite their wide bandgap. Oxygen deficiency during deposition can introduce vacancy-related sub-bandgap [...] Read more.
Hafnium oxide (HfO2) is predominantly used as a high-index material in multi-layer dielectric coatings for high-peak- and high-average-power lasers, but laser damage often initiates within the HfO2 layers despite their wide bandgap. Oxygen deficiency during deposition can introduce vacancy-related sub-bandgap states and absorptive defects, lowering damage resistance. This study investigates how oxygen flow during HfO2 deposition with ion beam sputtering (IBS) affects its stoichiometry, defect formation, and nanosecond laser-induced damage threshold (LIDT) and whether single-layer trends predict multilayer performance. Single layers were deposited at varying oxygen flows, characterized for optical and structural properties, and tested for the LIDT at 1064 nm and 355 nm. Increasing oxygen flow drove the layer toward near-stoichiometric HfO2, reduced the refractive index, and altered the density of surface pinhole-like features. The single-layer LIDT at 355 nm increased with oxygen, whereas the 1064 nm LIDT was comparatively less sensitive to oxygen flow, consistent with the wavelength-dependent roles of absorptive precursors and microstructural defects. In contrast, a HfO2-based high-reflector (HR) showed a higher LIDT at lower oxygen flow, indicating that the family of damage precursors changes between single layers and multilayers; in stacks, structural properties such as stress, gas entrapment and thermal dissipation may outweigh the isolated absorptive defects found in single layers. These results demonstrate that the optimal oxygen flow condition depends on both LIDT wavelength and film architecture. We identified, for single layers, a 15–35 sccm window for maximizing the 1064 nm LIDT and a high-flow optimum (45 sccm) for the 355 nm LIDT and, for 355 nm HR stacks, a distinct lower-flow regime (~10 sccm). Full article
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14 pages, 1899 KB  
Article
Investigation of the Damage Characteristics and Mechanisms in Silicon Carbide Crystals Induced by Nanosecond Pulsed Lasers at the Fundamental Frequency
by Penghao Xu, Erxi Wang, Teng Wang, Chong Shan, Xiaohui Zhao, Huamin Kou, Dapeng Jiang, Qinghui Wu, Zhan Sui and Yanqi Gao
Photonics 2025, 12(12), 1207; https://doi.org/10.3390/photonics12121207 - 8 Dec 2025
Cited by 1 | Viewed by 857
Abstract
Silicon carbide (SiC) single crystals are extensively utilized in various fields due to their exceptional properties, such as a wide bandgap and a high breakdown threshold. Nevertheless, the intrinsic high hardness of SiC creates significant challenges for contact machining. This study investigates the [...] Read more.
Silicon carbide (SiC) single crystals are extensively utilized in various fields due to their exceptional properties, such as a wide bandgap and a high breakdown threshold. Nevertheless, the intrinsic high hardness of SiC creates significant challenges for contact machining. This study investigates the surface damage characteristics and underlying mechanisms involved in processing both high-purity silicon carbide (HP-SiC) and nitrogen-doped silicon carbide (N-SiC) crystals using fundamental-frequency nanosecond pulsed lasers. This study establishes a laser-induced damage threshold (LIDT) testing platform and employs the internationally standardized 1-ON-1 test method to evaluate the damage characteristics of HP-SiC and N-SiC crystals under single-pulse laser irradiation. Experimental results indicate that N-SiC crystals exhibit superior absorption characteristics and a lower LIDT compared with HP-SiC crystals. Subsequently, a defect analysis model was established to conduct a theoretical examination of defect information across various types of SiC. Under fundamental-frequency nanosecond pulsed laser irradiation, N-SiC crystals demonstrate a lower average damage threshold and a broader defect damage threshold distribution than their HP-SiC counterparts. By integrating multi-dimensional analytical methods—including photothermal weak absorption mechanisms and damage morphology analysis—the underlying damage mechanisms of the distinct SiC forms were comprehensively elucidated. Moreover, although N-SiC crystals show weaker photothermal absorption properties, they exhibit more pronounced absorption and damage response processes. These factors collectively account for the different laser damage resistances observed in the two types of silicon carbide crystals, implying that distinct processing methodologies should be employed for nanosecond pulsed laser treatment of different SiC crystals. This paper elucidates the damage characteristics of various SiC materials induced by near-infrared nanosecond pulsed lasers and explores their underlying physical mechanisms. Additionally, it provides reliable data and a comprehensive mechanistic explanation for the efficient removal of these materials in practical applications. Full article
(This article belongs to the Special Issue New Perspectives in Micro-Nano Optical Design and Manufacturing)
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15 pages, 3114 KB  
Article
Impact of Extrinsic Defects in Wavelength Separation Coatings on the Process of Laser-Induced Damage
by Shichen Shen, Xinda Zhou, Yinbo Zheng, Jie Li, Tianhao Zhang, Linjie Zhao, Liqun Chai and Mingjun Chen
Micromachines 2025, 16(11), 1191; https://doi.org/10.3390/mi16111191 - 22 Oct 2025
Cited by 1 | Viewed by 1187
Abstract
Wavelength separation coatings can effectively separate the fundamental frequency (1ω) and third harmonic (3ω) laser beams. However, the laser-induced damage threshold (LIDT) of the surface defect-free WS coatings for the 3ω laser is 1.68 J/cm2 (obtained in the preliminary experiment), significantly lower [...] Read more.
Wavelength separation coatings can effectively separate the fundamental frequency (1ω) and third harmonic (3ω) laser beams. However, the laser-induced damage threshold (LIDT) of the surface defect-free WS coatings for the 3ω laser is 1.68 J/cm2 (obtained in the preliminary experiment), significantly lower than the ideal LIDT of the fused silica substrate (80 J/cm2). This is directly correlated with extrinsic defects such as nanoscale defects and nodular defects introduced during the coating manufacturing process. Moreover, the damage in WS coatings caused by extrinsic defects is a complex physical process involving multiple physical phenomena such as material melting, vaporization, and ejection. The mechanism by which extrinsic defects interact with lasers to form damage is not yet fully elucidated. To address this, a multi-physics coupling model considering photoelectric, thermal and stress was established to simulate the incident laser propagation within coatings, the temperature distribution and thermal stress distribution of the coating material. This model systematically investigates the influence of defect location, type, and size on the laser-induced damage process. It is found that when a 10 nm-diameter defect is located at the 32nd layer of the coatings, the light intensity enhancement factor (LIEF) for 3ω laser can reach up to 5 times that for the 1ω laser. The variation in thermal stress induced by changes in defect size is jointly determined by the defect-induced modulation effect and the interference effect realized by the coating. This work theoretically reveals the mechanism of extrinsic defects in the laser damage. It provides effective guidance for establishing control standards for extrinsic defects during the optical coating process. Full article
(This article belongs to the Special Issue Advances in Digital Manufacturing and Nano Fabrication)
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14 pages, 5132 KB  
Article
Study on the Structural, Optical, and Magneto-Optical Properties of Bi2O3-Pb3(BO3)2-Ga2O3-PbO Glasses for Temperature-Insensitive Magneto-Optical Isolator Applications
by Rui Wan, Chen Guo, Hang Jiang, Yong Jiang, Xianda Li, Yongmao Guan and Pengfei Wang
Materials 2025, 18(20), 4750; https://doi.org/10.3390/ma18204750 - 16 Oct 2025
Cited by 1 | Viewed by 834
Abstract
In this work, bismuthate glasses with compositions of 64Bi2O3-(25-x)Pb3(BO3)2-11Ga2O3-xPbO (where x = 2, 7, 12, 17) were prepared by the melt-quenching method, and their density, thermodynamic stability, Raman spectra, [...] Read more.
In this work, bismuthate glasses with compositions of 64Bi2O3-(25-x)Pb3(BO3)2-11Ga2O3-xPbO (where x = 2, 7, 12, 17) were prepared by the melt-quenching method, and their density, thermodynamic stability, Raman spectra, X-ray photoelectron spectra, Verdet constant, and nanosecond laser-induced damage threshold (LIDT) were characterized. As the content of PbO increases, the thermodynamic stability and laser-induced damage threshold of the glass gradually decrease, which corresponds to the increase in the glass’s optical basicity, the rise in non-bridging oxygen content, and the valence state transition of Bi ions observed in structural studies. A relatively large Verdet constant was obtained in the glass with the composition of 64Bi2O3-8Pb3(BO3)2-11Ga2O3-17PbO, with a value of −0.191 min·G−1·cm−1 at a wavelength of 633 nm, which is much larger than that of commercially diamagnetic glasses. In addition, the variation in the Verdet constant at 1064 nm between 20 and 80 °C is less than 0.4 × 10−5 K−1, which indicates that these bismuthate glasses are good candidates for magneto-optical devices under thermally unstable conditions. Full article
(This article belongs to the Section Advanced Materials Characterization)
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13 pages, 2390 KB  
Article
Enhancing Laser Damage Resistance in TiO2 Films: Dual-Additive Strategy Using High Thermal Conductivity Agents and Long-Chain Organic Compounds
by Yan Zhang, Ming Ma, Zirun Peng, Na Liu, Hanzhuo Zhang, Peizhong Feng and Cheng Xu
Photonics 2025, 12(8), 742; https://doi.org/10.3390/photonics12080742 - 22 Jul 2025
Viewed by 1592
Abstract
The laser damage resistance of optical films holds significant practical importance, as it largely determines both the maximum power output of laser systems and the overall stability of the entire optical assembly. A comprehensive investigation was conducted to examine the influence of both [...] Read more.
The laser damage resistance of optical films holds significant practical importance, as it largely determines both the maximum power output of laser systems and the overall stability of the entire optical assembly. A comprehensive investigation was conducted to examine the influence of both single additives—acetylacetone (ACAC) and diethanolamine (DEA)—and dual-additive systems, specifically ACAC combined with polyethylene glycol 200 (PEG 200) and DEA combined with PEG 200, on TiO2 film properties and their laser-induced damage behavior under 1064 nm irradiation. It demonstrated that the films fabricated using ACAC exhibited smoother surfaces. Nevertheless, the sol prepared with DEA was more stable, resulting in films with superior optical properties and an enhanced laser-induced damage threshold (LIDT). The incorporation of dual additives further improved the films’ LIDT. Specifically, the film with DEA and PEG 200 achieved the highest LIDT, reaching 21.5 J/cm2. Moreover, all films exhibited defect-induced damage, yet distinct damage morphologies were observed across different samples. The single-additive films predominantly displayed stress-type damage patterns, whereas the dual-additive films manifested melting-type damage characteristics. Furthermore, through a combination of experiments and calculations, it was revealed that the reasons why the film with DEA and PEG 200 achieved the highest LIDT were twofold: first, the high thermal conductivity of DEA reduced the maximum temperature at the defect center within the film; second, the long molecular chains of PEG 200 created a looser film structure that better mitigated damage caused by stress and expansion during laser irradiation. This study presents a promising approach to enhancing the LIDT through the strategic selection of additives with high thermal conductivity while simultaneously incorporating organic compounds with long molecular chains to develop effective dual-additive films. Full article
(This article belongs to the Section Lasers, Light Sources and Sensors)
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10 pages, 3701 KB  
Article
Mechanism of Impurity Content in Degradation and Damage Characteristics of Calcium Fluoride Crystals by X-Ray and Deep-Ultraviolet Laser Irradiation
by Ping Han, Dapeng Jiang, Huamin Kou, Rongrong Liu, Qinghui Wu, Zhonghan Zhang, Zhen Zhang, Chong Shan, Chongyun Shao, Yafei Lian, Yuanan Zhao, Xing Peng and Liangbi Su
Photonics 2025, 12(6), 579; https://doi.org/10.3390/photonics12060579 - 6 Jun 2025
Cited by 2 | Viewed by 2019
Abstract
Calcium fluoride (CaF2) crystals are widely utilized in deep-ultraviolet (DUV) lithography due to their excellent optical properties. The laser-induced degradation and damage of CaF2 crystals is a critical concern that restricts its extended application. Impurities of CaF2 crystal are [...] Read more.
Calcium fluoride (CaF2) crystals are widely utilized in deep-ultraviolet (DUV) lithography due to their excellent optical properties. The laser-induced degradation and damage of CaF2 crystals is a critical concern that restricts its extended application. Impurities of CaF2 crystal are considered a key factor affecting its laser resistance. Establishing the quantitative relationship and mechanism of impurity content impacting the degradation and damage characteristics of CaF2 crystal is essential. This study investigated the characteristics of different impurity contents affecting the degradation and laser-induced damage thresholds (LIDTs) of CaF2 crystals under X-ray and 193 nm pulsed laser irradiations, and quantitatively analyzed the degradation process and mechanism. Our findings demonstrate that impurities at ppm levels significantly diminish the transmittance of CaF2 crystals across various wavelengths following X-ray irradiation. In contrast, these impurities have a negligible effect on the LIDT test results, suggesting distinct damage mechanisms between X-ray and laser irradiation. This study provides valuable insights for optimizing the CaF2 crystal fabrication process and enhancing irradiation resistance. Full article
(This article belongs to the Special Issue Innovative Optical Technologies in Advanced Manufacturing)
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10 pages, 1167 KB  
Article
Investigation of UV Picosecond Laser Damage Threshold of Anti-Reflection Coated Windows
by Priyadarshani Narayanasamy, Martin Mydlář, Hana Turčičová, Mihai George Mureșan, Ondřej Novák, Jan Vanda and Jan Brajer
J. Manuf. Mater. Process. 2025, 9(6), 180; https://doi.org/10.3390/jmmp9060180 - 29 May 2025
Cited by 1 | Viewed by 3030
Abstract
Long-term stability and laser-induced damage resistance of optical components in the UV region are critical for enhancing their performance in UV high-power laser applications. This study evaluates the laser-induced damage threshold (LIDT) of commercially available UV optical windows with anti-reflective (AR) coating, produced [...] Read more.
Long-term stability and laser-induced damage resistance of optical components in the UV region are critical for enhancing their performance in UV high-power laser applications. This study evaluates the laser-induced damage threshold (LIDT) of commercially available UV optical windows with anti-reflective (AR) coating, produced through various coating techniques and designed for high-power lasers. A third-harmonic (343 nm) wavelength with good beam quality was generated in the picosecond regime to investigate the LIDT of optical components. The LIDT for each sample was measured under controlled conditions and compared based on their coating techniques. The sample coated with Al2O3/SiO2 through ion beam sputtering has the best LIDT value, of 0.6 J/cm2, among the tested samples, based on the hundred-thousand-pulses methodology. The damage threshold curve and the corresponding damage morphology are discussed in detail, and these findings provide insights into the durability and susceptibility of UV optics for advanced laser systems available in the market. Full article
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16 pages, 5788 KB  
Article
Research on Thermal Effect and Laser-Induced Damage Threshold of 10.6 µm Antireflection Coatings Deposited on Diamond and ZnSe Substrates
by Xiong Zi, Xinshang Niu, Hongfei Jiao, Shuai Jiao, Xiaochuan Ji, Dongdong Li, Binbin Jiang, Jinlong Zhang, Xinbin Cheng, Zhanshan Wang and Zihua Xin
Coatings 2025, 15(5), 536; https://doi.org/10.3390/coatings15050536 - 30 Apr 2025
Cited by 8 | Viewed by 3351
Abstract
In this study, ZnS/YbF3-10.6 µm antireflection (AR) coatings were fabricated on CVD single-crystal diamond and ZnSe substrates. The spectral characteristics of the coatings and their performance under continuous wave laser radiation at 10.6 µm were systematically investigated. The fabricated AR coatings [...] Read more.
In this study, ZnS/YbF3-10.6 µm antireflection (AR) coatings were fabricated on CVD single-crystal diamond and ZnSe substrates. The spectral characteristics of the coatings and their performance under continuous wave laser radiation at 10.6 µm were systematically investigated. The fabricated AR coatings exhibited excellent spectral properties in the target wavelength range. Both theoretical calculations and experimental results indicated that, at the same power density, the 10.6 µm AR coatings on diamond substrates exhibited a lower temperature rise compared to those deposited on ZnSe substrates. Due to its high thermal conductivity, the diamond substrate is expected to exhibit reduced thermally induced surface distortion. The laser-induced damage threshold (LIDT) test results indicate that the AR coating deposited on the ZnSe substrate exhibits a damage threshold of 11,890 W/cm2, whereas the AR coating on the diamond substrate achieves a threshold of 15,287 W/cm2, representing a 28.5% improvement over the ZnSe substrate. Additionally, graphite formation occurs on the diamond substrate under high power density. These findings provide both theoretical and experimental support for the potential application of diamond materials in high-power laser systems. Full article
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12 pages, 4584 KB  
Article
Characteristics of Fused Silica Exit Surface Damage by Low-Temporal Coherence Light Irradiation
by Chong Shan, Ping Han, Erxi Wang, Fujian Li, Xiaohui Zhao, Huamin Kou, Dapeng Jiang, Qinghui Wu, Xing Peng, Penghao Xu, Yafei Lian, Yuanan Zhao, Liangbi Su, Zhan Sui and Yanqi Gao
Photonics 2025, 12(5), 432; https://doi.org/10.3390/photonics12050432 - 30 Apr 2025
Cited by 1 | Viewed by 1225
Abstract
Laser-induced exit surface damage of fused silica is a key bottleneck for its application in high-power laser devices. As low-temporal coherence light (LTCL) has garnered increasing attention for high-power laser-driven inertial confinement fusion, understanding LTCL-induced exit surface damage of fused silica becomes crucial [...] Read more.
Laser-induced exit surface damage of fused silica is a key bottleneck for its application in high-power laser devices. As low-temporal coherence light (LTCL) has garnered increasing attention for high-power laser-driven inertial confinement fusion, understanding LTCL-induced exit surface damage of fused silica becomes crucial for improving the output power capability of LTCL devices. In this study, we characterized damage on the exit surface of fused silica under LTCL irradiation and investigated the physical mechanism of temporal coherence affecting the laser-induced damage threshold (LIDT). The relationship between defect information and temporal coherence was explored using a defect analysis model, and the defect damage process and response to each incident lasers were captured using time-resolved methods and artificially fabricated defects. We elucidate the physical mechanism behind the lower LIDT under LTCL irradiation compared to single longitudinal mode (SLM) pulse lasers. This study not only provides the boundary condition for safe fused silica operation in high-power LTCL devices but also offers deeper insight into the physical properties of LTCL. Full article
(This article belongs to the Special Issue New Perspectives in Micro-Nano Optical Design and Manufacturing)
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10 pages, 1375 KB  
Article
Quantifying Uncertainty in Laser-Induced Damage Threshold for Cylindrical Gratings
by Yuan Li, Junqi Xu, Guoliang Yang, Lihong Yang and Junhong Su
Micromachines 2025, 16(1), 45; https://doi.org/10.3390/mi16010045 - 30 Dec 2024
Cited by 2 | Viewed by 2290
Abstract
The laser-induced damage threshold (LIDT) is a key measure of an optical component’s resistance to laser damage, making its accurate determination crucial. Following the ISO 21254 standards, we studied the measurement strategy and uncertainty fitting method for laser damage, establishing a calculation model [...] Read more.
The laser-induced damage threshold (LIDT) is a key measure of an optical component’s resistance to laser damage, making its accurate determination crucial. Following the ISO 21254 standards, we studied the measurement strategy and uncertainty fitting method for laser damage, establishing a calculation model for uncertainty. Research indicates that precise LIDT measurement can be achieved by using a small energy level difference and conducting multiple measurements. The LIDT values for the cylindrical grating are 15.34 ± 0.00052 J/cm2 (95% confidence) and 15.34 ± 0.00078 J/cm2 (99% confidence), demonstrating low uncertainty and reliable results. This strategy effectively measures the LIDT and uncertainty of various grating surface shapes, offering reliable data for assessing their anti-laser-damage performance. Full article
(This article belongs to the Section A:Physics)
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11 pages, 2362 KB  
Article
Time-Dependent Resistance of Sol–Gel HfO2 Films to In Situ High-Temperature Laser Damage
by Haojie Liu, Ziwei Hao, Zirun Peng, Miao Zhang, Peizhong Feng and Cheng Xu
Photonics 2024, 11(10), 976; https://doi.org/10.3390/photonics11100976 - 18 Oct 2024
Cited by 1 | Viewed by 1661
Abstract
Laser damage in films under long-term high-temperature conditions is a significant concern for advancing laser applications. This study focused on HfO2 films prepared using the sol–gel method with HfCl4 as a precursor. It examined the effects of temperature on various properties [...] Read more.
Laser damage in films under long-term high-temperature conditions is a significant concern for advancing laser applications. This study focused on HfO2 films prepared using the sol–gel method with HfCl4 as a precursor. It examined the effects of temperature on various properties of the films, including their optical properties, microstructure, surface morphology, absorption, and laser-induced damage threshold (LIDT). The prepared film demonstrated desirable characteristics at the high temperature of 423 K, such as high transmittance, low absorption, and high LIDT. As the duration of its high-temperature exposure increased, the LIDT of the films gradually decreased. An intriguing finding was that the film’s LIDT exhibited an exponential decay pattern with prolonged heating time. This observation could be attributed to the power-law increase in defects on both the internal and surface areas of the film as the duration of high-temperature exposure lengthened. Moreover, even after a 15-day heating period at 423 K, the film maintained an LIDT of 12.9 J/cm2, indicating its potential applicability in practical high-temperature environments. This study provided a general pattern and a universal formula for understanding the laser damage of sol–gel films at high temperatures over time. Furthermore, it opened possibilities for future developments of laser films suitable for extreme environments. Full article
(This article belongs to the Section Optoelectronics and Optical Materials)
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