Optical Thin Films: From Materials to Applications

A special issue of Photonics (ISSN 2304-6732). This special issue belongs to the section "Optoelectronics and Optical Materials".

Deadline for manuscript submissions: 30 April 2026 | Viewed by 435

Special Issue Editor


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Guest Editor
i3N, Department of Physics, University of Aveiro, Campus Universitário de Santiago, 3810-193 Aveiro, Portugal
Interests: photoluminescence; nanothermometry; hyperspectral microscopy
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Special Issue Information

Dear Colleagues,

Optical thin films hold tremendous importance in the development of new optical devices. As such, we are pleased to invite you to submit original research articles and review papers within the scope of this Special Issue, “Optical Thin Films: From Materials to Applications”.

The Special Issue welcomes both theoretical (simulation) and experimental research on thin films, contributing to the development of new materials or new applications within the photonics field.

Research areas may include (but are not limited to) the following:

  • Thin films for optical devices;
  • Characterization techniques for optical thin films;
  • Surface science applied to optical thin films;
  • Fundamental and functional properties of surface and interfaces applied to optical thin films;
  • Theoretical and computational modeling of surfaces and interfaces applied to optical thin films.

We look forward to receiving your contributions.

Dr. Alexandre Botas
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • thin films
  • optical materials
  • optical devices
  • luminescence
  • light emission

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Published Papers (1 paper)

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Research

17 pages, 5084 KB  
Article
Influence of Multilayer Architecture on the Structural, Optical, and Photoluminescence Properties of ZnO Thin Films
by Neha N. Malpure, Sumit R. Patil, Jaydeep V. Sali, Diego Pugliese, Rakesh A. Afre and Rajendra S. Khadayate
Photonics 2025, 12(12), 1219; https://doi.org/10.3390/photonics12121219 - 9 Dec 2025
Viewed by 210
Abstract
The present work systematically investigates the impact of multilayer architecture—specifically 5, 10, and 15 layers—on the structural, morphological, optical, and dielectric properties of zinc oxide (ZnO) thin films, aiming to tailor their characteristics for optoelectronic applications. The films were characterized using a comprehensive [...] Read more.
The present work systematically investigates the impact of multilayer architecture—specifically 5, 10, and 15 layers—on the structural, morphological, optical, and dielectric properties of zinc oxide (ZnO) thin films, aiming to tailor their characteristics for optoelectronic applications. The films were characterized using a comprehensive suite of techniques. X-ray diffraction (XRD) analysis of the 15-layer sample confirmed the formation of polycrystalline ZnO with a hexagonal wurtzite crystal structure, showing prominent (100), (002), and (101) diffraction peaks. Measurements indicated that the film thickness progressively increased from 43.81 nm for 5 layers to 80.68 nm for 15 layers. Concurrently, the surface roughness significantly decreased from 5.54 nm (5 layers) to 2.00 nm (15 layers) with increasing layer count, suggesting enhanced film quality and densification. Optical studies using ultraviolet–visible (UV-Vis) spectroscopy revealed an increase in absorbance and a corresponding decrease in transmittance in the UV-Vis spectrum as the film thickness increased. The calculated optical band gap showed a slight redshift, decreasing from 3.26 eV for the 5-layer film to 3.23 eV for the 15-layer film. Photoluminescence (PL) spectra exhibited characteristic near-band-edge UV emission, with the 5-layer film demonstrating the highest PL intensity. Furthermore, analysis of optical constants revealed that the refractive index, extinction coefficient, optical conductivity, and both the real and imaginary parts of the dielectric constant generally increased with an increasing number of layers, particularly in the visible region, while more nuanced and non-monotonic trends were observed in the UV range. These results underscore the significant influence of layer number on the physical properties of ZnO thin films, providing valuable insights for optimizing their performance in various optoelectronic devices. Full article
(This article belongs to the Special Issue Optical Thin Films: From Materials to Applications)
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