As emerging nonvolatile memory devices, ferroelectric field-effect transistors (FeFETs) have attracted significant attention for memory applications. However, due to the stochastic nature of fabrication processes and material properties, FeFETs exhibit pronounced device-to-device (DTD) variations, leading to threshold voltage dispersion and inconsistency in memory
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As emerging nonvolatile memory devices, ferroelectric field-effect transistors (FeFETs) have attracted significant attention for memory applications. However, due to the stochastic nature of fabrication processes and material properties, FeFETs exhibit pronounced device-to-device (DTD) variations, leading to threshold voltage dispersion and inconsistency in memory window (MW), which severely constrain array-level performance and reliability. In this study, a compact model-based variability analysis methodology for FeFETs has been proposed. Specifically, the Preisach ferroelectric (FE) hysteresis model was combined with the MIT Virtual Source (MVS) physical compact model to establish a macro-model for FeFETs, and statistical simulations were performed to evaluate device-level variations. Using the proposed framework, how fluctuations in two key FE parameters, film thickness (t
FE) and coercive field (E
C), affect FeFET transfer characteristics, threshold voltage (V
TH), and MW was systematically investigated. Monte Carlo (MC) simulations were further conducted to quantify the distribution width and statistical features of V
TH under different variability scenarios. The results indicate that random fluctuations in process-related parameters broaden the FeFET I
d-V
g characteristics, induce shifts in high/low threshold voltages, and cause MW variations. Moreover, when t
FE and E
C fluctuate simultaneously, the dispersions of V
TH and MW become significantly larger than those induced by a single-parameter fluctuation. The proposed compact-modeling framework and variability analysis approach enables the efficient evaluation of parameter tolerance and performance margin in FeFET arrays, providing guidance for storage-array design.
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