III-Nitride Semiconductors: Design, Characterization, Applications and Devices (Second Edition)

A special issue of Nanomaterials (ISSN 2079-4991). This special issue belongs to the section "Nanoelectronics, Nanosensors and Devices".

Deadline for manuscript submissions: 10 December 2026 | Viewed by 991

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Guest Editor
Institute of Semiconductors, Chinese Academy of Sciences, Beijing, China
Interests: III-Nitride semiconductor material and devices
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Special Issue Information

Dear Colleagues,

GaN-based materials include GaN, InN, AlN, and their alloys, with their spectra covering ultraviolet, visible, and infrared wavelengths, rendering them ideal materials for the preparation of light-emitting devices. In recent years, III-nitride semiconductors have become a strategic hotspot and the subject of a high level of global technological competition. Based on III-nitride semiconductor materials, semiconductor lighting has emerged as the focus of a large-scale industry, with its ongoing development in the field of electronic power devices representing a key area.

This Special Issue seeks to showcase research papers and review articles on materials and devices based on group-III-nitride semiconductors. We welcome contributions devoted to epitaxial growth, optical and electrical properties, structural analysis, defect characterization, light-emitting devices (UV/VIS-LEDs, lasers, and µLEDs), photovoltaics, energy harvesting, photodetectors, transistors, power and RF applications, device processing and fabrication, transport, and switching properties.

We look forward to receiving your submissions.

Dr. Jing Yang
Guest Editor

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Keywords

  • III-nitride semiconductor epitaxial growth
  • laser diodes
  • light-emitting diodes
  • photodetectors, transistors

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Published Papers (1 paper)

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Research

11 pages, 1757 KB  
Article
SIMS Investigation of Al Diffusion Across Interfaces in AlGaN/GaN and AlN/GaN Heterostructures
by Jihed Laifi, Mohamed Fathy Hasaneen and Amor Bchetnia
Nanomaterials 2026, 16(2), 125; https://doi.org/10.3390/nano16020125 - 17 Jan 2026
Viewed by 702
Abstract
This study investigates Metal–Organic Vapor Phase Epitaxy (MOVPE)-grown AlGaN/GaN and AlN/GaN heterostructures using high-temperature thermal annealing and Secondary Ion Mass Spectrometry (SIMS). By fitting experimental diffusion coefficients (DAl) to the Arrhenius equation, two crucial kinetic parameters were found: the activation energy (Ea [...] Read more.
This study investigates Metal–Organic Vapor Phase Epitaxy (MOVPE)-grown AlGaN/GaN and AlN/GaN heterostructures using high-temperature thermal annealing and Secondary Ion Mass Spectrometry (SIMS). By fitting experimental diffusion coefficients (DAl) to the Arrhenius equation, two crucial kinetic parameters were found: the activation energy (Ea) and the pre-factor (D0). In the AlGaN/GaN structure, the dominating out-diffusion of Al has a large D0 = 4.03 × 10−5 cm2 s−1 and a low activation energy in the range of [2.1–2.4 eV]. A substitutional diffusion mechanism in the crystal lattice mediated by defects is closely linked to the low Ea. Significantly higher activation energies (Ea) of 3.66 and 4.59 eV, respectively, control both in- and out-diffusion processes in the AlN/GaN structure. The better intrinsic thermal stability of the pure AlN layer, whose stability is attained by a strong energy barrier, is confirmed by the increase of more than 1.2 eV in Ea. Full article
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