Electronic and Photonic Device Integration and Packaging

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "D:Materials and Processing".

Deadline for manuscript submissions: 25 December 2026 | Viewed by 179

Editors


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Guest Editor
Institute for Micromanufacturing, Mechanical Engineering, Louisiana Tech University, Ruston, LA 71272, USA
Interests: semiconductor metrology; advanced packaging; optical metrology; optical sensing; fiber optics

E-Mail Website
Guest Editor
Institute for Micromanufacturing, Mechanical Engineering, Louisiana Tech University, Ruston, LA 71272, USA
Interests: laser powder bed fusion; additive manufacturing; solid mechanics; metallic materials; heat transfer; computational fluid dynamics
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Special Issue Information

Dear Colleagues,

The rapid advancement of electronic and photonic technologies has enabled transformative progress in areas such as high-performance computing, artificial intelligence, optical communication, sensing and advanced manufacturing. As device dimensions continue to shrink and system complexity increases, the integration and packaging of electronic and photonic components have become critical enablers of next-generation systems. Recent developments in heterogeneous integration, chiplet architectures, silicon photonics and advanced packaging techniques, including 2.5D/3D integration, through silicon vias, wafer-level packaging and photonic-electronic co-integration, are opening new possibilities for compact, high-performance and energy-efficient devices. At the same time, these advances introduce significant challenges related to thermal management, signal integrity, reliability, manufacturing yield and high-precision metrology. Addressing these challenges requires interdisciplinary innovations spanning device design, materials engineering, fabrication processes, packaging technologies and characterization techniques. Emerging solutions such as advanced interconnect architectures, novel materials, integrated photonic platforms and in situ monitoring and metrology are playing increasingly important roles in enabling reliable and scalable device integration. To highlight the latest progress in this rapidly evolving field, we are pleased to announce the Special Issue entitled “Electronic and Photonic Device Integration and Packaging.” This Special Issue aims to bring together recent advances and emerging research directions in the integration, packaging and reliability of electronic and photonic devices.

Dr. Fengfeng Zhou
Dr. Shafiqur Rahman
Guest Editors

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Keywords

  • silicon photonics
  • integrated circuits
  • advanced packaging
  • micromanufacturing
  • co-packaged optics
  • microsensors

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Published Papers (1 paper)

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Article
Microscopic Mechanism of Glass Surface Activation, Annealing and Etching on Glass–Ti/Cu Interfacial Adhesion
by Tailong Shi, Wending Yang, Qi Li, Jingxuan Yang, Zhonghao Li, Hua Hong, Zhong Zhang, Guodong Zhang and Andrew C. Chang
Micromachines 2026, 17(7), 836; https://doi.org/10.3390/mi17070836 (registering DOI) - 14 Jul 2026
Abstract
Due to its excellent electrical and thermal performance, glass packaging demonstrates significant potential in heterogeneous integration of chiplets advanced packaging system, but limited by its poor interfacial adhesion strength between glass and metals. This article studies the mechanisms of glass–metal bonding interface at [...] Read more.
Due to its excellent electrical and thermal performance, glass packaging demonstrates significant potential in heterogeneous integration of chiplets advanced packaging system, but limited by its poor interfacial adhesion strength between glass and metals. This article studies the mechanisms of glass–metal bonding interface at the microscale level, and the adhesion strength at the macroscale level. In detail, the changes of the adhesion strength after glass surface activation, annealing and micro-etching processes were characterized, and the correlation between the microscale mechanisms and the macroscale adhesion variations of each process was studied. X-ray photoelectron spectroscopy (XPS) results indicate that the increase in Si-OH bond is the key to glass surface activation. Fourier transform infrared spectroscopy (FTIR) was applied to quantitatively correlate the dynamic evolution of surface polar hydroxyl groups on glass substrates with the subsequent glass–metal interfacial bonding strength, and verified the conclusion above. The adhesion strength increased by 2.3 times after surface activation, and by 4.1 times after annealing, while it decreased slightly after etching. Furthermore, the glass–Ti seed layer interface was studied at the atomic level to better analyze the changes in macroscopic adhesion. XPS depth profiling confirmed the formation of Si-O-Ti bonds at the glass–Ti interface, which may contribute to the enhanced adhesion. After annealing, X-ray diffractometer (XRD) characterization revealed the great change in grain structure caused a reduction in residual stress within the plated layer. Full article
(This article belongs to the Special Issue Electronic and Photonic Device Integration and Packaging)
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