Recent Advances in MEMS Pressure Sensors

A special issue of Micromachines (ISSN 2072-666X).

Deadline for manuscript submissions: closed (15 October 2021) | Viewed by 3249

Special Issue Editors


E-Mail Website
Guest Editor
The State Key Laboratory for Manufacturing System Engineering, School of Instrument Science and Technology, Xi'an Jiaotong University, Xi'an 710049, China
Interests: micro-nano fabrication technology and intelligent sensors; micromachined ultrasonic transducers; quantum sensors
Special Issues, Collections and Topics in MDPI journals
The State Key Laboratory for Manufacturing System Engineering, School of Instrument Science and Technology, Xi'an Jiaotong University, Xi'an 710049, China
Interests: MEMS sensors; CMUTs; PMUTs; flexible electronics & wearable sensors
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

MEMS pressure sensors are highly demanded in many fields, such as industrial processing, automobiles, daily electronic products, clinical medicine and aerospace, because of their miniature sizes, low power consumption, high sensitivity and ability to be integrated with ICs. In the past few decades, a great number of studies have been conducted on the design, modeling and fabrication of MEMS pressure sensors. Remarkable progress has been achieved in improving their performance, such as sensitivity, resolution, linearity, stability and measuring accuracy. However, with the increasing requirements and expanding scope of practical applications, new challenges are arising that require continuous efforts to address. For instance, low-pressure sensors are required to detect subtle pressure changes in clinical medicine. Ultra-low-pressure sensors are required for monitoring vacuums in MEMS processes. Besides these new requirements regarding pressure detection ranges, the working environments also vary. For example, MEMS pressure sensors for aerospace should be able to work, and maintain their stability and reliability, in extremely harsh conditions, such as under strong vibration and in ultra-high- or ultra-low-temperature environments. To address these newly raised and unmet requirements in practical applications, a vast number of investigations should be carried out to innovate modeling, design, fabrication and packaging technologies for MEMS pressure sensors.

Therefore, this Special Issue focuses on recent advances in modeling, design, fabrication and packaging technologies for MEMS pressure sensors. Both original research and review papers are welcome. 

Prof. Dr. Libo Zhao
Dr. Zhikang Li
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • MEMS Pressure Sensors
  • Principle Innovation
  • Structure Design
  • Theoretical Modeling
  • Fabrication
  • Packaging Technologies
  • Signal Processing Circuits
  • Performance Enhancement
  • Extreme Pressure Detection
  • Extremely Harsh Working Environment

Published Papers (1 paper)

Order results
Result details
Select all
Export citation of selected articles as:

Research

14 pages, 4423 KiB  
Article
A Resonant Pressure Microsensor with a Wide Pressure Measurement Range
by Chao Xiang, Yulan Lu, Chao Cheng, Junbo Wang, Deyong Chen and Jian Chen
Micromachines 2021, 12(4), 382; https://doi.org/10.3390/mi12040382 - 1 Apr 2021
Cited by 13 | Viewed by 2082
Abstract
This paper presents a resonant pressure microsensor with a wide range of pressure measurements. The developed microsensor is mainly composed of a silicon-on-insulator (SOI) wafer to form pressure-sensing elements, and a silicon-on-glass (SOG) cap to form vacuum encapsulation. To realize a wide range [...] Read more.
This paper presents a resonant pressure microsensor with a wide range of pressure measurements. The developed microsensor is mainly composed of a silicon-on-insulator (SOI) wafer to form pressure-sensing elements, and a silicon-on-glass (SOG) cap to form vacuum encapsulation. To realize a wide range of pressure measurements, silicon islands were deployed on the device layer of the SOI wafer to enhance equivalent stiffness and structural stability of the pressure-sensitive diaphragm. Moreover, a cylindrical vacuum cavity was deployed on the SOG cap with the purpose to decrease the stresses generated during the silicon-to-glass contact during pressure measurements. The fabrication processes mainly contained photolithography, deep reactive ion etching (DRIE), chemical mechanical planarization (CMP) and anodic bonding. According to the characterization experiments, the quality factors of the resonators were higher than 15,000 with pressure sensitivities of 0.51 Hz/kPa (resonator I), −1.75 Hz/kPa (resonator II) and temperature coefficients of frequency of 1.92 Hz/°C (resonator I), 1.98 Hz/°C (resonator II). Following temperature compensation, the fitting error of the microsensor was within the range of 0.006% FS and the measurement accuracy was as high as 0.017% FS in the pressure range of 200 ~ 7000 kPa and the temperature range of −40 °C to 80 °C. Full article
(This article belongs to the Special Issue Recent Advances in MEMS Pressure Sensors)
Show Figures

Figure 1

Back to TopTop