Power Semiconductor Devices and Integration Technology

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "D1: Semiconductor Devices".

Deadline for manuscript submissions: 30 June 2026 | Viewed by 398

Special Issue Editor


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Guest Editor
School of Integrated Circuit Science and Engineering, University of Electronic Science and Technology of China, Chengdu 611731, China
Interests: power semiconductor devices; power electronics; MOSFET; GaN HEMT; integrated diodes

Special Issue Information

Dear Colleagues,

Power semiconductor devices serve a pivotal role in various applications, ranging from renewable energy system to industrial automation, consumer electronics, data center, rail transportation, aerospace, smart grids, and more. High voltage, low power consumption, high frequency, and high reliability becomes undoubtedly important amidst the global energy transitions and smart manufacturing trends. On the one hand, traditional silicon-based power devices and integration technologies still play a crucial role because of their low cost, mature technologies and high market share. On the other hand, wide bandgap semiconductors (e.g., silicon carbide SiC, gallium nitride GaN, gallium oxide GaO, etc.) offer advantages of high breakdown field strength and low loss, significantly enhancing efficiency and power density. This Special Issue tends to provide a platform to gather novel findings and developments with a target of power semiconductor devices and integration technology with high-power density, low loss, and high reliability.

Dr. Jie Wei
Guest Editor

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Keywords

  • high voltage devices
  • low voltage devices
  • power IC device technology
  • power IC design
  • wide bandgap semiconductor (GaN, SiC, GaO, and so on)

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Published Papers (1 paper)

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Research

11 pages, 4652 KB  
Article
Investigation on the Isolation Approaches for High-Voltage GaN-on-Sapphire Monolithic Power Integrated Circuits
by Sheng Li, Haiwei Zhang, Yanfeng Ma, Qinhan Wang, Ke Wang, Yuanyang Xia, Leke Wu, Yiheng Li, Tinggang Zhu, Ran Ye, Jiaxing Wei, Long Zhang, Siyang Liu and Weifeng Sun
Micromachines 2025, 16(12), 1336; https://doi.org/10.3390/mi16121336 - 27 Nov 2025
Viewed by 243
Abstract
Gallium Nitride (GaN) fabricated on an insulated sapphire substrate achieves a higher rated voltage of monolithic power integrated circuits compared to that fabricated on a conductive silicon substrate. In this paper, the effectiveness of isolation approaches considering substrate bias and crosstalk effects between [...] Read more.
Gallium Nitride (GaN) fabricated on an insulated sapphire substrate achieves a higher rated voltage of monolithic power integrated circuits compared to that fabricated on a conductive silicon substrate. In this paper, the effectiveness of isolation approaches considering substrate bias and crosstalk effects between adjacent devices in GaN-on-Sapphire monolithic power integrated circuits is investigated. It is demonstrated that the substrate bias and crosstalk effects between high-side and low-side power devices are effectively suppressed regardless of substrate termination with the implantation isolation approach. Thanks to the ultrathin buffer upon an insulated sapphire substrate, the ion implantation can also isolate the adjacent high-voltage (power) and low-voltage (logic) devices. However, a weak crosstalk effect that is caused by capacitive coupling is still observed between high-voltage devices and low-voltage devices with the implantation approach; the degradation rate is calculated to be up to 3%. Experimental results prove that a shallow trench isolation structure in the implantation region can be adopted to mitigate the crosstalk effects, to further improve the stability of integrated logic circuits and drivers under dynamic high-voltage switching conditions. Full article
(This article belongs to the Special Issue Power Semiconductor Devices and Integration Technology)
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