- Article
Air Gaps Fabrication for Sub-100 nm GaN HEMTs by Novel SF6 Plasma Etching
- Simon St-Jacques,
- Mariyam Salmi,
- Oleh Fesiienko,
- Erwine Pargon,
- Ali Soltani,
- Bassem Salem and
- Hassan Maher
We demonstrate the fabrication of air gaps in a PECVD SiN interlayer through lateral recess by employing two consecutive plasma etch steps on an AlN/SiN/Al2O3 stack. This approach enables the preservation of sub-100 nm openings in Al2O3, offering a p...

