Special Issue "Advanced Plasma Processes for Nanotechnologies"
Deadline for manuscript submissions: 31 December 2019
Dr. Anton Nikiforov
Plasma processing has proven to be an invaluable tool in many areas, including materials engineering and nanotechnology. There is no doubt that it would be impossible to reach the current level of progress in semiconductor and electronics industries without the use of plasma technology. In recent decades, a great deal of effort has been made in establishing novel approaches for the control of material chemical composition and morphology at the nano-scale. Plasma etching and plasma ion implantation processes operating at low pressure are already capable of manufacturing surfaces at a scale of tens of nanometers, whereas plasma-assisted atomic layer deposition can even be applied to tune surface properties with atomic-level resolution. Currently, plasma processing at low, medium, and even atmospheric pressure has spread to the synthesis of a variety of nanoparticles, to generate the nano-patterning of surfaces, to modify the surface of scaffolds, and to many other fields where the nano-scale manipulation of material surface or bulk properties is required. Enormous progress has been achieved in photonic materials, biodegradable polymers, catalysts, and others with the use of methods of plasma-enhanced chemical vapour deposition and plasma polymerization. Novel advanced plasma processing methods have made strong contributions to nanotechnology, and an increase of plasma processing’s impact on nanoscience is foreseen in the short- and long-term.
This Special Issue will focus on recent progress in the development of novel plasma processes for establishing new trends in nanotechnology and material science. Special attention will be given to the engineering of nano-materials with unique properties for the demands of biomedical, chemical, and semiconductor industries; catalysts synthesis; and thin coatings, including clusters and nano-composites. The scope of the Special Issue is to provide a comprehensive overview of recent progress in the field of plasma methods for nano-materials engineering and to give insight into physical and chemical backgrounds of plasma processing.
It is my pleasure to invite you to submit a manuscript for this Special Issue. Full papers, communications, and reviews are all welcome.
Dr. Anton Nikiforov
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1800 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
- plasma-assisted deposition
- aerosol-enhanced plasma deposition
- nano-particles plasma synthesis
- plasma-modified catalysts
- bioinspired nano-materials
- nano-cluster coatings
- photonic materials