Deposition and Characterization of Thin Metallic- and Semiconductor-Based Films
A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Thin Films and Interfaces".
Deadline for manuscript submissions: closed (31 December 2020) | Viewed by 12325
Special Issue Editor
Interests: nanostructured thin films; self-assembled growth; grazing-incidence X-ray characterization; opto-electrical characterization of thin films
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
The production of thin films and their efficient characterization is continually growing research topic. Thin films, especially the nanostructured ones, show many interesting effects because of their strongly reduced size, and they have numerous important ongoing and potential applications.
The aim of this Issue is to provide insight into the recent development of techniques for the preparation and characterization of thin films. Especially interesting are the techniques enabling the self-assembled growth of regularly ordered nanostructures, complex nano-objects like core/shell nanoparticles or nanowires, as well as all types of thin films with some interesting properties and/or applications. Another focus of this Issue concerns the modern techniques for the efficient characterization of the thin films’ properties. Grazing incidence X-ray based techniques are welcomed, as well all others techniques sensitive to the close-to-the-surface area of the material. Techniques for the characterization of the optical and electrical properties of the thin films are of high interest as well.
Dr. Maja Mičetić
Guest Editor
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Keywords
- Deposition of semiconductor- and metallic-based thin films
- thin film characterization
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