Special Issue "Surface Functionalization by ALD Technology"

A special issue of Coatings (ISSN 2079-6412).

Deadline for manuscript submissions: 30 June 2020.

Special Issue Editor

Prof. Dr. Adriana Szeghalmi
E-Mail Website
Guest Editor
1. Friedrich Schiller University Jena, Albert-Einstein-Str. 13, 07745 Jena, Germany
2. Fraunhofer Institute of Applied Optics and Precision Engineering, Albert-Einstein-Str. 7, 07745 Jena, Germany
Interests: atomic layer deposition; optical coatings; oxides, metals, composites, nanolaminates and multilayers; interference coatings; diffractive optics

Special Issue Information

Dear Colleagues,

Atomic layer deposition (ALD) and related molecular layer deposition (MLD) are the most powerful technologies for conformal coating of micro/nano structured or complex shaped substrates. Intense research of ALD materials, their properties, and their applications in recent decades have brought this technology from the R&D laboratories to an industrial level. Continuous development of ALD materials and processes is mandatory to achieve next generation devices with improved efficiency and reduced costs. The quest for better functional thin film coatings will surely consider more and more complex material systems. Atomic layer deposition is an ideal technology for engineering novel material systems, because it allows for precise (sub-atomic) composition control for most complex composites combining different materials. Dielectrics, metals, semiconductors, and organic material can now be mixed in an ultra-thin film.

This Special Issue of Coatings is devoted to surface functionalization by ALD and will consider original research as well as review articles.

The topics of interest include, but are not limited to:

  • Material sciences such as the development of novel materials and processes; improving the properties of ALD thin films; single/doped or multilayer systems; and growth characteristics such as uniformity, reproducibility, growth rate, scale-up, etc.
  • Chemical and physical properties of surface functional coatings and studies on the relationship between film composition and properties;
  • Applications of functional thin films for electronics, energy saving, barriers and encapsulation, antibacterial, photocatalytic, optical, decorative, or other emerging fields.

Dr. Adriana Szeghalmi
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (2 papers)

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Research

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Open AccessArticle
Atomic Layer Deposition of NiO to Produce Active Material for Thin-Film Lithium-Ion Batteries
Coatings 2019, 9(5), 301; https://doi.org/10.3390/coatings9050301 - 03 May 2019
Cited by 2
Abstract
Atomic layer deposition (ALD) provides a promising route for depositing uniform thin-film electrodes for Li-ion batteries. In this work, bis(methylcyclopentadienyl) nickel(II) (Ni(MeCp)2) and bis(cyclopentadienyl) nickel(II) (NiCp2) were used as precursors for NiO ALD. Oxygen plasma was used as a [...] Read more.
Atomic layer deposition (ALD) provides a promising route for depositing uniform thin-film electrodes for Li-ion batteries. In this work, bis(methylcyclopentadienyl) nickel(II) (Ni(MeCp)2) and bis(cyclopentadienyl) nickel(II) (NiCp2) were used as precursors for NiO ALD. Oxygen plasma was used as a counter-reactant. The films were studied by spectroscopic ellipsometry, scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray reflectometry, and X-ray photoelectron spectroscopy. The results show that the optimal temperature for the deposition for NiCp2 was 200–300 °C, but the optimal Ni(MeCp)2 growth per ALD cycle was 0.011–0.012 nm for both precursors at 250–300 °C. The films deposited using NiCp2 and oxygen plasma at 300 °C using optimal ALD condition consisted mainly of stoichiometric polycrystalline NiO with high density (6.6 g/cm3) and low roughness (0.34 nm). However, the films contain carbon impurities. The NiO films (thickness 28–30 nm) deposited on stainless steel showed a specific capacity above 1300 mAh/g, which is significantly more than the theoretical capacity of bulk NiO (718 mAh/g) because it includes the capacity of the NiO film and the pseudo-capacity of the gel-like solid electrolyte interface film. The presence of pseudo-capacity and its increase during cycling is discussed based on a detailed analysis of cyclic voltammograms and charge–discharge curves (U(C)). Full article
(This article belongs to the Special Issue Surface Functionalization by ALD Technology)
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Review

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Open AccessFeature PaperReview
Atomic Layer Deposition of Inorganic Films for the Synthesis of Vertically Aligned Carbon Nanotube Arrays and Their Hybrids
Coatings 2019, 9(12), 806; https://doi.org/10.3390/coatings9120806 - 01 Dec 2019
Abstract
Vertically aligned carbon nanotube arrays (VACNTs) have many excellent properties and show great potential for various applications. Recently, there has been a desire to grow VACNTs on nonplanar surfaces and synthesize core-sheath-structured VACNT–inorganic hybrids. To achieve this aim, atomic layer deposition (ALD) has [...] Read more.
Vertically aligned carbon nanotube arrays (VACNTs) have many excellent properties and show great potential for various applications. Recently, there has been a desire to grow VACNTs on nonplanar surfaces and synthesize core-sheath-structured VACNT–inorganic hybrids. To achieve this aim, atomic layer deposition (ALD) has been extensively applied, especially due to its atomic-scale thickness controllability and excellent conformality of films on three-dimensional (3D) structures with high aspect ratios. In this paper, the ALD of catalyst thin films for the growth of VACNTs, such as Co3O4, Al2O3, and Fe2O3, was first mentioned. After that, the ALD of thin films for the synthesis of VACNT–inorganic hybrids was also discussed. To highlight the importance of these hybrids, their potential applications in supercapacitors, solar cells, fuel cells, and sensors have also been reviewed. Full article
(This article belongs to the Special Issue Surface Functionalization by ALD Technology)

Planned Papers

The below list represents only planned manuscripts. Some of these manuscripts have not been received by the Editorial Office yet. Papers submitted to MDPI journals are subject to peer-review.

Planned Paper 1

Title: Optical functional coatings by ALD
Author:
Dr. Adriana Szeghalmi

 

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