Atomic Layer Deposition of Inorganic Films for the Synthesis of Vertically Aligned Carbon Nanotube Arrays and Their Hybrids

Shanghai Key Laboratory of Intelligent Manufacturing and Robotics, School of Automation and Mechanical Engineering, Shanghai University, Shanghai 200444, China

SMIT Center, School of Automation and Mechanical Engineering, Shanghai University, Shanghai 201800, China

State Key Laboratory of ASIC and System, School of Microelectronics, Fudan University, Shanghai 200433, China

Author to whom correspondence should be addressed.

Coatings 2019, 9(12), 806; https://doi.org/10.3390/coatings9120806

Received: 6 November 2019 / Revised: 26 November 2019 / Accepted: 28 November 2019 / Published: 1 December 2019

(This article belongs to the Special Issue Surface Functionalization by ALD Technology)

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Abstract

Vertically aligned carbon nanotube arrays (VACNTs) have many excellent properties and show great potential for various applications. Recently, there has been a desire to grow VACNTs on nonplanar surfaces and synthesize core-sheath-structured VACNT–inorganic hybrids. To achieve this aim, atomic layer deposition (ALD) has been extensively applied, especially due to its atomic-scale thickness controllability and excellent conformality of films on three-dimensional (3D) structures with high aspect ratios. In this paper, the ALD of catalyst thin films for the growth of VACNTs, such as Co₃O₄, Al₂O₃, and Fe₂O₃, was first mentioned. After that, the ALD of thin films for the synthesis of VACNT–inorganic hybrids was also discussed. To highlight the importance of these hybrids, their potential applications in supercapacitors, solar cells, fuel cells, and sensors have also been reviewed. View Full-Text

Keywords: ALD; VACNTs; core-sheath structure; VACNT–inorganic hybrids

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MDPI and ACS Style

Yuan, G.-J.; Xie, J.-F.; Li, H.-H.; Lu, H.-L.; Tian, Y.-Z. Atomic Layer Deposition of Inorganic Films for the Synthesis of Vertically Aligned Carbon Nanotube Arrays and Their Hybrids. Coatings 2019, 9, 806. https://doi.org/10.3390/coatings9120806

AMA Style

Yuan G-J, Xie J-F, Li H-H, Lu H-L, Tian Y-Z. Atomic Layer Deposition of Inorganic Films for the Synthesis of Vertically Aligned Carbon Nanotube Arrays and Their Hybrids. Coatings. 2019; 9(12):806. https://doi.org/10.3390/coatings9120806

Chicago/Turabian Style

Yuan, Guang-Jie, Jie-Fei Xie, Hao-Hao Li, Hong-Liang Lu, and Ying-Zhong Tian. 2019. "Atomic Layer Deposition of Inorganic Films for the Synthesis of Vertically Aligned Carbon Nanotube Arrays and Their Hybrids" Coatings 9, no. 12: 806. https://doi.org/10.3390/coatings9120806

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Atomic Layer Deposition of Inorganic Films for the Synthesis of Vertically Aligned Carbon Nanotube Arrays and Their Hybrids

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