Special Issue "Chemical Vapor Deposition 2018"

A special issue of Coatings (ISSN 2079-6412).

Deadline for manuscript submissions: closed (31 May 2018).

Special Issue Editor

Guest Editor
Prof. Dr. Mingheng Li Website E-Mail
Department of Chemical and Materials Engineering, California State Polytechnic University, Pomona, CA 91768, USA
Interests: process systems engineering; coatings processing; energy and environmental systems

Special Issue Information

Dear Colleagues,

Chemical Vapor Deposition (CVD) is a versatile process to deposit high-quality films and coatings from gaseous precursors. It has a wide variety of applications in medical, semiconductors, solar cells, glass coatings, LEDs and, more recently, graphene production. This Special Issue of Coatings on “Chemical Vapor Deposition” is intended to cover original research and critical review articles on  recent advances in all aspects of CVD.

In particular, the topics of interest include, but are not limited to:

  • CVD processes
  • CVD coating characterization
  • CVD kinetics and modeling
  • Applications of CVD

Prof. Dr. Mingheng Li
Guest Editor

Manuscript Submission Information

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Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (5 papers)

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Research

Open AccessArticle
Relationship Processing–Composition–Structure–Resistivity of LaNiO3 Thin Films Grown by Chemical Vapor Deposition Methods
Coatings 2019, 9(1), 35; https://doi.org/10.3390/coatings9010035 - 10 Jan 2019
Abstract
Precision control of resistivity/conductivity of LaNiO3 (LNO) films is essential for their integration as electrodes in the functional heterostructures. This becomes possible if the relationship between processing parameters–composition–structure–resistivity is determined. LaNiO3 films were deposited by three different chemical vapor deposition methods [...] Read more.
Precision control of resistivity/conductivity of LaNiO3 (LNO) films is essential for their integration as electrodes in the functional heterostructures. This becomes possible if the relationship between processing parameters–composition–structure–resistivity is determined. LaNiO3 films were deposited by three different chemical vapor deposition methods using different precursor supply systems: direct liquid delivery, pulsed liquid injection, and aerosol generation. The possibilities to ameliorate the efficiency of precursor evaporation and of film growth were studied. The relationship between deposition conditions and composition was determined. Detailed analysis of the epitaxial growth of LNO films on cubic and trigonal substrates and the influence of the rhombohedral distortion on the microstructural quality was done. The resistivity of LaNiO3 films, grown by chemical vapor deposition, was mainly defined by microstructural defects and La/Ni composition. The high epitaxial quality LaNiO3/LaAlO3 films with nearly stoichiometric La/Ni ratio presented low resistivity, which was very close to that of bulk LaNiO3. Their annealing in oxygen atmosphere had little effect on the resistivity, which suggests a minor presence of oxygen vacancies in the as-grown films. Full article
(This article belongs to the Special Issue Chemical Vapor Deposition 2018)
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Open AccessArticle
Combination of Zinc Oxide and Antimony Doped Tin Oxide Nanocoatings for Glazing Application
Coatings 2018, 8(7), 248; https://doi.org/10.3390/coatings8070248 - 12 Jul 2018
Abstract
Multilayered nanocoatings allow outstanding properties with broad potential for glazing applications. Here, we report on the development of a multilayer nanocoating for zinc oxide (ZnO) and antimony doped tin oxide (ATO). The combination of ZnO and ATO thin films with their promising optical [...] Read more.
Multilayered nanocoatings allow outstanding properties with broad potential for glazing applications. Here, we report on the development of a multilayer nanocoating for zinc oxide (ZnO) and antimony doped tin oxide (ATO). The combination of ZnO and ATO thin films with their promising optical properties is a cost-efficient alternative for the production of energy-efficient glazing. It is an effective modification of the building envelope to reduce current high domestic demand of electrical power for air conditioning, especially in hot climates like Saudi Arabia. In this paper, we report the development of a nanocoating based on the combination of ZnO and ATO. Principle material and film investigations were carried out on lab-scale by dip coating with chemical solution deposition (CSD), while with regard to production processes, chemical vapor deposition (CVD) processes were evaluated in a second stage of the film development. It was found that with both processes, high-quality thin films and multilayer coatings with outstanding optical properties can be prepared. While keeping the optical transmission in the visible range at around 80%, only 10% of the NIR (near infrared) and below 1% of UV (ultraviolet) light passes these coatings. However, in contrast to CSD, the CVD process allows a free combination of the multilayer film sequence, which is of high relevance for production processes. Furthermore, it can be potentially integrated in float glass production lines. Full article
(This article belongs to the Special Issue Chemical Vapor Deposition 2018)
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Open AccessArticle
Chromium Carbide Growth by Direct Liquid Injection Chemical Vapor Deposition in Long and Narrow Tubes, Experiments, Modeling and Simulation
Coatings 2018, 8(6), 220; https://doi.org/10.3390/coatings8060220 - 13 Jun 2018
Cited by 2
Abstract
Chromium carbide layers were deposited using liquid-injection metal-organic chemical vapor deposition inside long (0.3 to 1 m) and narrow (8 to 24 mm in diameter) metallic tubes. The deposition was carried out using a molecular single-source, bis(benzene)chromium (BBC), as representative of the bis(arene)metal [...] Read more.
Chromium carbide layers were deposited using liquid-injection metal-organic chemical vapor deposition inside long (0.3 to 1 m) and narrow (8 to 24 mm in diameter) metallic tubes. The deposition was carried out using a molecular single-source, bis(benzene)chromium (BBC), as representative of the bis(arene)metal family diluted in toluene and injected with N2 as carrier gas. A multicomponent mass transport model for the simulation of the coupled fluid flow, heat transfer and chemistry was built. The kinetic mechanism of the growth of CrCx films was developed with the help of large-scale experiments to study the depletion of the precursors along the inner wall of the tube. The model fits well in the 400–550 °C temperature range and in the 1.3 × 102 to 7 × 103 Pa pressure range. The pressure is shown to have a pronounced effect on the deposition rate and thickness uniformity of the resulting coating. Below 525 °C the structure, composition and morphology of the films are not affected by changes of total pressure or deposition temperature. The coatings are amorphous and their Cr:C ratio is about 2:1, i.e., intermediate between Cr7C3 and Cr3C2. The model was applied to the design of a long reactor (1 m), with a double injection successively and alternatively undertaken at each end to ensure the best uniformity with sufficient thickness. This innovative concept can be used to optimize industrial deposition processes inside long and narrow tubes and channels. Full article
(This article belongs to the Special Issue Chemical Vapor Deposition 2018)
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Open AccessArticle
On the Activity Enhancing Role of Iron Oxide for Noble Metal Oxidation Catalysts: A CVD-Based Study with Differently Structured Combinations of Pt and FeOx Coatings on Al2O3
Coatings 2018, 8(6), 217; https://doi.org/10.3390/coatings8060217 - 11 Jun 2018
Cited by 2 | Correction
Abstract
With regard to the catalysis of oxidation reactions by noble metals, the addition of FeOx to an Al2O3-supported Pt catalyst is known to be energetically more favorable compared to only Pt. In this work, different process routes for [...] Read more.
With regard to the catalysis of oxidation reactions by noble metals, the addition of FeOx to an Al2O3-supported Pt catalyst is known to be energetically more favorable compared to only Pt. In this work, different process routes for the preparation of such Fe-promoted Pt/Al2O3 catalysts via atmospheric chemical vapor deposition (CVD) in a fluidized bed were explored. Specifically, the question of whether it would be advantageous to deposit the Fe before, along with, or after the Pt was addressed, and new information was obtained about the optimum FeOx–Pt interface and mixing ratio. Vapors of Trimethyl(methylcyclopentadienyl)platinum(IV) and/or Ethyl-ferrocene were injected into the bed from the top, permitting a quasi-lossless precursor operation and a very good control of the deposited metal, and hence of the catalyst structure. Samples could be extracted from the top while CVD was ongoing to obtain time-resolved data. The catalytic activity was determined through CO oxidation. The Fe-Pt mixing ratio was then varied for the most active deposition sequence, in order to identify an activity optimum generated by the minimum amount of Pt catalyst. When compared to pure Pt/Al2O3, the optimum catalyst consistently showed superior performance even after thermal stress. Full article
(This article belongs to the Special Issue Chemical Vapor Deposition 2018)
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Open AccessArticle
Effect of the N/C Ratios of Ammonia Added to Process Gas Mixtures on the Morphology and Structure of MPCVD Diamond Films
Coatings 2018, 8(5), 163; https://doi.org/10.3390/coatings8050163 - 27 Apr 2018
Cited by 2
Abstract
In this study, N-doped diamond films were prepared through microwave plasma chemical vapor deposition with NH3/CH4/H2 gas mixtures. The effects of the ammonia addition to the process gas mixture on the morphology and structure of diamond films were [...] Read more.
In this study, N-doped diamond films were prepared through microwave plasma chemical vapor deposition with NH3/CH4/H2 gas mixtures. The effects of the ammonia addition to the process gas mixture on the morphology and structure of diamond films were systematically investigated through characterization by scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), Raman spectroscopy, and X-ray photoelectron spectroscopy (XPS). This work focuses on the ammonia addition to the process gas mixtures in the narrow range of N/C ratios from 0.4% to 1.0%. The results reveal that different N/C ratios can affect the morphology, the preferred crystal orientation, and the sp3/sp2 ratio in the films. When the N/C ratio of the process gas mixture ranges from 0.6% to 1.0%, the XRD and SEM results show that ammonia addition is beneficial for the growth of the (110) faceted grains. When the N/C ratio of the process gas mixture ranges from 0.8% to 1.0%, the XPS and Raman results indicate that the diamond films exhibit a considerable enhancement in the sp3 fraction. Full article
(This article belongs to the Special Issue Chemical Vapor Deposition 2018)
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