Present Status of Thin Films and Coatings Fabricated by Magnetron Sputtering

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".

Deadline for manuscript submissions: 20 March 2026 | Viewed by 896

Special Issue Editor


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Guest Editor
Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland
Interests: magnetron sputtering; thin films; coatings; functional coatings; plasma surface engineering; Raman spectroscopy; pulsed plasma; non-equilibrium plasma; optical coatings; DLC
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Special Issue Information

Dear Colleagues,

You are invited to submit your latest findings to this Special Issue on the "Present Status of Thin Films and Coatings Fabricated by Magnetron Sputtering". This topic seeks to explore the current advancements and challenges in the fabrication of thin films and coatings using magnetron sputtering, a versatile and widely used deposition technique. We welcome contributions that delve into the innovative applications, material properties, and performance enhancements achieved through this method.

Manuscripts addressing the following aspects are particularly encouraged:

  • Advances in magnetron sputtering techniques and technology;
  • Novel materials and coatings developed using magnetron sputtering;
  • The characterization and analysis of thin films and coatings;
  • Applications in electronics, optics, energy, and other fields;
  • Comparative studies with other deposition methods.

This Special Issue aims to provide a comprehensive overview of the current landscape, highlighting significant breakthroughs and fostering discussions on future directions. Submissions should present rigorous experimental results, theoretical insights, or comprehensive reviews that contribute to the understanding and further development of magnetron sputtering processes.

Join us in disseminating cutting-edge research and contributing to the advancement of thin film and coating technologies. We look forward to including your manuscript as part of this impactful collection.

Dr. Rafal Chodun‬
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • magnetron sputtering
  • thin films
  • functional materials
  • sputtering technology
  • coatings characterization
  • plasma characterization
  • pulsed plasma
  • plasma surface engineering

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Published Papers (1 paper)

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Research

18 pages, 3647 KB  
Article
The Amorphous Carbon Layers Deposited by Various Magnetron Sputtering Techniques
by Rafal Chodun, Lukasz Skowronski, Marek Trzcinski, Dobromil Zaloga, Katarzyna Nowakowska-Langier, Piotr Domanowski and Krzysztof Zdunek
Coatings 2025, 15(12), 1367; https://doi.org/10.3390/coatings15121367 - 22 Nov 2025
Viewed by 481
Abstract
This study investigates the synthesis and characterization of amorphous carbon (a-C) layers using three magnetron sputtering (MS) techniques: Pulsed MS (PMS), Gas Injection MS (GIMS), and High Power GIMS (HiPGIMS). The primary objective was to understand how these methods influence the sp3 [...] Read more.
This study investigates the synthesis and characterization of amorphous carbon (a-C) layers using three magnetron sputtering (MS) techniques: Pulsed MS (PMS), Gas Injection MS (GIMS), and High Power GIMS (HiPGIMS). The primary objective was to understand how these methods influence the sp3/sp2 hybridization ratio, a critical parameter for tailoring the properties of amorphous carbon. Plasma diagnostics via Optical Emission Spectroscopy revealed distinct discharge characteristics, with HiPGIMS exhibiting the highest current density and plasma ionization. Structural and compositional analyses using Raman Spectroscopy and X-ray Photoelectron Spectroscopy (XPS) demonstrated a clear trend: sp3 content increased significantly from PMS to GIMS to HiPGIMS, reaching up to 50% (Raman) and 39% (XPS). This enhancement is attributed to the higher plasma density and more energetic ion bombardment in HiPGIMS, which promotes the formation of sp3 bonds. Ellipsometric spectroscopy further supported these findings, showing that HiPGIMS produced layers with the widest bandgap, indicative of higher sp3 content. The research highlights the effectiveness of advanced MS techniques, particularly HiPGIMS, in precisely controlling the sp3/sp2 ratio and thereby the electrical, optical, and mechanical properties of a-C layers for various applications. Full article
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