Advances in Deposition and Surface Modification of Oxide Thin Films and Nanocoatings

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".

Deadline for manuscript submissions: closed (31 July 2024) | Viewed by 5888

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Guest Editor
Institute of Chemistry, Research Park of Saint Petersburg State University, 198504 Saint Petersburg, Russia
Interests: atomic layer deposition; thin films; coatings; surface science; biomaterials; medical implants, Li-ion batteries
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Special Issue Information

Dear Colleagues,

We would like to invite you to submit your work to our Special Issue entitled "Advances in Deposition and Surface Modification of Oxide Thin Films and Nanocoatings".

Ultrathin films and nanocoatings are 2D nanostructures with thicknesses of less than 100 nm. Scientific interest in obtaining and studying such nanostructures increased remarkably in the late 20th and early 21st centuries. However, despite the vast amount of research conducted in this area nowadays, interest in the study of nanocoatings has not decreased. This is due to great advances in the study of nanocoatings and their wide range of applications. Oxide nanocoatings are one of the most common but useful and promising types of coatings. Due to their variety of chemical and physical properties, they are widely used in energy storage, medicine, electronics, catalysis, corrosion protection, optics, sensors, photovoltaics, etc. Such a wide variety of applications requires a significant number of modern techniques for obtaining thin films and nanocoatings, as well as approaches to modifying and studying them.

This Special Issue aims to summarize novel research on the synthesis and deposition of oxide thin films and nanocoatings, surface modifications and their functional properties. Theoretical and experimental articles and reviews are welcome for submission to this Special Issue.

In particular, the topic of interest includes but is not limited to:

  • Advances in the synthesis and deposition of oxide nanocoatings;
  • Surface treatment and modification;
  • New methods and approaches to the study of nanocoatings;
  • Study of the functional properties of nanocoatings;
  • Application of oxide thin films and nanocoatings.

Dr. Denis Nazarov
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • physical and chemical processes of deposition
  • thin films and coatings for energy storage
  • biomedical coatings
  • protective coatings
  • thin films and coatings for sensing

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Published Papers (5 papers)

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Research

27 pages, 10938 KiB  
Article
Niobium Oxide Thin Films Grown on Flexible ITO-Coated PET Substrates
by Alice Marciel, Alexandre Bastos, Luiz Pereira, Suresh Kumar Jakka, Joel Borges, Filipe Vaz, Marco Peres, Katharina Lorenz, Arijeta Bafti, Luka Pavić, Rui Silva and Manuel Graça
Coatings 2024, 14(9), 1127; https://doi.org/10.3390/coatings14091127 - 2 Sep 2024
Viewed by 333
Abstract
Niobium oxide thin films were grown on both rigid and flexible substrates using DC magnetron sputtering for electrochromic applications. Three experimental series were conducted, varying the oxygen to argon flow rate ratio and deposition time. In the first series, the oxygen to argon [...] Read more.
Niobium oxide thin films were grown on both rigid and flexible substrates using DC magnetron sputtering for electrochromic applications. Three experimental series were conducted, varying the oxygen to argon flow rate ratio and deposition time. In the first series, the oxygen to argon ratio was adjusted from 0 to 0.32 while maintaining a constant growth time of 30 min. For the second and third series, the oxygen to argon ratios were fixed at 0.40 and 0.56, respectively, with deposition times ranging from 15 to 60 min. A structural transition from crystalline to amorphous was observed at an oxygen to argon flow rate ratio of 0.32. This transition coincided with a change in appearance, from non-transparent with metallic-like electrical conductivity to transparent with dielectric behavior. The transparent niobium oxide films exhibited thicknesses between 51 nm and 198 nm, with a compact, dense, and featureless morphology, as evidenced by both top-view and cross-sectional images. Films deposited on flexible indium tin oxide (ITO)-coated polyethylene terephthalate (PET) substrates displayed a maximum surface roughness (Sq) of 9 nm and a maximum optical transmission of 83% in the visible range. The electrochromic response of niobium oxide thin films on ITO-coated PET substrates demonstrated a maximum coloration efficiency of 30 cm2 C1 and a reversibility of 96%. Mechanical performance was assessed through bending tests. The ITO-coated PET substrate exhibited a critical bending radius of 6.5 mm. Upon the addition of the niobium oxide layer, this decreased to 5 mm. Electrical resistance measurements indicated that the niobium oxide film mitigated rapid mechanical degradation of the underlying ITO electrode beyond the critical bending radius. Full article
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12 pages, 9726 KiB  
Article
In Situ Modulation of Oxygen Vacancy Concentration in Hf0.5Zr0.5O2−x Thin Films and the Mechanism of Its Impact on Ferroelectricity
by Shikai Liu, Xingyu Li, Gang Li, Shaoan Yan, Yingfang Zhu, Yujie Wu, Qin Jiang, Yang Zhan and Minghua Tang
Coatings 2024, 14(9), 1121; https://doi.org/10.3390/coatings14091121 - 2 Sep 2024
Viewed by 372
Abstract
Oxygen vacancies play a crucial role in stabilizing the ferroelectric phase in hafnium (Hf) oxide-based thin films and in shaping the evolution of their ferroelectric properties. In this study, we directly manipulated the oxygen vacancy concentration in Hf0.5Zr0.5O2− [...] Read more.
Oxygen vacancies play a crucial role in stabilizing the ferroelectric phase in hafnium (Hf) oxide-based thin films and in shaping the evolution of their ferroelectric properties. In this study, we directly manipulated the oxygen vacancy concentration in Hf0.5Zr0.5O2−x (HZO) ferroelectric thin films in situ using oxygen plasma treatment. We scrutinized the variations in the ferroelectric properties of HZO films across different oxygen vacancy concentrations by integrating the findings from ferroelectric performance tests. Additionally, we elucidated the mechanism underlying the influence of oxygen vacancies on the coercive field and polarization properties of HZO ferroelectric films through the first-principles density functional theory (DFT) calculations. Finally, to study the impact of oxygen vacancies on the practical application of HZO ferroelectric synaptic devices, leveraging the plasticity of the ferroelectric polarization, we constructed a multilayer perceptron (MLP) network. We simulated its recognition accuracy and convergence speed under different oxygen vacancy concentrations in the MNIST recognition task. Full article
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14 pages, 5906 KiB  
Article
Mechanical and Tribological Properties of CrWN/MoN Nano-Multilayer Coatings Deposited by Cathodic Arc Ion Plating
by Canxin Tian, Yanxiong Xiang, Changwei Zou, Yunjiang Yu, Tushagu Abudouwufu, Bing Yang and Dejun Fu
Coatings 2024, 14(3), 367; https://doi.org/10.3390/coatings14030367 - 20 Mar 2024
Cited by 1 | Viewed by 1058
Abstract
CrWN/MoN nano-multilayer coatings were deposited in pure N2 by multi-arc ion plating using CrW and Mo targets, with the cathode co-controlled by a permanent magnet combined with an electromagnet. The effects of the thickness modulation period on the microstructure and mechanical and [...] Read more.
CrWN/MoN nano-multilayer coatings were deposited in pure N2 by multi-arc ion plating using CrW and Mo targets, with the cathode co-controlled by a permanent magnet combined with an electromagnet. The effects of the thickness modulation period on the microstructure and mechanical and tribological performance were systematically analyzed by grazing-incident X-ray diffraction (GIXRD), transmission electron microscopy (TEM), Nanoindentation, scanning electron microscope (SEM) and profilometry using a Talysurf profilometer. The local coherent interfaces and nanoscale modulation period were confirmed by TEM, while the coatings were confirmed to be composed of fcc-CrWN and hexagonal δ-MoN by GIXRD. With the increase in the modulation period, the hardness of the CrWN/MoN nano-multilayer coatings decreased, and the values of the H/E ratio and friction coefficient showed the same variation trend. At an 8.0 nm modulation period, the CrWN/MoN nano-multilayer coating showed the maximum hardness (30.2 GPa), the lowest H/E value (0.082) and an H3/E*2 value of 0.16. With the decrease in the modulation period, the average friction coefficient of the CrWN/MoN nano-multilayer coatings gradually decreased from 0.45 to 0.29, while the wear rate decreased from 4.2 × 10−7 mm3/Nm to 3.3 × 10−7 mm3/Nm. Full article
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15 pages, 15094 KiB  
Article
Formation and Electrochemical Properties of Heterostructured Electrodes Based on Cu2O and CuCo2O4
by Anna A. Murashkina, Aida V. Rudakova, Tair V. Bakiev, Alexei V. Emeline and Detlef W. Bahnemann
Coatings 2024, 14(1), 141; https://doi.org/10.3390/coatings14010141 - 20 Jan 2024
Viewed by 1310
Abstract
Individual (FTO/Cu2O and FTO/CuCo2O4) and heterostructured (FTO/BiVO4/Cu2O, FTO/BiVO4/CuCo2O4, and FTO/CuCo2O4/Cu2O) electrodes were successfully formed using the electrodeposition method on copper-containing compounds. [...] Read more.
Individual (FTO/Cu2O and FTO/CuCo2O4) and heterostructured (FTO/BiVO4/Cu2O, FTO/BiVO4/CuCo2O4, and FTO/CuCo2O4/Cu2O) electrodes were successfully formed using the electrodeposition method on copper-containing compounds. The morphology of the synthesized electrode systems, which affect the electrochemical properties, was determined. A comparative study of the electrochemical and photoelectrochemical properties of the individual and heterostructured electrodes showed that the modification of the BiVO4 electrode surface with Cu2O and CuCo2O4 oxides led to a significant increase in its efficiency as a photoanode. The deposition of Cu2O nanoclusters onto CuCo2O4 nanoflakes increased the electrochemical stability of the electrode while maintaining its high capacitance. Full article
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16 pages, 10919 KiB  
Article
Atomic Layer Deposition of Chlorine Containing Titanium–Zinc Oxide Nanofilms Using the Supercycle Approach
by Denis Nazarov, Lada Kozlova, Aida Rudakova, Elena Zemtsova, Natalia Yudintceva, Elizaveta Ovcharenko, Alexandra Koroleva, Igor Kasatkin, Ludmila Kraeva, Elizaveta Rogacheva and Maxim Maximov
Coatings 2023, 13(5), 960; https://doi.org/10.3390/coatings13050960 - 20 May 2023
Cited by 3 | Viewed by 2052
Abstract
Atomic layer deposition (ALD) is a useful tool for producing ultrathin films and coatings of complex composition with high thickness control for a wide range of applications. In this study, the growth of zinc–titanium oxide nanofilms was investigated. Diethyl zinc, titanium tetrachloride, and [...] Read more.
Atomic layer deposition (ALD) is a useful tool for producing ultrathin films and coatings of complex composition with high thickness control for a wide range of applications. In this study, the growth of zinc–titanium oxide nanofilms was investigated. Diethyl zinc, titanium tetrachloride, and water were used as precursors. The supercycle approach was used, and wide ZnO/TiO2 (ZTO) ALD cycles were prepared: 5/1, 3/1, 2/1, 1/1, 1/2, 1/3, 1/5, 1/10, 1/20. Spectral ellipsometry, X-ray reflectometry, X-ray diffraction, scanning electron microscopy, SEM-EDX, and contact angle measurements were used to characterize the thickness, morphology, and composition of the films. The results show that the thicknesses of the coatings differ considerably from those calculated using the rule of mixtures. At high ZnO/TiO2 ratios, the thickness is much lower than expected and with increasing titanium oxide content the thickness increases significantly. The surface of the ZTO samples contains a significant amount of chlorine in the form of zinc chloride and an excessive amount of titanium. The evaluation of the antibacterial properties showed significant activity of the ZTO–1/1 sample against antibiotic-resistant strains and no negative effect on the morphology and adhesion of human mesenchymal stem cells. These results suggest that by tuning the surface composition of ALD-derived ZTO samples, it may be possible to obtain a multi-functional material for use in medical applications. Full article
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