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Inorganics 2018, 6(2), 46; https://doi.org/10.3390/inorganics6020046

Atomic Layer Deposition of Lithium Fluoride Optical Coatings for the Ultraviolet

Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Dr, Pasadena, CA 91109, USA
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Received: 4 April 2018 / Revised: 26 April 2018 / Accepted: 28 April 2018 / Published: 4 May 2018
(This article belongs to the Special Issue Metal Fluorides)
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Abstract

Lithium fluoride is an important material for ultraviolet optical systems, possessing among the largest optical bandgaps of dielectric materials. We report on the development of an atomic layer deposition (ALD) process for lithium fluoride that is capable of depositing thin films in a self-limiting manner, with an approximate deposition rate of approximately 0.15 Å per ALD cycle at a substrate temperature of 150 °C. Films are characterized by spectroscopic ellipsometry, atomic force microscopy, X-ray photoelectron spectroscopy, and far ultraviolet reflectometry. For substrate temperatures of 150 °C and greater, films showed significant microroughness with a correlated reduction in effective refractive index. This behavior was mitigated by a reduction in substrate temperature to as low as 100 °C. Films deposited on silicon substrates were subjected to long-term storage testing to evaluate the environmental sensitivity of the deposited layers. Protected aluminum mirrors were also fabricated with ALD LiF overcoats, yielding a reflectance of 84% at a wavelength of 125 nm. The performance relative to state-of-the-art LiF thin films deposited by physical vapor deposition methods is discussed, along with the prospects for future optimization. View Full-Text
Keywords: atomic layer deposition; lithium fluoride; ultraviolet; thin film; atomic layer etching; mirror atomic layer deposition; lithium fluoride; ultraviolet; thin film; atomic layer etching; mirror
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).
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Hennessy, J.; Nikzad, S. Atomic Layer Deposition of Lithium Fluoride Optical Coatings for the Ultraviolet. Inorganics 2018, 6, 46.

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