Next Article in Journal
The Implication of Benzene–Ethanol Extractive on Mechanical Properties of Waterborne Coating and Wood Cell Wall by Nanoindentation
Previous Article in Journal
Bio-Based Composites with Enhanced Matrix-Reinforcement Interactions from the Polymerization of α-Eleostearic Acid
Previous Article in Special Issue
Experimental and Modeling Study of the Fabrication of Mg Nano-Sculpted Films by Magnetron Sputtering Combined with Glancing Angle Deposition
Open AccessArticle

Phase Selectivity in Cr and N Co-Doped TiO2 Films by Modulated Sputter Growth and Post-Deposition Flash-Lamp-Annealing

1
Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, E-28049 Madrid, Spain
2
Helmholtz-Zentrum Dresden-Rossendorf, Institute of Ion Beam Physics and Materials Research, D-01328 Dresden, Germany
*
Author to whom correspondence should be addressed.
Coatings 2019, 9(7), 448; https://doi.org/10.3390/coatings9070448
Received: 11 June 2019 / Revised: 9 July 2019 / Accepted: 14 July 2019 / Published: 17 July 2019
(This article belongs to the Special Issue Advanced Strategies in Thin Film Engineering by Magnetron Sputtering)
In this paper, we report on the phase selectivity in Cr and N co-doped TiO2 (TiO2:Cr,N) sputtered films by means of interface engineering. In particular, monolithic TiO2:Cr,N films produced by continuous growth conditions result in the formation of a mixed-phase oxide with dominant rutile character. On the contrary, modulated growth by starting with a single-phase anatase TiO2:N buffer layer, can be used to imprint the anatase structure to a subsequent TiO2:Cr,N layer. The robustness of the process with respect to the growth conditions has also been investigated, especially regarding the maximum Cr content (<5 at.%) for single-phase anatase formation. Furthermore, post-deposition flash-lamp-annealing (FLA) in modulated coatings was used to improve the as-grown anatase TiO2:Cr,N phase, as well as to induce dopant activation (N substitutional sites) and diffusion. In this way, Cr can be distributed through the whole film thickness from an initial modulated architecture while preserving the structural phase. Hence, the combination of interface engineering and millisecond-range-FLA opens new opportunities for tailoring the structure of TiO2-based functional materials. View Full-Text
Keywords: oxide materials; doping; sputter deposition; modulated growth; flash-lamp-annealing; XANES oxide materials; doping; sputter deposition; modulated growth; flash-lamp-annealing; XANES
Show Figures

Figure 1

MDPI and ACS Style

Gago, R.; Prucnal, S.; Hübner, R.; Munnik, F.; Esteban-Mendoza, D.; Jiménez, I.; Palomares, J. Phase Selectivity in Cr and N Co-Doped TiO2 Films by Modulated Sputter Growth and Post-Deposition Flash-Lamp-Annealing. Coatings 2019, 9, 448.

Show more citation formats Show less citations formats
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Article Access Map

1
Back to TopTop