Oxidation Behavior of Ta–Al Multilayer Coatings
1
Institute of Materials Engineering, National Taiwan Ocean University, Keelung 20224, Taiwan
2
Department of Optoelectronics and Materials Technology, National Taiwan Ocean University, Keelung 20224, Taiwan
3
Center of Excellence for Ocean Engineering, National Taiwan Ocean University, Keelung 20224, Taiwan
*
Author to whom correspondence should be addressed.
Coatings 2019, 9(12), 810; https://doi.org/10.3390/coatings9120810
Received: 31 October 2019 / Revised: 20 November 2019 / Accepted: 29 November 2019 / Published: 1 December 2019
(This article belongs to the Special Issue Physical Vapor Deposition)
Ta–Al multilayer coatings were fabricated through cyclical gradient concentration deposition by direct current magnetron co-sputtering. The as-deposited coatings presented a multilayer structure in the growth direction. The oxidation behavior of the Ta–Al multilayer coatings was explored. The results specified that Ta-rich Ta–Al multilayer coatings demonstrated a restricted oxidation depth after annealing at 600 °C in 1% O2–99% Ar for up to 100 h. This was attributed to the preferential oxidation of Al, the formation of amorphous Al-oxide sublayers, and the maintenance of a multilayer structure. By contrast, Ta2O5 formed after exhausting Al in the oxidation process in an ambient atmosphere at 600 °C which exhibited a crystalline Ta2O5-amorphous Al-oxide multilayer structure.
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited
MDPI and ACS Style
Chen, Y.-I.; Lin, N.-Y.; Ke, Y.-E. Oxidation Behavior of Ta–Al Multilayer Coatings. Coatings 2019, 9, 810.
Show more citation formats
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.