Oxidation Behavior of Ta–Al Multilayer Coatings
1
Institute of Materials Engineering, National Taiwan Ocean University, Keelung 20224, Taiwan
2
Department of Optoelectronics and Materials Technology, National Taiwan Ocean University, Keelung 20224, Taiwan
3
Center of Excellence for Ocean Engineering, National Taiwan Ocean University, Keelung 20224, Taiwan
*
Author to whom correspondence should be addressed.
Coatings 2019, 9(12), 810; https://doi.org/10.3390/coatings9120810
Received: 31 October 2019 / Revised: 20 November 2019 / Accepted: 29 November 2019 / Published: 1 December 2019
(This article belongs to the Special Issue Physical Vapor Deposition)
Ta–Al multilayer coatings were fabricated through cyclical gradient concentration deposition by direct current magnetron co-sputtering. The as-deposited coatings presented a multilayer structure in the growth direction. The oxidation behavior of the Ta–Al multilayer coatings was explored. The results specified that Ta-rich Ta–Al multilayer coatings demonstrated a restricted oxidation depth after annealing at 600 °C in 1% O2–99% Ar for up to 100 h. This was attributed to the preferential oxidation of Al, the formation of amorphous Al-oxide sublayers, and the maintenance of a multilayer structure. By contrast, Ta2O5 formed after exhausting Al in the oxidation process in an ambient atmosphere at 600 °C which exhibited a crystalline Ta2O5-amorphous Al-oxide multilayer structure.
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MDPI and ACS Style
Chen, Y.-I.; Lin, N.-Y.; Ke, Y.-E. Oxidation Behavior of Ta–Al Multilayer Coatings. Coatings 2019, 9, 810.
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