Formation of Titanium Oxynitride Films by Reactive Magnetron Sputtering, Their Structural Features and Properties

TiO_xN_y coatings are known for their good biocompatibility and corrosion resistance and have been previously explored for biomedical applications, including cardiovascular stents. In this work, emphasis is placed on a systematic investigation of the effect of substrate bias voltage on the structural, morphological, and mechanical properties of TiO_xN_y films deposited by reactive magnetron sputtering. TiO_xN_y coatings were deposited on 316L stainless steel substrates using a pure titanium target (99.99%) in an Ar–N₂–O₂ gas mixture at various substrate bias voltages (0 to −150 V). The influence of substrate bias on the deposition rate, structure, and mechanical properties of the films was investigated. X-ray diffraction (XRD) analysis revealed the sequential phase evolution from cubic TiN to oxynitride TiON and further to TiO₂ (anatase/rutile) with increasing negative substrate bias, indicating that ion bombardment energy plays a decisive role in determining the crystallinity and phase composition of the coatings. The coating deposited at −50 V exhibited the highest hardness (~430 HV) and good adhesion strength (critical load 20–25 N). Contact angle measurements confirmed the hydrophilic behavior of the coatings, which is favorable for biomedical applications.