Probing the Growth Improvement of Large-Size High Quality Monolayer MoS2 by APCVD
Abstract
:1. Introduction
2. Methods
3. Results and Discussion
3.1. Effect of Different Oxygen Plasma Treatment Time and Power on the Growth of MoS2
3.2. Effect of Graphene Quantum Dot Solution Amount on the Growth of MoS2
3.3. The Optimal Growth Conditions of Monolayer MoS2
3.4. Characterization of Monolayer MoS2
4. Conclusions
Author Contributions
Funding
Conflicts of Interest
References
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Growth Method | Characteristics | Size of MoS2 | References |
---|---|---|---|
Micromechanical stripping | Simple process, low yield, poor repeatability | 10 µm | [15,16] |
Lithium ion intercalation | Complicated operation and high cost | 20 µm | [16,17,18] |
Hydrothermal | Poor crystallization quality | 20~30 µm | [19,20,21] |
CVD | Layer number cannot control | 30~50 µm | [2,3,4,8,9,10] |
APCVD | Simple operation, no vacuum treatment | 80~100 µm | [25] |
APCVD | Oxygen plasma treatment, graphene quantum dot | 200 µm | This paper |
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Han, T.; Liu, H.; Wang, S.; Chen, S.; Li, W.; Yang, X. Probing the Growth Improvement of Large-Size High Quality Monolayer MoS2 by APCVD. Nanomaterials 2019, 9, 433. https://doi.org/10.3390/nano9030433
Han T, Liu H, Wang S, Chen S, Li W, Yang X. Probing the Growth Improvement of Large-Size High Quality Monolayer MoS2 by APCVD. Nanomaterials. 2019; 9(3):433. https://doi.org/10.3390/nano9030433
Chicago/Turabian StyleHan, Tao, Hongxia Liu, Shulong Wang, Shupeng Chen, Wei Li, and Xiaoli Yang. 2019. "Probing the Growth Improvement of Large-Size High Quality Monolayer MoS2 by APCVD" Nanomaterials 9, no. 3: 433. https://doi.org/10.3390/nano9030433