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Open AccessArticle

Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application

1
Centre for Advanced Material and Energy Sciences, Universiti Brunei Darussalam, Tungku Link, Gadong BE1410, Negara Darussalam, Brunei
2
Department of Optoelectronics and Materials Technology, National Taiwan Ocean University, No. 2 Pei-Ning Rd., Keelung 202, Taiwan
3
Institute of Physics, Academia Sinica, Taipei 115, Taiwan
4
Taiwan Instrument Research Institute, National Applied Research Laboratories, Hsinchu 300, Taiwan
5
Department of Electronic Engineering, National Yunlin University of Science and Technology, Yunlin, 64002, Taiwan
*
Author to whom correspondence should be addressed.
Nanomaterials 2019, 9(12), 1691; https://doi.org/10.3390/nano9121691
Received: 23 October 2019 / Revised: 19 November 2019 / Accepted: 25 November 2019 / Published: 26 November 2019
(This article belongs to the Special Issue Nanobiophotonics, Photomedicine, and Imaging)
In this paper, a periodic metallic–dielectric nanorod array which consists of Si nanorods coated with 30 nm Ag thin film set in a hexagonal configuration is fabricated and characterized. The fabrication procedure is performed by using nanosphere lithography with reactive ion etching, followed by Ag thin-film deposition. The mechanism of the surface and gap plasmon modes supported by the fabricated structure is numerically demonstrated by the three-dimensional finite element method. The measured and simulated absorptance spectra are observed to have a same trend and a qualitative fit. Our fabricated plasmonic sensor shows an average sensitivity of 340.0 nm/RIU when applied to a refractive index sensor ranging from 1.0 to 1.6. The proposed substrates provide a practical plasmonic nanorod-based sensing platform, and the fabrication methods used are technically effective and low-cost.
Keywords: periodic nanorod array; nanosphere lithography; reactive ion etching; finite element method; plasmonic sensor periodic nanorod array; nanosphere lithography; reactive ion etching; finite element method; plasmonic sensor
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MDPI and ACS Style

Chou Chau, Y.-F.; Chen, K.-H.; Chiang, H.-P.; Lim, C.M.; Huang, H.J.; Lai, C.-H.; Kumara, N.T.R.N. Fabrication and Characterization of a Metallic–Dielectric Nanorod Array by Nanosphere Lithography for Plasmonic Sensing Application. Nanomaterials 2019, 9, 1691.

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