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Article

High-Performance On-Chip Silicon Beamsplitter Based on Subwavelength Metamaterials for Enhanced Fabrication Tolerance

1
Instituto de Óptica Daza de Valdés, Consejo Superior de Investigaciones Científicas (CSIC), 28006 Madrid, Spain
2
National Research Council Canada, Ottawa, ON K1A 0R6, Canada
*
Author to whom correspondence should be addressed.
Academic Editor: Werner Blau
Nanomaterials 2021, 11(5), 1304; https://doi.org/10.3390/nano11051304
Received: 19 April 2021 / Revised: 12 May 2021 / Accepted: 13 May 2021 / Published: 14 May 2021
(This article belongs to the Special Issue Silicon Photonics: Synthesis and Applications)
Efficient power splitting is a fundamental functionality in silicon photonic integrated circuits, but state-of-the-art power-division architectures are hampered by limited operational bandwidth, high sensitivity to fabrication errors or large footprints. In particular, traditional Y-junction power splitters suffer from fundamental mode losses due to limited fabrication resolution near the junction tip. In order to circumvent this limitation, we propose a new type of high-performance Y-junction power splitter that incorporates subwavelength metamaterials. Full three-dimensional simulations show a fundamental mode excess loss below 0.1 dB in an ultra-broad bandwidth of 300 nm (1400–1700 nm) when optimized for a fabrication resolution of 50 nm, and under 0.3 dB in a 350 nm extended bandwidth (1350–1700 nm) for a 100 nm resolution. Moreover, analysis of fabrication tolerances shows robust operation for the fundamental mode to etching errors up to ±20 nm. A proof-of-concept device provides an initial validation of its operation principle, showing experimental excess losses lower than 0.2 dB in a 195 nm bandwidth for the best-case resolution scenario (i.e., 50 nm). View Full-Text
Keywords: photonic integrated circuits; silicon photonics; power division; beamsplitter; Y-junction; subwavelength metamaterial; ultra-broadband; fabrication-tolerant photonic integrated circuits; silicon photonics; power division; beamsplitter; Y-junction; subwavelength metamaterial; ultra-broadband; fabrication-tolerant
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MDPI and ACS Style

Fernández de Cabo, R.; González-Andrade, D.; Cheben, P.; Velasco, A.V. High-Performance On-Chip Silicon Beamsplitter Based on Subwavelength Metamaterials for Enhanced Fabrication Tolerance. Nanomaterials 2021, 11, 1304. https://doi.org/10.3390/nano11051304

AMA Style

Fernández de Cabo R, González-Andrade D, Cheben P, Velasco AV. High-Performance On-Chip Silicon Beamsplitter Based on Subwavelength Metamaterials for Enhanced Fabrication Tolerance. Nanomaterials. 2021; 11(5):1304. https://doi.org/10.3390/nano11051304

Chicago/Turabian Style

Fernández de Cabo, Raquel, David González-Andrade, Pavel Cheben, and Aitor V. Velasco. 2021. "High-Performance On-Chip Silicon Beamsplitter Based on Subwavelength Metamaterials for Enhanced Fabrication Tolerance" Nanomaterials 11, no. 5: 1304. https://doi.org/10.3390/nano11051304

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