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Open AccessAddendum

Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394

1
Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN 37996, USA
2
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
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Author to whom correspondence should be addressed.
Nanomaterials 2020, 10(2), 273; https://doi.org/10.3390/nano10020273
Received: 5 February 2020 / Accepted: 6 February 2020 / Published: 6 February 2020
Note: In lieu of an abstract, this is an excerpt from the first page.

The authors wish to make the following corrections to this paper [...] View Full-Text
MDPI and ACS Style

Zhang, C.; Dyck, O.; Garfinkel, D.A.; Stanford, M.G.; Belianinov, A.A.; Fowlkes, J.D.; Jesse, S.; Rack, P.D. Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394. Nanomaterials 2020, 10, 273.

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