Zhang, C.; Dyck, O.; Garfinkel, D.A.; Stanford, M.G.; Belianinov, A.A.; Fowlkes, J.D.; Jesse, S.; Rack, P.D.
Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394. Nanomaterials 2020, 10, 273.
https://doi.org/10.3390/nano10020273
AMA Style
Zhang C, Dyck O, Garfinkel DA, Stanford MG, Belianinov AA, Fowlkes JD, Jesse S, Rack PD.
Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394. Nanomaterials. 2020; 10(2):273.
https://doi.org/10.3390/nano10020273
Chicago/Turabian Style
Zhang, Cheng, Ondrej Dyck, David A. Garfinkel, Michael G. Stanford, Alex A. Belianinov, Jason D. Fowlkes, Stephen Jesse, and Philip D. Rack.
2020. "Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394" Nanomaterials 10, no. 2: 273.
https://doi.org/10.3390/nano10020273
APA Style
Zhang, C., Dyck, O., Garfinkel, D. A., Stanford, M. G., Belianinov, A. A., Fowlkes, J. D., Jesse, S., & Rack, P. D.
(2020). Addendum: Zhang, C., et al. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394. Nanomaterials, 10(2), 273.
https://doi.org/10.3390/nano10020273
