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Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns

1
Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN 37996, USA
2
Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA
*
Author to whom correspondence should be addressed.
Nanomaterials 2019, 9(10), 1394; https://doi.org/10.3390/nano9101394
Received: 12 September 2019 / Revised: 24 September 2019 / Accepted: 27 September 2019 / Published: 30 September 2019
A helium gas field ion source has been demonstrated to be capable of realizing higher milling resolution relative to liquid gallium ion sources. One drawback, however, is that the helium ion mass is prohibitively low for reasonable sputtering rates of bulk materials, requiring a dosage that may lead to significant subsurface damage. Manipulation of suspended graphene is, therefore, a logical application for He+ milling. We demonstrate that competitive ion beam-induced deposition from residual carbonaceous contamination can be thermally mitigated via a pulsed laser-assisted He+ milling. By optimizing pulsed laser power density, frequency, and pulse width, we reduce the carbonaceous byproducts and mill graphene gaps down to sub 10 nm in highly complex kiragami patterns. View Full-Text
Keywords: graphene; direct-write kirigami; nanopatterning; pulsed laser graphene; direct-write kirigami; nanopatterning; pulsed laser
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Zhang, C.; Dyck, O.; Garfinkel, D.A.; Stanford, M.G.; Belianinov, A.A.; Fowlkes, J.D.; Jesse, S.; Rack, P.D. Pulsed Laser-Assisted Helium Ion Nanomachining of Monolayer Graphene—Direct-Write Kirigami Patterns. Nanomaterials 2019, 9, 1394.

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