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Open AccessArticle

Modelling of Optical Damage in Nanorippled ZnO Produced by Ion Irradiation

1
Electronics and semiconductors group, Departamento de Física Aplicada, Universidad Autónoma de Madrid, 28049 Madrid, Spain
2
Materials Science Factory, Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, 28049 Madrid, Spain
3
Université Grenoble Alpes; INAC‐SP2M, LEMMA, F-38000 Grenoble, France
4
IPFN, Instituto Superior Técnico, Campus Tecnológico e Nuclear, Estrada Nacional 10, P-2695-066 Bobadela LRS, Portugal
5
Instituto de Engenharia de Sistemas de Computadores-Microsistemas e Nanotecnologia (INESC-MN), 1000-029 Lisboa, Portugal
6
Departamento de Física & I3N, Universidade de Aveiro, Campus Universitário de Santiago, 3810-193 Aveiro, Portugal
*
Author to whom correspondence should be addressed.
Crystals 2019, 9(9), 453; https://doi.org/10.3390/cryst9090453
Received: 31 July 2019 / Revised: 25 August 2019 / Accepted: 26 August 2019 / Published: 30 August 2019
Here, we report on the production of nanoripples on the surface of ZnO bulk substrates by ion beam erosion with 20 keV Ar+ ions at an oblique incidence (60°). The ripple patterns, analyzed by atomic force microscopy, follow a power law dependence for both the roughness and the wavelength. At high fluences these ripples show coarsening and asymmetric shapes, which become independent of the beam direction and evidence additional mechanisms for the pattern development. The shallow damaged layer is not fully amorphized by this process, as confirmed by medium energy ion scattering. A detailed study of the damage-induced changes on the optical properties was carried out by means of spectroscopic ellipsometry. Using a 3-layer model based on Tauc-Lorenz and critical point parameter band oscillators, the optical constants of the damaged layer were determined. The results showed a progressive reduction in the refractive index and enhanced absorption below the bandgap with the fluence. View Full-Text
Keywords: ZnO; patterning; sputtering; spectroscopic ellipsometry; ripples; damage ZnO; patterning; sputtering; spectroscopic ellipsometry; ripples; damage
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MDPI and ACS Style

Redondo-Cubero, A.; Vázquez, L.; Jalabert, D.; Lorenz, K.; Ben Sedrine, N. Modelling of Optical Damage in Nanorippled ZnO Produced by Ion Irradiation. Crystals 2019, 9, 453.

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