Next Article in Journal
Investigation on the Thermal Deformation Behavior of the Nickel-Based Superalloy Strengthened by γ′ Phase
Next Article in Special Issue
Ion Transport Behavior through Thermally Reduced Graphene Oxide Membrane for Precise Ion Separation
Previous Article in Journal
Surface Integrities of Different Trajectories in Belt Grinding for Pure Iron Functional Performance Test Pieces
Article Menu
Issue 3 (March) cover image

Export Article

Open AccessArticle
Crystals 2019, 9(3), 124;

Structural and Magnetoresistance Properties of Transfer-Free Amorphous Carbon Thin Films

Institute for Advanced Study, Shenzhen University, Shenzhen 518060, Guangdong, China
Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Provence, College of Optoelectronic Engineering, Shenzhen University, Shenzhen 518060, Guangdong, China
Beijing National Center for Electron Microscopy, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
School of Science, University of Management and Technology, Sialkot 51310, Pakistan
Applied Thermal Physics Laboratory, Department of Physics, COMSATS University, Islamabad 44000, Pakistan
Author to whom correspondence should be addressed.
Received: 21 January 2019 / Revised: 23 February 2019 / Accepted: 25 February 2019 / Published: 28 February 2019
PDF [2911 KB, uploaded 28 February 2019]


The control of the morphologies and thus the optical, electrical, and magnetic effect of 2D thin films is a challenging task for the development of cost-efficient devices. In particular, the angular dependent magnetoresistance (MR) of surface thin films up to room temperature is an interesting phenomenon in materials science. Here, we report amorphous carbon thin films fabricated through chemical vapor deposition at a SiO2 substrate. Their structural and angular magnetoresistance properties were investigated by several analytical tools. Specifically, we used a physical property measurement system to estimate the magnitude of the angular MR of these as-prepared sample thin films from 2 K to 300 K. An angular MR magnitude of 1.6% for the undoped a-carbon thin films was found up to 300 K. Under the magnetic field of 7 T, these films possessed an angular MR of 15% at a low temperature of 2 K. A high disorder degree leads to a large magnitude of MR. The grain boundary scattering model was used to interpret the mechanism of this angular MR. View Full-Text
Keywords: chemical vapor deposition; magnetoresistance; amorphous carbon; transport properties chemical vapor deposition; magnetoresistance; amorphous carbon; transport properties

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

Share & Cite This Article

MDPI and ACS Style

Saleemi, A.S.; Abdullah, A.; Saeed, M.; Anis-ur-Rehman, M.; Mahmood, A.; Khan, K.; Kiani, M.; Lee, S.-L. Structural and Magnetoresistance Properties of Transfer-Free Amorphous Carbon Thin Films. Crystals 2019, 9, 124.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics



[Return to top]
Crystals EISSN 2073-4352 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top